Patent classifications
C08F12/20
SIC SEPARATOR AND SIC CELL
A separator and/or protective layer for a lithium cell. In order to enable rapid charging of the cell and to extend the service life of the cell, the separator and/or the protective layer encompasses a copolymer and/or a polymer blend, the copolymer encompassing at least one repeating unit for constituting a polymer having a lithium-ion transference number >0.7 and at least one mechanically stabilizing repeating unit, and/or the polymer blend encompassing at least one polymer having a lithium-ion transference number >0.7 and at least one mechanically stabilizing polymer. Cells, and copolymers, polymer blends, and polymer electrolytes on the basis of polymers having a lithium-ion transference number >0.7, are also described.
SIC SEPARATOR AND SIC CELL
A separator and/or protective layer for a lithium cell. In order to enable rapid charging of the cell and to extend the service life of the cell, the separator and/or the protective layer encompasses a copolymer and/or a polymer blend, the copolymer encompassing at least one repeating unit for constituting a polymer having a lithium-ion transference number >0.7 and at least one mechanically stabilizing repeating unit, and/or the polymer blend encompassing at least one polymer having a lithium-ion transference number >0.7 and at least one mechanically stabilizing polymer. Cells, and copolymers, polymer blends, and polymer electrolytes on the basis of polymers having a lithium-ion transference number >0.7, are also described.
Cured film-forming composition
Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R.sup.1 denotes hydrogen or a methyl group, and R.sup.2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R.sup.2.) ##STR00001##
Neutral Layer Composition
A neutral layer composition, which is capable of forming a neutral layer that can effectively control orientation characteristics of various block copolymers is provided.
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
A radiation-sensitive resin composition contains: a first polymer including a first structural unit that includes a phenolic hydroxy group, and a second structural unit that includes an acid-labile group; a second polymer including a fluorine atom, a silicon atom, or both, and including a third structural unit that includes an alkali-labile group; a first compound that generates upon an irradiation with a radioactive ray an acid capable of dissociating the acid-labile group within 1 minute under a temperature T.sup.X C. of no less than 80 C. and no greater than 130 C.; and a second compound that generates upon an irradiation with a radioactive ray a carboxylic acid, a sulfonic acid, or both, the carboxylic acid and the sulfonic acid each being not capable of substantially dissociating the acid-labile group within 1 minute under the temperature T.sup.X C.
Method for the preparation of nitrated styrenic fluoropolymers
Disclosed is a process for making nitrated styrenic fluoropolymers having various degrees of substitution. The nitrated styrenic fluoropolymer is capable of providing an exceptionally high birefringence ranging from 0.02 to 0.036. Further, the birefringence can be tuned by varying the degree of substitution (DS) of the nitro group on the styrenic ring to meet the need for optical compensation film applications. More particularly, the optical compensation films of the present invention are for use in an in-plane switching LCD (IPS-LCD) and OLED display.
Method for the preparation of nitrated styrenic fluoropolymers
Disclosed is a process for making nitrated styrenic fluoropolymers having various degrees of substitution. The nitrated styrenic fluoropolymer is capable of providing an exceptionally high birefringence ranging from 0.02 to 0.036. Further, the birefringence can be tuned by varying the degree of substitution (DS) of the nitro group on the styrenic ring to meet the need for optical compensation film applications. More particularly, the optical compensation films of the present invention are for use in an in-plane switching LCD (IPS-LCD) and OLED display.
FLUORINE-CONTAINING ACTIVE ENERGY RAY CURABLE RESIN, SURFACTANT, ACTIVE ENERGY RAY CURABLE RESIN COMPOSITION, AND CURED FILM
Objects are to provide a fluorine-containing active energy ray curable resin which may be suitably used as a surfactant in an aqueous active energy ray curable resin composition, to provide an active energy ray curable resin composition including the resin, and to provide a cured product obtained by curing the composition. Specifically, a fluorine-containing active energy ray curable resin is provided which includes a polymer structure (a1) derived from a radically polymerizable unsaturated monomer, a poly(perfluoroalkylene ether) chain (a2), a radically polymerizable unsaturated group (a3), and an acid group forming a neutral salt structure (a4). Also provided are a surfactant including the fluorine-containing active energy ray curable resin; an active energy ray curable resin composition including the fluorine-containing active energy ray curable resin, an active energy ray curable hydrophilic resin other than the fluorine-containing active energy ray curable resin, and water; and a cured film of the composition.
Fluoropolymers and membranes comprising fluoropolymers (I)
Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids using the porous membranes to remove metal ions, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes polymerized monomeric units I and II, wherein monomeric unit I is of the formula A-XCH.sub.2B, wherein A is Rf(CH.sub.2)n, Rf is a perfluoro alkyl group of the formula CF.sub.3(CF.sub.2).sub.x, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, the monomeric unit II is haloalkyl styrene, and optionally wherein the halo group of haloalkyl is replaced with an optional substituent, for example, ethylenediamine tetra acetic acid, iminodiacetic acid, or iminodisuccinic acid.
Fluoropolymers and membranes comprising fluoropolymers (I)
Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids using the porous membranes to remove metal ions, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes polymerized monomeric units I and II, wherein monomeric unit I is of the formula A-XCH.sub.2B, wherein A is Rf(CH.sub.2)n, Rf is a perfluoro alkyl group of the formula CF.sub.3(CF.sub.2).sub.x, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, the monomeric unit II is haloalkyl styrene, and optionally wherein the halo group of haloalkyl is replaced with an optional substituent, for example, ethylenediamine tetra acetic acid, iminodiacetic acid, or iminodisuccinic acid.