Patent classifications
C11D3/2041
Compositions comprising specific hyperbranched copolymers together with 1,3-propandiol and N-hydroxyoctanamide
The present invention relates to a composition comprising a specific hyperbranched copolymer (HBC) of the monomers dodecenyl succinic acid anhydride, diisopropanol amine and bis-dimethylaminopropyl amine and the compound 1,3-propandiol and/or N-hydroxyoctanamide. It has been found that said hyperbranched copolymer synergistically enhances the antimicrobial action of a 1,3-propanediol and/or N-hydroxy-octanamide.
Cleavable multi-alcohol-based microcapsules
Described herein is a process for a preparation of microcapsules based on cleavable multi-alcohols. Also described herein are cleavable multi-alcohol-based microcapsules. Also described herein are perfuming compositions and consumer products including such capsules, in particular perfumed consumer products in the form of home care or personal care products.
CLEAVABLE MULTI-ALCOHOL-BASED MICROCAPSULES
Described herein are cleavable multi-alcohol-based microcapsules. Also described herein are perfuming compositions and consumer products including such capsules, in particular perfumed consumer products in the form of home care or personal care products.
COMPOSITION FOR CLEANING AND ASSESSING CLEANLINESS IN REAL-TIME
This disclosure describes a composition which can provide real-time feedback during medical device cleaning or reprocessing. The composition can be used to monitor the amount of biological material cleaned from medical devices and to determine when cleaning is complete. The disclosure also relates to a method of cleaning, or assessing the cleanliness of, a medical device such as an endoscope. Cleanliness can be assessed by contacting the medical device with the composition, shining an excitation light on the composition, and measuring intensity of resulting fluorescence over time.
Hard Surface Cleaning Composition and Cleaning Method
A hard surface cleaning composition comprising: (a) 0.1 to 60 wt % of a surfactant system; (b) 0.1 to 40 wt % of a solvent, wherein the solvent is selected from the group consisting of a lower alkanol, a benzyl alcohol, a lower alkyl ether, a glycol, an aryl glycol ether, a lower alkyl glycol ether, a glycerol ketal, an ester, a hydrocarbon/ester blend, a dibasic ester, a linear alcohol ethoxylate, a branched alcohol, oxo alcohol ethoxylate, and combinations thereof; and (c) optionally 0.001 to 10 wt % of a lipase.
Cleaning composition for oral appliance
A cleaning composition for an oral appliance, including (A) and (B). (A) 0.05 mass % or more and 8 mass % or less of an anionic homopolymer or copolymer which has a mass average molecular weight of 2,000 or higher and 500,000 or lower and includes a constituent unit derived from (a1) an anionic monomer having a carboxyl group, a sulfo group, or a phosphoric acid group. (B) one or more surfactants selected from the group consisting of an anionic surfactant, a nonionic surfactant, and an amphoteric surfactant.
Composition and process for selectively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten
Described herein is a method of using a cleaning composition in combination with one or more oxidants for removing post-etch or post-ash residue from the surface of a semiconductor substrate and/or for oxidative etching or partially oxidative etching of a layer or mask. Also described herein is the cleaning composition and a method of using the cleaning composition for removing post-etch or post-ash residue from the surface of a semiconductor substrate. Also described herein is a wet-etch composition including the cleaning composition and one or more oxidants as well as a method of using the wet-etch composition. Also described herein are a process for the manufacture of a semiconductor device from a semiconductor substrate and a kit including the cleaning composition and one or more oxidants.