Described herein are aqueous cleaning compositions comprises a combination of polyalkylenimine and an acid, a surfactant, and a solvent mixture. Methods of making and using the same are also described.

There is provided a means capable of sufficiently removing organic residues present on the surface of an object to be polished after polishing containing silicon nitride or polysilicon. A surface treatment composition containing: a polymer having a constituent unit represented by Formula (1) in [Chem. 1] below; at least one of an anionic surfactant and a nonionic surfactant; and water, in which the surface treatment composition is used for treating the surface of an object to be polished after polishing,

##STR00001## in which, in Formula (1) above, R.sup.1 is a hydrocarbon group having the number of carbon atoms of 1 to 5, and R.sup.2 is a hydrogen atom or a hydrocarbon group having the number of carbon atoms of 1 to 3.

An object of the present invention is to provide a method for producing a treatment liquid, having excellent filterability.

The method for producing a treatment liquid of an embodiment of the present invention is a method for producing a treatment liquid, the method including filtering an object to be purified including a surfactant, using a first filter having a first filter medium, to produce a treatment liquid for a semiconductor substrate, in which the first filter medium includes at least one selected from the group consisting of a nylon, a polyallyl sulfonic acid, a perfluoroalkoxy alkane which has been subjected to a hydrophilization treatment, a polytetrafluoroethylene which has been subjected to a hydrophilization treatment, a polyolefin which has been subjected to a hydrophilization treatment, and a polyvinylidene fluoride which has been subjected to a hydrophilization treatment, and the surfactant includes at least one selected from the group consisting of a nonionic surfactant including a group represented by Formula (1) and an anionic surfactant including a group represented by Formula (1).

Formula (1) (LO).sub.n

L represents an alkylene group, and n represents 3 to 55.

Aqueous solution comprising (A) in the range of from 30 to 60% by weight of a complexing agent, selected from the alkali metal salts of methylglycine diacetic acid and the alkali metal salts of glutamic acid diacetic acid, (B) in the range of from 1 to 25% by weight of at least one salt of a sulfonic acid or of an organic acid, percentages referring to the total respective aqueous solution.

Pouch including a cleaning composition, the pouch includes a compartment housing a liquid composition, the liquid composition includes a liquid soil-suspension polymer.

A surfactant composition comprising a sugar-based surfactant comprising a C8-C16 alkyl glucoside, a C8-C16 alkyl polyglucoside, or a combination of a C8-C16 alkyl glucoside and a C8-C16 alkyl polyglucoside; a C8-C18 amphodiacetate; a C8-C16 acyl sarcosinate, a C8-C16 acyl glutamate, a C8-C16 acyl glycinate, or a combination thereof; and optionally a C8-C14 acyl lactylate, wherein the composition is free of sulfated anionic surfactants.

A laundry detergent composition contains a dye fixative and an amine-based surfactant.

A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.

Cleaning compositions that include a nuclease enzyme and an amine. Methods of making and using such cleaning compositions. Use of an amine. Use of a nuclease enzyme.

Cleaning compositions that include a nuclease enzyme and one or more malodor reduction materials. Methods of making and using such cleaning compositions. Use of malodor reduction materials.