Patent classifications
C11D7/14
Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures
The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120 F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.
Foam control ingredient comprising glycerol monooleate sorbed on zeolite for detergent composition
The present invention is in the field of fabric cleaning compositions; in particular powder detergent compositions having foaming and cleaning characteristics in the main wash, yet significant foam reduction during rinse. Accordingly the present inventors have investigated ways of improving the defoaming ingredient such that the defoaming ingredient has improving foam-subsiding effects in the rinse stage. However they found that incorporating a monoester of glycerol of unsaturated fatty acids in a cleaning composition has adverse effects on the perfume impact of the cleaning composition. The inventors have found that the disadvantages of the prior art can be overcome, if a monoester of glycerol and unsaturated fatty acid is sorbed by a porous carrier material having a specific pore size and pH ranges. The inventive defoaming ingredient did not masked and/or altered the perfume delivery of the detergent composition.
Solid and liquid textile-treating compositions
Provided herein are solid textile treating compositions; compositions containing colorants stabilized with one or more colorant stabilizers; compositions containing colorants that do not need to be stabilized by one or more colorant stabilizers; solid wash cycle conditioning agents; liquid textile treating compositions; cleaning agent compositions containing these; methods of making these; methods of treating textiles with these; textiles treated by these; containers containing the compositions; and methods of visually designating when a composition has reached or passed its pull date.
Solid and liquid textile-treating compositions
Provided herein are solid textile treating compositions; compositions containing colorants stabilized with one or more colorant stabilizers; compositions containing colorants that do not need to be stabilized by one or more colorant stabilizers; solid wash cycle conditioning agents; liquid textile treating compositions; cleaning agent compositions containing these; methods of making these; methods of treating textiles with these; textiles treated by these; containers containing the compositions; and methods of visually designating when a composition has reached or passed its pull date.
Product for cleaning surfaces
A product for cleaning a surface includes a combination of a first composition with a second composition. The first composition includes hydrogen peroxide and makes up 94-99.5% of the combination by weight. The second composition includes at least one of a silicate, a carbonate, a bicarbonate and a percarbonate and makes up 0.5-6% of the combination by weight. The first composition and the second composition are stored in separate vessels until combined to form the combination. The combination is applied to the surface after mixing.
Product for cleaning surfaces
A product for cleaning a surface includes a combination of a first composition with a second composition. The first composition includes hydrogen peroxide and makes up 94-99.5% of the combination by weight. The second composition includes at least one of a silicate, a carbonate, a bicarbonate and a percarbonate and makes up 0.5-6% of the combination by weight. The first composition and the second composition are stored in separate vessels until combined to form the combination. The combination is applied to the surface after mixing.
SUPPORT MATERIAL FORMULATION AND ADDITIVE MANUFACTURING PROCESSES EMPLOYING SAME
Novel support material formulations, characterized as providing a cured support material with improved dissolution rate, while maintaining sufficient mechanical strength, are disclosed. The formulations comprise a water-miscible non-curable polymer, a first water-miscible, curable material and a second, water-miscible material that is selected capable of interfering with intermolecular interactions between polymeric chains formed upon exposing the first water-miscible material to curing energy. Methods of fabricating a three-dimensional object, and a three-dimensional object fabricated thereby are also disclosed.
SUPPORT MATERIAL FORMULATION AND ADDITIVE MANUFACTURING PROCESSES EMPLOYING SAME
Novel support material formulations, characterized as providing a cured support material with improved dissolution rate, while maintaining sufficient mechanical strength, are disclosed. The formulations comprise a water-miscible non-curable polymer, a first water-miscible, curable material and a second, water-miscible material that is selected capable of interfering with intermolecular interactions between polymeric chains formed upon exposing the first water-miscible material to curing energy. Methods of fabricating a three-dimensional object, and a three-dimensional object fabricated thereby are also disclosed.
Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility
A liquid removal composition and process for removing anti-reflective coating (ARC) material and/or post-etch residue from a substrate having same thereon. The composition achieves at least partial removal of ARC material and/or post-etch residue in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric and nitride-containing materials employed in the semiconductor architecture.
Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility
A liquid removal composition and process for removing anti-reflective coating (ARC) material and/or post-etch residue from a substrate having same thereon. The composition achieves at least partial removal of ARC material and/or post-etch residue in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric and nitride-containing materials employed in the semiconductor architecture.