A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of the following Formula (1) to Formula (3), a crosslinking agent, an organic acid catalyst, and a solvent: ##STR00001##
(wherein R.sup.1s are independently a hydrogen atom or a methyl group, R.sup.2 is a C.sub.1-3 alkylene group, A is a protective group, R.sup.3 is an organic group having a 4-membered ring to 7-membered ring lactone framework, adamantane framework, tricyclodecane framework or norbornane framework, R.sup.4 is a linear, branched or cyclic organic group having a carbon atom number of 1 to 12 in which at least one hydrogen atom is substituted with a fluoro group and which optionally has at least one hydroxy group as a substituent).

A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of the following Formula (1) to Formula (3), a crosslinking agent, an organic acid catalyst, and a solvent: ##STR00001##
(wherein R.sup.1s are independently a hydrogen atom or a methyl group, R.sup.2 is a C.sub.1-3 alkylene group, A is a protective group, R.sup.3 is an organic group having a 4-membered ring to 7-membered ring lactone framework, adamantane framework, tricyclodecane framework or norbornane framework, R.sup.4 is a linear, branched or cyclic organic group having a carbon atom number of 1 to 12 in which at least one hydrogen atom is substituted with a fluoro group and which optionally has at least one hydroxy group as a substituent).

Aspects generally relate to a temperature responsive polymer, more specifically to a polymer exhibiting an upper critical solution temperature (UCST) in an aqueous solution. In one aspect, a monomer compound includes one or more amide or thioamide groups; one or more ureido or thioureido groups; and one or more ethylenically unsaturated groups. In one aspect, a polymer, such as a homopolymer or a copolymer, is produced by polymerization of the monomer compound. The copolymer is produced by polymerization of the monomer compound and a comonomer, such as a hydrophobic comonomer, a hydrophilic comonomer, a pH responsive comonomer, a light responsive comonomer, and combinations thereof. The polymer exhibits a UCST from about 1° C. to about 100° C. in an aqueous solution at 1 atm.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V.sup.11 represents an aliphatic cyclic group with or without a substituent; R.sup.1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y.sup.1 represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W.sup.2 represents a group formed by a polymerization reaction of a polymerizable group-containing group). ##STR00001##

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V.sup.11 represents an aliphatic cyclic group with or without a substituent; R.sup.1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y.sup.1 represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W.sup.2 represents a group formed by a polymerization reaction of a polymerizable group-containing group). ##STR00001##

A copolymer includes the structure unit represented by the following Chemical formula 1 and the structure unit represented by the following Chemical formula 2, ##STR00001## where R.sub.1 and R.sub.2 each, independently represent hydrogen atoms or methyl groups, and n represents a value in the range of from 1 to 90, ##STR00002## where R.sub.3 represents a hydrogen atom or a methyl group and L represents an alkylene group having 2 to 18 carbon atoms.

A polymer including a unit having a phthalocyanine structure, the polymer having a high capability of dispersing pigments. A pigment composition, a pigment dispersion, and a toner all having a high tinting strength.

A polymer including a unit having a phthalocyanine structure, the polymer having a high capability of dispersing pigments. A pigment composition, a pigment dispersion, and a toner all having a high tinting strength.

Amphiphilic macromolecules having repeating structural units: structural units to adjust molecular weight and molecular weight distribution and charging property effects, high stereo-hindrance structural units, and amphiphilic structural units, which are suitable for fields such as oil field well drilling, well cementation, fracturing, oil gathering and transfer, sewage treatment, sludge treatment and papermaking, etc., and can be used as an oil-displacing agent for enhanced oil production, a heavy oil viscosity reducer, a fracturing fluid, a clay stabilizing agent, a sewage treatment agent, a papermaking retention and drainage aid or a reinforcing agent, etc.

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##