A silver-coated resin particle having a resin particle and a silver coating layer provided on a surface of the resin particle, in which an average value of a 10% compressive elastic modulus is in a range of 500 MPa or more and 15,000 MPa or less and a variation coefficient of the 10% compressive elastic modulus is 30% or less.

The present invention relates to a chrome free etch for plating on plastic processes, wherein plastic surfaces are contacted in a first etching step with an etching solution at least comprising Mn(IV)-ions and, in a second etching step, with a solution at least comprising Mn(III)- and Mn(VII)-ions prior to the metal plating step.

A laminate comprising a substrate; and a plating-forming layer disposed on at least one surface of both surfaces of the substrate and containing a thermoplastic resin and a plating catalyst, wherein the plating-forming layer further satisfies conditions of the following (1) and/or (2),

(1) the plating-forming layer contains a dispersing agent for dispersing the plating catalyst
(2) an abundance of the plating catalyst on a surface side of the plating-forming layer is higher than an abundance of the plating catalyst on the substrate side of the plating-forming layer.

An object of the present invention is to provide a plated layer forming composition which is capable of forming a plated layer having excellent alkali resistance and is capable of forming a metal layer on the plated layer even in the case of forming the plated layer by exposure with a low exposure amount; a film having a plated-layer precursor layer; a film having a patterned plated layer; an electroconductive film; and a touch panel. The plated layer forming composition of the present invention includes a polymer having a group capable of interacting with a plating catalyst or a precursor thereof, and a polyfunctional monomer having three or more acrylamide groups or methacrylamide groups.

A support for supporting a component to be plated in a chromic acid-free plating process, the support having a contact surface comprising iodine-treated and/or bromine-treated plastic.

A method for electrolessly depositing a metal layer onto a substrate, including the following chronological steps: a) treating the substrate surface to be plated with an etching solution; b) treating the substrate surface to be plated with a polyelectrolyte or an organosilane compound; c) treating the surface to be plated with a solution containing metal particles; d) treating the surface to be plated with a solution containing at least one salt of the metal to be deposited onto the substrate.

A method for manufacturing a laminate, the method comprising a process of forming a silver-particle layer on a substrate, the process comprising allowing an aqueous solution of ammoniacal silver nitrate to contact with an aqueous solution of a reducing agent, and the aqueous solution of a reducing agent comprising a phenol compound as the reducing agent.

The present invention relates to a method for treating a surface of a non-conductive or carbon-fibers containing substrate using a conditioning step a selector treatment step and an activating step.

Methods, systems, and apparatus for coating the internal surface of nano-scale cavities on a substrate are contemplated. A first fluid of high wettability is applied to the nano-scale cavity, filling the cavity. A second fluid carrying a conductor or a catalyst is applied over the opening of the nano-scale cavity. The second fluid has a lower vapor pressure than the first fluid. The first fluid is converted to a gas, for example by heating the substrate. The gas exits the nano-scale cavity, creating a negative pressure or vacuum in the nano-scale cavity. The negative pressure draws the second fluid into the nano-scale cavity. The conductor is deposited on the interior surface of the nano-scale cavity, preferably less than 10 nm thick.

The purpose of the present invention is to provide a pretreatment method for electroless plating and a pretreatment solution for electroless plating capable of increasing an adsorption amount of a catalyst. A pretreatment method for electroless plating for performing an electroless plating on a substrate, the pretreatment method at least comprises: a cleaner process S10; a soft etching process S20 and/or an acid treatment process S30; a catalyst imparting process S40; and a catalyst reducing process S50, wherein an anionic surfactant for ionizing a part of a hydrophilic group to an anion is added to a treatment solution used in the soft etching process S20 and/or the acid treatment process S30, an ionic catalyst is imparted on the substrate in the catalyst imparting process S40, and the ionic catalyst is reduced in the catalyst reducing process S50 to increase an adsorption amount of the catalyst on the substrate.