Provided are a papermaking device having an excellent strength in which the unevenness in strength between its parts is suppressed, and a method for producing the papermaking device.

Also provided is a papermaking device for use in papermaking machine, the papermaking device comprising at least one resin layer comprising a polyurethane resin, wherein the polyurethane resin comprises as a component a polyether polycarbonate diol comprising one or more unit(s) A expressed by the following formula (1).

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Provided are a papermaking device having an excellent strength in which the unevenness in strength between its parts is suppressed, and a method for producing the papermaking device.

Also provided is a papermaking device for use in papermaking machine comprising at least one resin layer comprising polyurethane resin, wherein the polyurethane resin is obtainable by reacting a urethane prepolymer having an isocyanate group with a curing agent having an active hydrogen group, wherein the urethane prepolymer is obtainable by reacting a polyisocyanate compound comprising 2,4-tolylene-diisocyanate and/or 2,6-tolylene-diisocyanate with a polyol compound comprising one or more polyether polycarbonate diol(s).

The invention relates to a method for producing flexible polyurethane foam, flexible polyurethane foam produced by the method, and its use in household articles and automobile articles.

This resin composition for secondary coating of an optical fiber contains: at least one type of polyoxyalkylene monoalkyl ether compound selected from the group consisting of a polyoxyalkylene monoalkyl ether having a number average molecular weight of 2500-10,000 and a derivative of said polyoxyalkylene monoalkyl ether; a photopolymerizable compound; and a photopolymerization initiator.

This invention relates to an in-situ formed polyether polyol blend having an overall functionality of 2 to 3 and an overall hydroxyl number of 40 to 220 mg KOH/g. A process for preparing these in-situ formed polyether polyol blends is also disclosed. These in-situ formed polyether polyol blends are suitable for a process of preparing viscoelastic flexible polyurethane foams.

A polyurethane foam-forming composition comprising a polyether functional silicone additive with an active hydrogen atom. The addition of the polyether functional silicone additive to a foam-forming composition for a flexible foam increases the hardness of the resulting foam without adversely affecting other properties of the foam.

A method for producing a polyurethane polymer comprises the steps of: (a) providing a polyol composition, the polyol composition comprising (i) a polyol, (ii) a polyethylenimine compound; and (iii) a bisulfite compound, (b) providing an isocyanate compound; (c) providing a catalyst; (d) combining and reacting the polyol composition, the isocyanate compound, and the catalyst to produce a polyurethane polymer.

Provided is a resin composition including at least one (meth)acrylate monomer, a urethane (meth)acrylate oligomer, and at least one photo initiator. The urethane (meth)acrylate oligomer includes a phosphate ester group and is represented by Formula 1. Accordingly, the resin composition may exhibit satisfactory compatibility before curing and may exhibit excellent adhesion after curing. ##STR00001##

The invention concerns a composition for use as drier in auto-oxidizable coatings or as accelerator in unsaturated polyester resins, comprising a manganese-bearing polymer having a manganese dicarboxylate repeating unit and at least one nitrogen-containing donor ligand. Such compositions offer excellent drying performances. They ensure a strongly reduced leachability of manganese compared to that of known manganese-bearing driers.

The invention provides a method for polishing or planarizing a substrate of at least one of semiconductor, optical and magnetic substrates. The method includes attaching a polymer-polymer composite polishing pad having a polishing layer to a polishing device. A hydrophilic polymeric matrix forms the polishing layer. Cationic fluoropolymer particles having nitrogen-containing end groups are embedded in the polymeric matrix. A slurry containing anionic particles is applied to the polymer-polymer composite polishing pad and rubbed against the substrate to polish or planarize the substrate with the fluoropolymer particles interacting with the anionic particles to increase polishing removal rate.