The present invention relates to a cleaning liquid for a water-based ink that contains a pigment and a water-insoluble polymer, said cleaning liquid containing (A) an acetylene glycol having an average molar number of addition of EO of 0 to 2 mol, (B) at least one compound selected from the group consisting of an acetylene glycol having an average molar number of addition of EO of not less than 4 mol and a polyethylene glycol alkyl ether containing an alkyl group having not less than 8 carbon atoms, (C) a water-soluble organic solvent and water, in which the water-soluble organic solvent (C) contains at least one water-soluble organic solvent having a boiling point of not lower than 90° C.; a boiling point of the water-soluble organic solvent (C) is not higher than 250° C. in terms of a weighted mean value thereof; and a content of the water-soluble organic solvent (C) in the cleaning liquid is not more than 20% by mass; a process for producing the cleaning liquid; and a method of cleaning a water-based ink using the cleaning liquid.

The present invention relates to a cleaning liquid for a water-based ink that contains a pigment and a water-insoluble polymer, said cleaning liquid containing (A) an acetylene glycol having an average molar number of addition of EO of 0 to 2 mol, (B) at least one compound selected from the group consisting of an acetylene glycol having an average molar number of addition of EO of not less than 4 mol and a polyethylene glycol alkyl ether containing an alkyl group having not less than 8 carbon atoms, (C) a water-soluble organic solvent and water, in which the water-soluble organic solvent (C) contains at least one water-soluble organic solvent having a boiling point of not lower than 90° C.; a boiling point of the water-soluble organic solvent (C) is not higher than 250° C. in terms of a weighted mean value thereof; and a content of the water-soluble organic solvent (C) in the cleaning liquid is not more than 20% by mass; a process for producing the cleaning liquid; and a method of cleaning a water-based ink using the cleaning liquid.

The present invention relates to a cleaning liquid for a water-based ink that contains a pigment and a water-insoluble polymer, said cleaning liquid containing (A) a surfactant, (B) a water-soluble organic solvent containing (b-1) diethylene glycol monoisopropyl ether, and water, in which the surfactant (A) contains at least one compound selected from the group consisting of (a-1) an acetylene glycol or an ethyleneoxide adduct of the acetylene glycol, and (a-2) a polyethylene glycol alkyl ether containing an alkyl group having not less than 8 carbon atoms or a polyethylene glycol aryl ether containing an aryl group having not less than 6 carbon atoms, and a content of the water-soluble organic solvent (B) in the cleaning liquid is from 5 to 30% by mass; and a method of cleaning a water-based ink using the cleaning liquid.

The present invention relates to a cleaning liquid for a water-based ink that contains a pigment and a water-insoluble polymer, said cleaning liquid containing (A) a surfactant, (B) a water-soluble organic solvent containing (b-1) diethylene glycol monoisopropyl ether, and water, in which the surfactant (A) contains at least one compound selected from the group consisting of (a-1) an acetylene glycol or an ethyleneoxide adduct of the acetylene glycol, and (a-2) a polyethylene glycol alkyl ether containing an alkyl group having not less than 8 carbon atoms or a polyethylene glycol aryl ether containing an aryl group having not less than 6 carbon atoms, and a content of the water-soluble organic solvent (B) in the cleaning liquid is from 5 to 30% by mass; and a method of cleaning a water-based ink using the cleaning liquid.

The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.

The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.