A coated glass or glass ceramic substrate includes a substrate with a surface area and a coating on that surface area. The coating includes a glass matrix and IR-reflecting pigments. The IR-reflecting pigments have a TSR value of at least 20%, as determined according to ASTM G 173. The coating, at a wavelength of 1500 nm, exhibits a remission of at least 35%, as measured according to ISO 13468.

Coated glass or glass ceramic substrates having high temperature resistance, high strength, and a low coefficient of thermal expansion. The coating includes pores, is fluid-tight and suitable for coating a temperature-resistant, high-strength glass or glass ceramic substrate with a low coefficient of thermal expansion, and to a method for producing such a coated substrate.

Coated glass or glass ceramic substrates having high temperature resistance, high strength, and a low coefficient of thermal expansion. The coating includes pores, is fluid-tight and suitable for coating a temperature-resistant, high-strength glass or glass ceramic substrate with a low coefficient of thermal expansion, and to a method for producing such a coated substrate.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include silicon dioxide (SiO.sub.2) at 25 to 50 wt %; boron oxide (B.sub.2O.sub.3) at 1 to 15 wt %; one or more of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O) at 10 to 20 wt %; sodium fluoride (NaF) at 1 to 5 wt %; zinc oxide (ZnO) at 1 to 10 wt %; and one or more of titanium dioxide (TiO.sub.2), molybdenum trioxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), or cerium dioxide (CeO.sub.2) at 20 to 40 wt %, such that a heating time required for cleaning is shortened and cleaning is possible without carrying out a water soaking process.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of silicon dioxide (SiO.sub.2); 1 to 10 wt % of boron oxide (B.sub.2O.sub.3); 10 to 20 wt % of at least one of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of sodium fluoride (NaF); 1 to 10 wt % of zinc oxide (ZnO); and 20 to 50 wt % of at least one of titanium dioxide (TiO.sub.2), molybdenum oxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), cerium dioxide (CeO.sub.2), manganese dioxide (MnO.sub.2), or Iron oxide (Fe.sub.2O.sub.3), which provides an enamel composition with a reduced cleaning time, and facilitates cleaning without soaking in water.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of silicon dioxide (SiO.sub.2); 1 to 10 wt % of boron oxide (B.sub.2O.sub.3); 10 to 20 wt % of at least one of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of sodium fluoride (NaF); 1 to 10 wt % of zinc oxide (ZnO); and 20 to 50 wt % of at least one of titanium dioxide (TiO.sub.2), molybdenum oxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), cerium dioxide (CeO.sub.2), manganese dioxide (MnO.sub.2), or Iron oxide (Fe.sub.2O.sub.3), which provides an enamel composition with a reduced cleaning time, and facilitates cleaning without soaking in water.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (P.sub.2O.sub.5); 5 to 20 wt % of one or more of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF.sub.2), or aluminum fluoride (AlF.sub.3); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of manganese dioxide (MnO.sub.2), molybdenum trioxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), or nickel oxide (NiO). The enamel composition may be cleaned without being putting it into water.

The present invention relates to a particle mixture comprising particles of glass frit and particles of a crystalline oxide material, wherein the glass frit comprises silicon oxide (SiO.sub.2), zinc oxide (ZnO) and sulfur (S) and wherein the D90 particle size of the particle mixture is less than 5 microns. The particle mixture may be used to apply an enamel to a substrate. The present invention further relates to the use of the particle mixture to form an enamel on a substrate, to a glass sheet and to an automotive window pane.

The present invention relates to a particle mixture comprising particles of glass frit and particles of a crystalline oxide material, wherein the glass frit comprises silicon oxide (SiO.sub.2), zinc oxide (ZnO) and sulfur (S) and wherein the D90 particle size of the particle mixture is less than 5 microns. The particle mixture may be used to apply an enamel to a substrate. The present invention further relates to the use of the particle mixture to form an enamel on a substrate, to a glass sheet and to an automotive window pane.

A drinking implement includes: a first opening; a lumen; a second opening fluidly coupled to the first opening and the lumen; and a wall including a glass and extending from the first opening to the second opening and surrounding the lumen. The wall has an inner surface facing toward the lumen and an outer surface facing away from the lumen. The wall has a first compressive stress layer extending from the inner surface to a first depth within the wall, a second compressive stress layer extending from the outer surface to a second depth within the wall, and a tensile stress layer disposed within the wall at a depth between the first compressive stress layer and the second compressive stress layer. The second depth is from 0.05% to 25% of a thickness of the wall.