Patent classifications
C23C16/408
Methods and Systems for Fabricating High Quality Superconducting Tapes
An MOCVD system fabricates high quality superconductor tapes with variable thicknesses. The MOCVD system can include a gas flow chamber between two parallel channels in a housing. A substrate tape is heated and then passed through the MOCVD housing such that the gas flow is perpendicular to the tape's surface. Precursors are injected into the gas flow for deposition on the substrate tape. In this way, superconductor tapes can be fabricated with variable thicknesses, uniform precursor deposition, and high critical current densities.
DUAL SELECTIVE DEPOSITION
Methods are provided for dual selective deposition of a first material on a first surface of a substrate and a second material on a second, different surface of the same substrate. The selectively deposited materials may be, for example, metal, metal oxide, or dielectric materials.
Methods and Systems for Fabricating High Quality Superconducting Tapes
An MOCVD system fabricates high quality superconductor tapes with variable thicknesses. The MOCVD system can include a gas flow chamber between two parallel channels in a housing. A substrate tape is heated and then passed through the MOCVD housing such that the gas flow is perpendicular to the tape's surface. Precursors are injected into the gas flow for deposition on the substrate tape. In this way, superconductor tapes can be fabricated with variable thicknesses, uniform precursor deposition, and high critical current densities.
CALCIUM COPPER TITANATE FILM PREPARATION METHOD AND CALCIUM COPPER TITANATE FILM
The present disclosure provides a calcium copper titanate film preparation method and a calcium copper titanate film, where the calcium copper titanate film has excellent step coverage, film thickness uniformity and film continuity, is particularly suitable for a high aspect ratio structure. The calcium copper titanate film preparation method includes: forming a layered deposition structure on a substrate, where the layered deposition structure includes at least one titanium dioxide layer, at least one copper oxide layer and at least one calcium oxide or calcium carbonate layer; and subjecting the layered deposition structure to high-temperature annealing treatment in an oxygen-containing atmosphere to obtain a calcium copper titanate film.
ELECTROCHEMICAL DOPING OF THIN METAL LAYERS EMPLOYING UNDERPOTENTIAL DEPOSITION AND THERMAL TREATMENT
A method is provided, including the following operations: depositing a liner in a feature of a substrate; depositing a monolayer of zinc over the liner; after depositing the monolayer of zinc, performing a thermal treatment on the substrate, wherein the thermal treatment is configured to cause migration of the zinc to an interface of the liner and an oxide layer of the substrate, the migration of the zinc producing an adhesive barrier at the interface that improves adhesion between the liner and the oxide layer of the substrate; repeating the operations of depositing the monolayer of zinc and performing the thermal treatment until a predefined number of cycles is reached.
Methods and systems for fabricating high quality superconducting tapes
An MOCVD system fabricates high quality superconductor tapes with variable thicknesses. The MOCVD system can include a gas flow chamber between two parallel channels in a housing. A substrate tape is heated and then passed through the MOCVD housing such that the gas flow is perpendicular to the tape's surface. Precursors are injected into the gas flow for deposition on the substrate tape. In this way, superconductor tapes can be fabricated with variable thicknesses, uniform precursor deposition, and high critical current densities.
Electrochemical doping of thin metal layers employing underpotential deposition and thermal treatment
A method is provided, including the following operations: depositing a ruthenium liner in a feature of a substrate; depositing a monolayer of zinc over the ruthenium liner; after depositing the monolayer of zinc, performing a thermal treatment on the substrate, wherein the thermal treatment is configured to cause migration of the zinc to an interface of the ruthenium liner and an oxide layer of the substrate, the migration of the zinc producing an adhesive barrier at the interface that improves adhesion between the ruthenium liner and the oxide layer of the substrate; repeating the operations of depositing the monolayer of zinc and performing the thermal treatment until a predefined number of cycles is reached.
Dual selective deposition
Methods are provided for dual selective deposition of a first material on a first surface of a substrate and a second material on a second, different surface of the same substrate. The selectively deposited materials may be, for example, metal, metal oxide, or dielectric materials.
Method of producing a separator and method of producing a microporous membrane
A method of producing a separator is provided. The method includes providing a particle membrane including inorganic particles on at least one principal surface of a porous body by a vapor-phase process such that the particle membrane has a porosity that is non-uniform in a thickness direction thereof. A method of producing a microporous membrane is also provided.
Methods and systems for fabricating high quality superconducting tapes
An MOCVD system fabricates high quality superconductor tapes with variable thicknesses. The MOCVD system can include a gas flow chamber between two parallel channels in a housing. A substrate tape is heated and then passed through the MOCVD housing such that the gas flow is perpendicular to the tape's surface. Precursors are injected into the gas flow for deposition on the substrate tape. In this way, superconductor tapes can be fabricated with variable thicknesses, uniform precursor deposition, and high critical current densities.