C08F212/18

COPOLYMERS WITH CATIONIC, NITROGEN-CONTAINING GROUPS AND ANION EXCHANGE MEMBRANES MADE THEREFROM

A crosslinkable copolymer is provided. The crosslinkable copolymer has pendant cationic nitrogen-containing groups with some, but not all, of these pendant groups further including a (meth)acryloyl group. The (meth)acryloyl groups can react to form a crosslinked copolymer that is ionically conductive. The crosslinked copolymer can be used to provide an anion exchange membrane that can be used in electrochemical cells such as fuel cells, electrolyzers, batteries, and electrodialysis cells.

COPOLYMERS WITH CATIONIC, NITROGEN-CONTAINING GROUPS AND ANION EXCHANGE MEMBRANES MADE THEREFROM

A crosslinkable copolymer is provided. The crosslinkable copolymer has pendant cationic nitrogen-containing groups with some, but not all, of these pendant groups further including a (meth)acryloyl group. The (meth)acryloyl groups can react to form a crosslinked copolymer that is ionically conductive. The crosslinked copolymer can be used to provide an anion exchange membrane that can be used in electrochemical cells such as fuel cells, electrolyzers, batteries, and electrodialysis cells.

Covered particle

The present invention provides covered particles wherein insulating layers cover the surfaces of electroconductive particles, and the covered particles are excellent in the adhesion between the surfaces of the electroconductive particles and the insulating layers. The covered particles includes: electroconductive particles in which metal films are formed on the surfaces of core materials, and a triazole-based compound is disposed on the outer surfaces on the sides opposite to the core materials in the metal films; and insulating layers covering the electroconductive particles, and the insulating layers comprise a compound having phosphonium groups.

Covered particle

The present invention provides covered particles wherein insulating layers cover the surfaces of electroconductive particles, and the covered particles are excellent in the adhesion between the surfaces of the electroconductive particles and the insulating layers. The covered particles includes: electroconductive particles in which metal films are formed on the surfaces of core materials, and a triazole-based compound is disposed on the outer surfaces on the sides opposite to the core materials in the metal films; and insulating layers covering the electroconductive particles, and the insulating layers comprise a compound having phosphonium groups.

Acrylic Copolymer, Method for Manufacturing Same, and Acrylic Copolymer Composition Comprising Same

Provided is an acryl-based copolymer, and more particularly, an acryl-based copolymer including a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit, the polyfunctional monomer includes a vinyl group or an allyl group, and the polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit.

Chemically amplified negative resist composition and resist pattern forming process

A negative resist composition comprising an onium salt of arenesulfonic acid having a bridged ring-containing group and a base polymer is provided, the onium salt being capable of generating a bulky acid having an appropriate strength and controlled diffusion. When the resist composition is processed by lithography, a dot pattern of rectangular profile having high resolution and reduced LER is formed.

Chemically amplified negative resist composition and resist pattern forming process

A negative resist composition comprising an onium salt of arenesulfonic acid having a bridged ring-containing group and a base polymer is provided, the onium salt being capable of generating a bulky acid having an appropriate strength and controlled diffusion. When the resist composition is processed by lithography, a dot pattern of rectangular profile having high resolution and reduced LER is formed.

POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR

A porous resin used to solid phase synthesis and a preparation method therefor, specifically being a porous resin having functional groups being an amino group or a hydroxyl group and a preparation method therefor. Using an olefin compound containing two cyano groups as a modified monomer, using a high internal phase emulsion as a pore-foaming agent, and performing suspension polymerization to prepare the porous resin. And then functionalizing the porous resin to obtain the porous resin having functional groups being an amino group or a hydroxyl group. Different from the existing preparation method, the modified monomer can make the distribution of the functional groups more uniform, and make the swelling degrees of the porous resin in different solvents close. The high internal phase emulsion pore-foaming agent can make the pore size distribution of the carrier narrower. The porous resin can be used as a solid phase synthesis carrier to prepare an oligonucleotide, and the use of the carrier is beneficial for improving the yield and purity of the oligonucleotide.

POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR

A porous resin used to solid phase synthesis and a preparation method therefor, specifically being a porous resin having functional groups being an amino group or a hydroxyl group and a preparation method therefor. Using an olefin compound containing two cyano groups as a modified monomer, using a high internal phase emulsion as a pore-foaming agent, and performing suspension polymerization to prepare the porous resin. And then functionalizing the porous resin to obtain the porous resin having functional groups being an amino group or a hydroxyl group. Different from the existing preparation method, the modified monomer can make the distribution of the functional groups more uniform, and make the swelling degrees of the porous resin in different solvents close. The high internal phase emulsion pore-foaming agent can make the pore size distribution of the carrier narrower. The porous resin can be used as a solid phase synthesis carrier to prepare an oligonucleotide, and the use of the carrier is beneficial for improving the yield and purity of the oligonucleotide.

COPOLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
20230288805 · 2023-09-14 · ·

A copolymer includes a monomer unit (A) represented by formula (I), shown below, and a monomer unit (B) represented by formula (II), shown below, and has a weight-average molecular weight of 230,000 or more. In the formulae, L is a single bond or a divalent linking group, Ar is an optionally substituted aromatic ring group, R.sup.1 is an alkyl group, R.sup.2 is hydrogen, an alkyl group, a halogen atom, a haloalkyl group, a hydroxy group, a carboxy group, or a halocarboxy group, p is an integer of not less than 0 and not more than 5, and in a case in which more than one R.sup.2 is present, each R.sup.2 may be the same or different.

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