Disclosed are aromatic dicarbinol compounds that may have utility in a variety of chemical applications such as plasticizers, diluents, wetting agents and paint additives and as intermediates in chemical processes. The aromatic dicarbinols have particular utility as reactants in processes for the synthesis of aromatic enol ether compounds.

A resist underlayer film for use in lithography process which generates less sublimate, has excellent embeddability at the time of applying onto a substrate having a hole pattern, and has high dry etching resistance, wiggling resistance and heat resistance, etc. A resist underlayer film-forming composition including a resin and a crosslinkable compound of Formula (1) or Formula (2): ##STR00001##
in which Q.sup.1 is a single bond or an m1-valent organic group, R.sup.1 and R.sup.4 are each a C.sub.2-10 alkyl group or a C.sub.2-10 alkyl group having a C.sub.1-10 alkoxy group, R.sup.2 and R.sup.5 are each a hydrogen atom or a methyl group, R.sup.3 and R.sup.6 are each a C.sub.1-10 alkyl group or a C.sub.6-40 aryl group.

Farnesol analogs, along with their related products (e.g., treatment compositions, wipes, absorbent articles, etc.) and their methods of formation, are provided. The farnesol analog includes a hydrophilic end group (e.g., a hydroxyl end group or a carboxylic acid end group) attached to farnesol via a covalent linkage (e.g., an ester group or an ether group).

The present invention relates to brominated polyether polyols, processes for the production as well as intermediates useful in the production of the same and to processes for the preparation of flame-retardant blends, premixes as well as polyurethane foams.

The present disclosure provides a composition comprising a surfactant compound containing aromatic groups in the hydrophobe. Also disclosed are personal care formulations and performance chemical formulations, such as agrochemical formulations, that comprise such surfactant compounds.

Disclosed is a two-step process to make a dialdehyde. In the process a diepoxide is first hydrolyzed with an alcohol solvent to an intermediate which is then subjected to a double-Pinacol rearrangement to obtain a dialdehyde. The dialdehydes have utility as chemical intermediates, and particular utility in processes to make enol ether compounds which can be used in applications as plasticizers, diluents, wetting agents, coalescing aids and as intermediates in chemical processes.

Disclosed is a two-step process to make a dialdehyde. In the process a diepoxide is first hydrolyzed with an alcohol solvent to an intermediate which is then subjected to a double-Pinacol rearrangement to obtain a dialdehyde. The dialdehydes have utility as chemical intermediates, and particular utility in processes to make enol ether compounds which can be used in applications as plasticizers, diluents, wetting agents, coalescing aids and as intermediates in chemical processes.

Disclosed is an anti-oxidation stabilizer, which has the following structure (A), wherein RI is a connection chain, and the connection chain is a fatty chain, an aromatic structural chain or a fatty and aromatic structurally combined chain; R2 is (B), and X is O, S, N or NH or CONR, Z is O, S, N or NH, and X is different from Z; R is a fatty chain, an aromatic group, a sterically hindered amine or sterically hindered phenol, R3 is a fatty chain, an aromatic group, a sterically hindered amine or sterically hindered phenol, and R is identical to R3, or R is different from R3; n is a positive integer including 1, n1 is a positive integer including 1, and n is identical to n1, or n is different from n1.

The invention relates to a method for producing radiation-curable alkenyl ether polyols, to radiation-curable alkenyl ether polyols produced using the method according to the invention, and to the use thereof for the synthesis of radiation-interlinkable oligomers or polymers by means of polyaddition reactions or polycondensation reactions, in particular for the synthesis of radiation-curable polyesters, polyethers, polyurethanes and polyureas, particularly preferably UV-curable polyurethanes. The invention also relates to radiation-curable polyurethane polymers that are obtained by reacting at least one alkenyl ether polyol according to the invention with a polyisocyanate.

The invention relates to a method for producing radiation-curable alkenyl ether polyols, to radiation-curable alkenyl ether polyols produced using the method according to the invention, and to the use thereof for the synthesis of radiation-interlinkable oligomers or polymers by means of polyaddition reactions or polycondensation reactions, in particular for the synthesis of radiation-curable polyesters, polyethers, polyurethanes and polyureas, particularly preferably UV-curable polyurethanes. The invention also relates to radiation-curable polyurethane polymers that are obtained by reacting at least one alkenyl ether polyol according to the invention with a polyisocyanate.