A coating composition and a method is used to coat metallic substrates for corrosion resistance. The coating composition includes acid, metal acetate, organosilane and water. The method includes steps of depositing the composition on an aluminum or aluminum alloy substrate and allowing the composition to dry to form a sol-gel coating on the substrate.

An anti-corrosion coating to protect against corrosion, comprising: a high-density protective coating on a substrate which is prone to corrosion, preferably metals and/or alloys thereof, containing pre-condensed coat-forming alkoxysilane precursors, wherein the molecules of the pre-condensed coat-forming alkoxysilane precursors are built up from monomer units selected from the group formed by coat-forming alkoxysilane precursors, wherein the molecules of the pre-condensed coat-forming alkoxysilane precursors are cross-linked with each other, wherein the high-density protective coating has a coating thickness of at least 50 μm. The high-density protective coating formed by an inorganic-organic hybrid material, which is preferably produced without solvents (i.e. without the addition of solvents, in particular organic solvents), is comprised of at least one coat-forming alkoxysilane precursor, in particular selected from the group formed by trialkoxysilane precursors.

The invention relates to a process for obtaining a electrode usable as a anode in electrolytic cells for the production of chlorine. The electrode thus obtained comprises a catalytic layer containing oxides of tin, ruthenium, iridium and titanium applied to a substrate of a valve metal.

A printable ammonium-based chalcogenometalate fluid may include an ammonium-based chalcogenometalate precursor; an aqueous solvent; water; and a dopant; wherein, in the presence of heat, the printable ammonium-based chalcogenometalate fluid dissipates to form a transition metal dichalcogenide having the form MX2 with the dopant distributed therethrough.

An insulation film composition for a grain-oriented electrical steel sheet according to an exemplary embodiment of the present invention includes 10-50 parts by weight of metal silicate or organic silicate, 20-70 parts by weight of inorganic nanoparticles and 0.1-20 parts by weight of cobalt hydroxide.

The insulation film composition for the grain-oriented electric steel sheet according to an exemplary embodiment of the present invention includes 10-50 parts by weight of metal phosphate, 5-30 parts by weight of inorganic nanoparticles having a particle diameter of 1 nm to less than 10 nm, inorganic nanoparticles having a particle diameter of 10 to 100 nm and 0.1-20 parts by weight of chromium oxide.

The present inventing relates to a method for marking at least one inner face of a container with at least one given pattern, in which method the inside of said inner face is at least partially coated with a pigmented sol-gel layer that reacts to laser radiation, by spraying or by means of a stamp applied to a precise zone of the layer provided for containing the pattern, and the pattern is developed by interaction between the sol-gel and UV laser radiation specifically programmed according to the pattern to be revealed, the UV laser radiation being emitted by a device comprising an optical system having a long optical length that allows a field depth of more than 1 mm to be obtained. The present invention also relates to a device suitable for implementing this method and to a container obtained by this method.

The present invention relates to a composition comprising; components a. c. and d; and optional component b. wherein, component a. is a metal compound having the structure (I), optional component b., is a polyol additive, having structure (VI), component c. is a high performance polymer additive, and component d. is a solvent. The present invention further relates to using this compositions in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma. ##STR00001##

A display panel and a fabricating method thereof are provided. The fabricating method of the display panel has steps of: providing a substrate; forming a light conversion layer on the substrate, wherein material of the light conversion layer has a perovskite structural material with a chemical formula of ABX.sub.3, wherein A represents an inorganic element, B represents an inorganic element, and X represents a halogen; performing a patterning step on the light conversion layer by an antisolvent method, wherein the light conversion layer forms a plurality of light conversion patterns; and forming a pixel layer on the light conversion layer, wherein the pixel layer has a plurality of pixel units, and the plurality of pixel units are respectively aligned with the plurality of light conversion patterns. The fabricating method can reduce a dark state brightness of the display panel, thereby improving contrast of the display panel.

In some embodiments, a semiconductor fabrication tool is provided. The semiconductor fabrication tool includes a first processing zone having a first ambient environment and a second processing zone having a second ambient environment disposed at different location inside a processing chamber. A first exhaust port and a second exhaust port are disposed in the first and second processing zones, respectively. A first exhaust pipe couples the first exhaust port to a first individual exhaust output. A second exhaust pipe couples the second exhaust port to a second individual exhaust output, where the second exhaust pipe is separate from the first exhaust pipe. A first adjustable fluid control element controls the first ambient environment. A second adjustable fluid control element controls the second ambient environment, where the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable.

The invention relates to a process for treating a metal alloy part, characterized in that it comprises the following steps: —producing a stock formulation by mixing, in equal molar parts of silicon, an alcoholic solution of hydrolysed epoxysilane and an alcoholic solution of hydrolysed aminosilane, —mixing the stock formulation with a suspension comprising conductive nanowires in an amount by weight of between 0.1% and 10% relative to the total weight of the stock formulation in order to obtain a dilute formulation, and —depositing the dilute formulation on the part in order to obtain the coating.