Patent classifications
C08F220/302
Resin, resist composition and method for producing resist pattern
Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same: ##STR00001##
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
POLYMERIZABLE COMPOSITION, FILM, AND HALF MIRROR FOR DISPLAYING PROJECTION IMAGE
The present invention provides a polymerizable composition containing a polymerizable liquid crystal compound represented by Formula (I) and an oxime compound,
##STR00001## in the formula, A.sup.1 and A.sup.2 each represent a phenylene group or a trans-1,4-cyclohexylene group, L.sup.1 and L.sup.2 each represent single bond, —C(═O)O—, or —OC(═O)—, Q.sup.1 and Q.sup.2 each represent a polymerizable group or the like, m and n represent an integer of 0 to 2, X may represent —X.sup.3-Sp.sup.3-Q.sup.3 or two X's may be bonded to each other to form a fused ring, X.sup.3 represents —C(═O)O—, Sp.sup.1, Sp.sup.2, and Sp.sup.3 each represent single bond, an alkylene group, or the like, Q.sup.3 represents hydrogen atom, a cycloalkyl group, a polymerizable group, or the like, and l represents an integer of 0 to 4. The polymerizable composition hardly causes yellowing after curing and is useful for manufacturing a film and a half mirror for displaying a projection image.
Resist underlayer film-forming composition
A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of the following Formula (1) to Formula (3), a crosslinking agent, an organic acid catalyst, and a solvent: ##STR00001##
(wherein R.sup.1s are independently a hydrogen atom or a methyl group, R.sup.2 is a C.sub.1-3 alkylene group, A is a protective group, R.sup.3 is an organic group having a 4-membered ring to 7-membered ring lactone framework, adamantane framework, tricyclodecane framework or norbornane framework, R.sup.4 is a linear, branched or cyclic organic group having a carbon atom number of 1 to 12 in which at least one hydrogen atom is substituted with a fluoro group and which optionally has at least one hydroxy group as a substituent).
Core-sheath filaments and methods of printing an adhesive
A core-sheath filament having a non-tacky sheath and a hot-melt processable adhesive core, the sheath exhibiting a melt flow index of less than 15 grams per 10 minutes, is provided. Methods of making the core-sheath filament and methods of using the core-sheath filament to print a hot-melt processable adhesive onto a primer-treated substrate surface to provide a structural bond are described.
Core-sheath filaments and methods of printing an adhesive
A core-sheath filament having a non-tacky sheath and a hot-melt processable adhesive core, the sheath exhibiting a melt flow index of less than 15 grams per 10 minutes, is provided. Methods of making the core-sheath filament and methods of using the core-sheath filament to print a hot-melt processable adhesive onto a primer-treated substrate surface to provide a structural bond are described.
HYDROPHOBIC INTRAOCULAR LENS
A hydrophobic intraocular lens (IOL) with excellent non-glistening characteristics, high Abbe number, excellent mechanical properties comprising at least one copolymer comprising: (a) a first monomeric subunit comprising a polymerized (meth)acrylate group and at least one alkoxyalkoxyalkyl side group, (b) a second monomeric subunit different from the first monomeric subunit comprising a polymerized (meth)acrylate group, at least one side group comprising (i) an aryloxy moiety with at least one halogen, and (ii) an aliphatic carbon moiety linking the aryloxy moiety with the polymerized (meth)acrylate group, wherein the aliphatic carbon moiety comprises at least one hydroxyl substituent.
HYDROPHOBIC INTRAOCULAR LENS
A hydrophobic intraocular lens (IOL) with excellent non-glistening characteristics, high Abbe number, excellent mechanical properties comprising at least one copolymer comprising: (a) a first monomeric subunit comprising a polymerized (meth)acrylate group and at least one alkoxyalkoxyalkyl side group, (b) a second monomeric subunit different from the first monomeric subunit comprising a polymerized (meth)acrylate group, at least one side group comprising (i) an aryloxy moiety with at least one halogen, and (ii) an aliphatic carbon moiety linking the aryloxy moiety with the polymerized (meth)acrylate group, wherein the aliphatic carbon moiety comprises at least one hydroxyl substituent.
Polymer, chemically amplified positive resist composition and patterning process
A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.
Polymer, chemically amplified positive resist composition and patterning process
A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.