The present invention relates to a film for use in plasticulture that comprises at least a first layer of a thermoplastic polymer composition, said thermoplastic polymer composition comprising a linear low-density polyethylene having a melt index (MI) measured according to ASTM D1238 at a temperature of 190° C. and a load of 2.16 kg of higher than 1.0 g/10 min and at most 10.0 g/10 min, whereby the film has an RMS roughness measured by AFM according to point 4.2.2 of ISO 4287:1997 of lower than 40 nm, and/or an average roughness measured by AFM according to point 4.2.1 of ISO 4287:1997 of lower than 30 nm.

The present invention relates to a film for use in plasticulture that comprises at least a first layer of a thermoplastic polymer composition, said thermoplastic polymer composition comprising a linear low-density polyethylene having a melt index (MI) measured according to ASTM D1238 at a temperature of 190° C. and a load of 2.16 kg of higher than 1.0 g/10 min and at most 10.0 g/10 min, whereby the film has an RMS roughness measured by AFM according to point 4.2.2 of ISO 4287:1997 of lower than 40 nm, and/or an average roughness measured by AFM according to point 4.2.1 of ISO 4287:1997 of lower than 30 nm.

New polypropylene composition, which combines low sealing initiation temperature (SIT), high hot-tack and good optical properties, like low haze, the use of such polypropylene composition and articles made therefrom.

New polypropylene composition, which combines low sealing initiation temperature (SIT), high hot-tack and good optical properties, like low haze, the use of such polypropylene composition and articles made therefrom.

This invention relates to a polymer composition comprising: (A) at least one polyester, and (B) a stabilizer composition comprising: (1) at least one primary antioxidant comprising at least one hindered phenolic antioxidant; (2) at least one secondary antioxidant comprising at least one phosphite; (3) at least one chain extending agent; (4) at least one ultraviolet light absorbing agent; and (5) at least one hindered amine light stabilizer.

This invention relates to a polymer composition comprising: (A) at least one polyester, and (B) a stabilizer composition comprising: (1) at least one primary antioxidant comprising at least one hindered phenolic antioxidant; (2) at least one secondary antioxidant comprising at least one phosphite; (3) at least one chain extending agent; (4) at least one ultraviolet light absorbing agent; and (5) at least one hindered amine light stabilizer.

Provided is a polycarbonate resin composition having excellent impact strength, molding residence stability, and dry heat resistance and that maintains high total light transmittance while suppressing light transmittance in a specific ultraviolet region, that is, harmful wavelengths near 420 nm. The polycarbonate resin composition of the present disclosure includes 0.1-1.5 mass part of an additive (B) per 100 mass parts of a polycarbonate resin (A) having a viscosity average molecular weight of 21,000-26,000 and includes 0.2 mass part or more of an ultraviolet absorber (B1) having a benzotriazole skeleton represented by formula 1 as the additive (B): In formula 1, R.sup.1-R.sup.5 each independently represent any of a hydrogen atom, a C1-20 hydrocarbon group, and a hydroxyl group, and the hydrocarbon group(s) may include an oxygen-containing group; R.sup.6-R.sup.9 each independently represent any of a hydrogen atom or a sulfur-containing group represented by R—S—, and at least one of R.sup.6-R.sup.9 is a sulfur-containing group represented by R—S—; and R is a C1-24 hydrocarbon group or a C6-24 aromatic group in which a hydrogen atom may be substituted by a C1-18 alkyl group.

Provided is a polycarbonate resin composition having excellent impact strength, molding residence stability, and dry heat resistance and that maintains high total light transmittance while suppressing light transmittance in a specific ultraviolet region, that is, harmful wavelengths near 420 nm. The polycarbonate resin composition of the present disclosure includes 0.1-1.5 mass part of an additive (B) per 100 mass parts of a polycarbonate resin (A) having a viscosity average molecular weight of 21,000-26,000 and includes 0.2 mass part or more of an ultraviolet absorber (B1) having a benzotriazole skeleton represented by formula 1 as the additive (B): In formula 1, R.sup.1-R.sup.5 each independently represent any of a hydrogen atom, a C1-20 hydrocarbon group, and a hydroxyl group, and the hydrocarbon group(s) may include an oxygen-containing group; R.sup.6-R.sup.9 each independently represent any of a hydrogen atom or a sulfur-containing group represented by R—S—, and at least one of R.sup.6-R.sup.9 is a sulfur-containing group represented by R—S—; and R is a C1-24 hydrocarbon group or a C6-24 aromatic group in which a hydrogen atom may be substituted by a C1-18 alkyl group.

Provided is a polycarbonate resin composition, including, with respect to 100 parts by mass of an aromatic polycarbonate resin (A), 0.005 part by mass to 1 part by mass of a phosphorus-based compound (B) having an aryl group, and 0.005 part by mass to 5 parts by mass of a polyether compound (C) having a specific polyoxyalkylene structure, in which: an amount of a compound having a phenol structure produced by decomposition of the phosphorus-based compound (B) 1,500 hours after standing thereof under conditions of 40° C. and a humidity of 90% is 5 mass % or less with respect to the phosphorus-based compound (B); and when a weight of the phosphorus-based compound (B) is measured with a thermogravimetric-differential thermal analysis machine under a nitrogen atmosphere, a temperature at which the weight becomes smaller than the weight before the measurement by 2% is 340° C. or more.

Provided is a polycarbonate resin composition, including, with respect to 100 parts by mass of an aromatic polycarbonate resin (A), 0.005 part by mass to 1 part by mass of a phosphorus-based compound (B) having an aryl group, and 0.005 part by mass to 5 parts by mass of a polyether compound (C) having a specific polyoxyalkylene structure, in which: an amount of a compound having a phenol structure produced by decomposition of the phosphorus-based compound (B) 1,500 hours after standing thereof under conditions of 40° C. and a humidity of 90% is 5 mass % or less with respect to the phosphorus-based compound (B); and when a weight of the phosphorus-based compound (B) is measured with a thermogravimetric-differential thermal analysis machine under a nitrogen atmosphere, a temperature at which the weight becomes smaller than the weight before the measurement by 2% is 340° C. or more.