C04B41/5032

Ceramic coating film-provided member and glass article manufacturing apparatus using it
11485687 · 2022-11-01 · ·

To form, on a ceramic member or a metal member, a thermal spray ceramic coating film which achieves both the quality of a ceramic coating film and gas barrier property, and with which a composite oxide having a melting point lower than the ambient temperature will not form when used as a coating film on a ceramic member or a metal member constituting a glass article manufacturing apparatus. A ceramic coating film-provided member comprising a ceramic member or a metal member and a thermal spray ceramic coating film formed on at least a part of the surface of the ceramic member or the metal member, wherein the thermal spray ceramic coating film contains Al.sub.2O.sub.3 and 12CaO.7Al.sub.2O.sub.3, and the weight ratio of CaO to Al.sub.2O.sub.3 (CaO/Al.sub.2O.sub.3) is more than 0.11 to 0.50.

Ceramic coating film-provided member and glass article manufacturing apparatus using it
11485687 · 2022-11-01 · ·

To form, on a ceramic member or a metal member, a thermal spray ceramic coating film which achieves both the quality of a ceramic coating film and gas barrier property, and with which a composite oxide having a melting point lower than the ambient temperature will not form when used as a coating film on a ceramic member or a metal member constituting a glass article manufacturing apparatus. A ceramic coating film-provided member comprising a ceramic member or a metal member and a thermal spray ceramic coating film formed on at least a part of the surface of the ceramic member or the metal member, wherein the thermal spray ceramic coating film contains Al.sub.2O.sub.3 and 12CaO.7Al.sub.2O.sub.3, and the weight ratio of CaO to Al.sub.2O.sub.3 (CaO/Al.sub.2O.sub.3) is more than 0.11 to 0.50.

Spiral-orifice ceramic filter for metal casting

A spiral-orifice ceramic filter for metal casting, including spiral channels and two drain openings, where the spiral channels are distributed in a ceramic substrate in a staggered manner. By adoption of the spiral channel structure, molten metal may rotate to generate a centrifugal force while flowing forwards so as to promote separation of inclusions. The spiral-orifice ceramic filter for metal casting includes the following components: 90-95 wt % of MgO, 4-8 wt % of SiO.sub.2 and 2-4 wt % of ZrO.sub.2. Therefore, the spiral-orifice ceramic filter for metal casting has high strength under normal temperature and optional thermal impact resistance under high temperature, and may tolerate the impact of molten metal at 1700° C. or higher without break. The ceramic substrate and the spiral channel are superficially coated with one layer of functional oxide prepared from CaO.2Al.sub.2O.sub.3, CaO.6Al.sub.2O.sub.3, Al.sub.2O.sub.3, TiO.sub.2, or Re.sub.2O.sub.3.

Methods for fabricating protective coating systems for gas turbine engine applications

Methods for fabricating protective coating systems for gas turbine engine applications are provided. An exemplary method of applying a protective coating to a substrate includes the steps of providing a substrate formed of a ceramic matrix composite material, forming a first coating layer directly on to the substrate and comprising an oxygen barrier material, a compliance material, or a bonding material and forming a second coating layer directly on to the first coating layer and comprising a thermal barrier material. The method optionally includes forming a third coating layer partially directly on to the second coating layer and partially within at least some of the plurality of pores of the second coating layer.

Methods for fabricating protective coating systems for gas turbine engine applications

Methods for fabricating protective coating systems for gas turbine engine applications are provided. An exemplary method of applying a protective coating to a substrate includes the steps of providing a substrate formed of a ceramic matrix composite material, forming a first coating layer directly on to the substrate and comprising an oxygen barrier material, a compliance material, or a bonding material and forming a second coating layer directly on to the first coating layer and comprising a thermal barrier material. The method optionally includes forming a third coating layer partially directly on to the second coating layer and partially within at least some of the plurality of pores of the second coating layer.

ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS

A method includes performing ion beam sputtering with ion assisted deposition to deposit a protective layer on a surface of a body. The protective layer is a plasma resistant rare earth-containing film of a thickness less than 1000 .Math.m. The porosity of the protective layer is below 1%. The plasma resistant rare earth-containing film consists of 40 mol% to less than 100 mol% of Y.sub.2O.sub.3, over 0 mol% to 60 mol% of ZrO.sub.2, and 0 mol% to 9 mol% of Al.sub.2O.sub.3.

ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS

A method includes performing ion beam sputtering with ion assisted deposition to deposit a protective layer on a surface of a body. The protective layer is a plasma resistant rare earth-containing film of a thickness less than 1000 .Math.m. The porosity of the protective layer is below 1%. The plasma resistant rare earth-containing film consists of 40 mol% to less than 100 mol% of Y.sub.2O.sub.3, over 0 mol% to 60 mol% of ZrO.sub.2, and 0 mol% to 9 mol% of Al.sub.2O.sub.3.

Ion beam sputtering with ion assisted deposition for coatings on chamber components

A method of manufacturing an article includes providing a component for an etch reactor. Ion beam sputtering with ion assisted deposition (IBS-IAD) is then performed to deposit a protective layer on at least one surface of the component, wherein the protective layer is a plasma resistant film having a thickness of less than 1000 μm.

Ion beam sputtering with ion assisted deposition for coatings on chamber components

A method of manufacturing an article includes providing a component for an etch reactor. Ion beam sputtering with ion assisted deposition (IBS-IAD) is then performed to deposit a protective layer on at least one surface of the component, wherein the protective layer is a plasma resistant film having a thickness of less than 1000 μm.

WAVELENGTH CONVERSION DEVICE, MANUFACTURING METHOD THEREOF, AND RELATED ILLUMINATION DEVICE

A wavelength conversion device, a manufacturing method thereof, and a related illumination device. The wavelength conversion device comprises a fluorescent powder layer (110) that is successively stacked, a diffuse reflection layer (120), and a high-thermal-conductivity substrate (130). The diffuse reflection layer (120) comprises white scattered particles for scattering the incident light; the high-thermal-conductivity substrate (130) is one of an aluminum nitride substrate, a silicon nitride substrate, a silicon carbide substrate, a boron nitride substrate, and a beryllium oxide substrate. The wavelength conversion device has good reflectivity and thermal stability.