Patent classifications
C23C16/347
Sliding member and method for producing the same
In an amorphous carbon film of a sliding member, provided that a number of nitrogen atoms each singly bonded to three carbon atoms is A, and a number of nitrogen atoms each singly and doubly bonded to two carbon atoms, respectively, is B, a value A/B of the amorphous carbon film obtained through X-ray photoelectron spectroscopy analysis is 10 to 18. The method includes irradiating the surface of the substrate with nitrogen ion beams and irradiating a carbon target with electron beams, thereby forming an amorphous carbon film on the surface of the substrate while vapor-depositing a part of the carbon target onto the surface of the substrate. The output of the electron beams that irradiate the carbon target is 30 to 50 W.
Coated cutting tool
A coated cutting tool comprising a substrate and a coating layer formed on a surface of the substrate, the coating layer including at least one -type aluminum oxide layer, wherein, in the -type aluminum oxide layer, a texture coefficient TC (1,0,16) of a (1,0,16) plane is 1.4 or more.
Coated cutting tool
A coated cutting tool comprising a substrate and a coating layer formed on a surface of the substrate, the coating layer including at least one -type aluminum oxide layer, wherein, in the -type aluminum oxide layer, a texture coefficient TC (1,2,11) of a (1,2,11) plane is 1.4 or more.
Surface-Coated Cutting Tool and Method for Manufacturing the Same
A surface-coated cutting tool includes a substrate and a coating formed on a surface of the substrate, the coating including one or two or more layers, at least one of the layers being an Al-rich layer including hard particles, the hard particle having a sodium chloride type crystal structure, and including a first unit phase in a form of a plurality of lumps and a second unit phase interposed between the lumps of the first unit phase, the first unit phase being composed of a nitride or carbonitride of Al.sub.xTi.sub.1-x, the first unit phase having an atomic ratio x of Al of 0.7 or more and 0.96 or less, the second unit phase being composed of a nitride or carbonitride of Al.sub.yTi.sub.1-y, the second unit phase having an atomic ratio y of Al exceeding 0.5 and less than 0.7.
NUCLEAR COMPONENT WITH A METAL SUBSTRATE, METHOD FOR THE PRODUCTION THEREOF BY DLI-MOCVD, AND USES OF SAME FOR CONTROLLING OXIDATION/HYDRIDATION
Process for manufacturing a nuclear component comprising i) a support containing a substrate based on a metal (1), the substrate (1) being coated or not coated with an interposed layer (3) positioned between the substrate (1) and at least one protective layer (2) and ii) the protective layer (2) composed of a protective material comprising chromium; the process comprising a step a) of vaporizing a mother solution followed by a step b) of depositing the protective layer (2) onto the support via a process of chemical vapor deposition of an organometallic compound by direct liquid injection (DLI-MOCVD).
Nuclear component comprising i) a support containing a substrate based on a metal, the substrate (1) being coated or not coated with an interposed layer (3) positioned between the substrate (1) and at least one protective layer (2) and ii) the protective layer (2) composed of a protective material comprising chromium. The composite nuclear component manufactured by the process of the invention has improved resistance to oxidation, hydriding and/or migration of undesired material.
The invention also relates to the use of the nuclear component for combating oxidation and/or hydriding.
NUCLEAR COMPONENT WITH AMORPHOUS CRC COATING, METHOD FOR THE PRODUCTION THEREOF BY DLI-MOCVD, AND USES OF SAME FOR CONTROLLING OXIDATION/HYDRIDATION
Process for manufacturing a nuclear component comprising i) a support containing a substrate based on a metal (1), the substrate (1) being coated or not coated with an interposed layer (3) positioned between the substrate (1) and at least one protective layer (2) and ii) the protective layer (2) composed of a protective material comprising amorphous chromium carbide; the process comprising a step a) of vaporizing a mother solution followed by a step b) of depositing the protective layer (2) onto the support via a process of chemical vapor deposition of an organometallic compound by direct liquid injection (DLI-MOCVD).
Nuclear component comprising i) a support containing a substrate based on a metal, the substrate (1) being coated or not coated with an interposed layer (3) positioned between the substrate (1) and at least one protective layer (2) and ii) the protective layer (2) composed of a protective material comprising amorphous chromium carbide. The composite nuclear component manufactured by the process of the invention has improved resistance to oxidation, hydriding and/or migration of undesired material.
The invention also relates to the use of the nuclear component for combating oxidation and/or hydriding.
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
There is provided a process of forming a film containing a metal element, an additional element different from the metal element and at least one of nitrogen and carbon on a substrate by performing a cycle a predetermined number of times, the cycle including non-simultaneously performing: (a) supplying a first precursor gas containing the metal element and a second precursor gas containing the additional element to the substrate so that supply periods of the first precursor gas and the second precursor gas at least partially overlap with each other; and (b) supplying a reaction gas containing the at least one of nitrogen and carbon to the substrate.
GRADED IN-SITU CHARGE TRAPPING LAYERS TO ENABLE ELECTROSTATIC CHUCKING AND EXCELLENT PARTICLE PERFORMANCE FOR BORON-DOPED CARBON FILMS
The present disclosure generally relates to processing chamber seasoning layers having a graded composition. In one example, the seasoning layer is a boron-carbon-nitride (BCN) film. The BCN film may have a greater composition of boron at the base of the film. As the BCN film is deposited, the boron concentration may approach zero, while the relative carbon and nitrogen concentration increases. The BCN film may be deposited by initially co-flowing a boron precursor, a carbon precursor, and a nitrogen precursor. After a first period of time, the flow rate of the boron precursor may be reduced. As the flow rate of boron precursor is reduced, RF power may be applied to generate a plasma during deposition of the seasoning layer.
SURFACE-COATED CUTTING TOOL
A surface-coated cutting tool includes a substrate and a coating that is disposed on the substrate and formed so as to cover at least a portion of a flank face, in which the coating includes an inner layer and an outer layer formed on the inner layer, the inner layer is formed of at least one layer and includes an aluminum oxide layer as a layer in contact with the outer layer, the outer layer has a multilayer structure that includes three or more layers stacked on top of one another, and each of the layers that constitute the multilayer structure contains titanium.
METHOD AND SYSTEM FOR DEPOSITING BORON CARBON NITRIDE
Methods for forming a layer comprising boron carbon nitride on a substrate by a plasma enhanced atomic layer deposition (PEALD) process are provided. The methods comprise executing a plurality of deposition cycles. A deposition cycle comprises a boron precursor pulse that comprises exposing the substrate to a boron precursor and a silicon-containing precursor pulse that comprises exposing the substrate to a silicon-containing precursor. A deposition cycle further comprises a plasma pulse that comprises exposing the substrate to a plasma treatment. The plasma treatment comprises generating a plasma.