Patent classifications
C23C16/404
ORGANIC METAL COMPOUND, COMPOSITION FOR DEPOSITING THIN FILM COMPRISING THE ORGANIC METAL COMPOUND, MANUFACTURING METHOD FOR THIN FILM USING THE COMPOSITION, THIN FILM MANUFACTURED FROM THE COMPOSITION, AND SEMICONDUCTOR DEVICE INCLUDING THE THIN FILM
An organometallic compound represented by Chemical Formula 1 may be used in a composition for depositing a thin film including the organometallic compound, where A is derived from a compound represented by Chemical Formula 2:
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Embodiments of the present disclosure include the thin film, a manufacturing method for the thin film using the composition for depositing the thin film, and a semiconductor device including the thin film.
COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE ARTICLES AND APPARATUS
Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that is deleterious to the substrate article, structure, material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
CALCIUM COPPER TITANATE FILM PREPARATION METHOD AND CALCIUM COPPER TITANATE FILM
The present disclosure provides a calcium copper titanate film preparation method and a calcium copper titanate film, where the calcium copper titanate film has excellent step coverage, film thickness uniformity and film continuity, is particularly suitable for a high aspect ratio structure. The calcium copper titanate film preparation method includes: forming a layered deposition structure on a substrate, where the layered deposition structure includes at least one titanium dioxide layer, at least one copper oxide layer and at least one calcium oxide or calcium carbonate layer; and subjecting the layered deposition structure to high-temperature annealing treatment in an oxygen-containing atmosphere to obtain a calcium copper titanate film.
COATING SYSTEM HAVING SYNTHETIC OXIDE LAYERS
A coating system for a turbine engine component is disclosed. The coating system includes a substrate, an optional bond coat, a synthetic oxide layer and a top coat. The synthetic oxide layer is formed by atomic layer deposition and includes two or more oxides.
Apparatus and Method of Treating a Lithium-Ion-Battery Part
An apparatus (100) for treating a lithium-ion battery part, such as an electrode (212), is disclosed as including deposition devices (203, 204, 205, 206) for depositing lithium onto the battery part by physical vapour deposition and/or chemical vapour deposition. A method of treating a lithium-ion battery part is disclosed as including providing a lithium-ion battery part, and depositing lithium onto said component by physical vapour deposition and/or chemical vapour deposition.
Thin-film phosphor deposition
An enhanced vision system includes an image intensifier that includes a phosphor screen. The phosphor screen includes a thin-film phosphor layer deposited, patterned, transferred, or otherwise disposed on the substrate using a thin-film deposition technique. A conductive layer is deposited across at least a portion of the phosphor layer. The relatively smooth morphology of the phosphor layer beneficially permits the use of a relatively thin conductive layer. The use of a relatively thin conductive layer advantageously reduces the operating voltage between an electron multiplier and the phosphor screen. A secondary electron emitter may be disposed across at least a portion of the conductive layer.
THIN-FILM PHOSPHOR DEPOSITION
An enhanced vision system includes an image intensifier that includes a phosphor screen. The phosphor screen includes a thin-film phosphor layer deposited, patterned, transferred, or otherwise disposed on the substrate using a thin-film deposition technique. A conductive layer is deposited across at least a portion of the phosphor layer. The relatively smooth morphology of the phosphor layer beneficially permits the use of a relatively thin conductive layer. The use of a relatively thin conductive layer advantageously reduces the operating voltage between an electron multiplier and the phosphor screen. A secondary electron emitter may be disposed across at least a portion of the conductive layer.
Coatings for enhancement of properties and performance of substrate articles and apparatus
Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that deleterious to the substrate article, structure material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
ATOMIC LAYER DEPOSITION COATINGS FOR HIGH TEMPERATURE HEATERS
Embodiments of the disclosure relate to articles, coated chamber components and methods of coating chamber components with a low volatile coating. The low volatile coating can include a rare earth metal-containing layer that coats all surfaces of a component (e.g., a high temperature heater).
COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE ARTICLES AND APPARATUS
Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that deleterious to the substrate article, structure material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.