Patent classifications
D04B1/28
CUT-RESISTANT POLYETHYLENE YARN
Provided is a cut-resistant polyethylene yarn, and more particularly, a cut-resistant polyethylene yarn which allows manufacture of a product having both excellent cut resistance and excellent wear resistance.
CUT-RESISTANT POLYETHYLENE YARN
Provided is a cut-resistant polyethylene yarn, and more particularly, a cut-resistant polyethylene yarn which allows manufacture of a product having both excellent cut resistance and excellent wear resistance.
CUT-RESISTANT POLYETHYLENE YARN
Provided is a cut-resistant polyethylene yarn, and more particularly, a cut-resistant polyethylene yarn which allows manufacture of a product having excellent cut resistance and providing excellent wearability.
CUT-RESISTANT POLYETHYLENE YARN
Provided is a cut-resistant polyethylene yarn, and more particularly, a cut-resistant polyethylene yarn which allows manufacture of a product having excellent cut resistance and providing excellent wearability.
KNITTED TEXTILE STRUCTURES FORMED BY ALTERING KNIT PATTERNS TO ACCOMMODATE EXTERNAL MEDIUMS, AND MANUFACTURING PROCESSES ASSOCIATED THEREWITH
An example method of manufacturing a knitted fabric that includes a non-knitted structure occurs in accordance with a programmed knit sequence for a multi-dimensional knitting machine. The method includes, providing a non-knitted structure to the multi-dimensional knitting machine at a point in time when a fabric structure has a first knit portion, wherein the first knit portion is formed based on a first type of knit pattern. The method also includes, after the providing of the non-knitted structure, following the programmed knit sequence to automatically adjust the multi-dimensional knitting machine to use a second type of knit pattern, distinct from a first type of knit pattern, to accommodate the non-knitted structure within a second knit portion that is adjacent to the first knit portion within the fabric structure.
KNITTED TEXTILE STRUCTURES FORMED BY ALTERING KNIT PATTERNS TO ACCOMMODATE EXTERNAL MEDIUMS, AND MANUFACTURING PROCESSES ASSOCIATED THEREWITH
An example method of manufacturing a knitted fabric that includes a non-knitted structure occurs in accordance with a programmed knit sequence for a multi-dimensional knitting machine. The method includes, providing a non-knitted structure to the multi-dimensional knitting machine at a point in time when a fabric structure has a first knit portion, wherein the first knit portion is formed based on a first type of knit pattern. The method also includes, after the providing of the non-knitted structure, following the programmed knit sequence to automatically adjust the multi-dimensional knitting machine to use a second type of knit pattern, distinct from a first type of knit pattern, to accommodate the non-knitted structure within a second knit portion that is adjacent to the first knit portion within the fabric structure.
TECHNIQUES FOR INCORPORATING STRETCHABLE CONDUCTIVE TEXTILE TRACES AND TEXTILE-BASED SENSORS INTO KNIT STRUCTURES
An example wearable device that includes a conductive deformable fabric is described herein. The conductive deformable fabric has a conductive trace that has a non-extendable fixed length along a first axis, and the conductive trace is sewn into a fabric structure to produce a conductive deformable material. The fabric structure includes a stitch pattern that facilitates the conductive trace to unfold and fold in an oscillating fashion to allow the conductive trace to expand and contract, respectively, along the first axis without exceeding the fixed length of the conductive trace. The conductive deformable material is positioned within the wearable device such that when the wearable device is worn, the stitch pattern is over a joint of the user to allow the stitch pattern to expand or contract along with the movement of the joint.
TECHNIQUES FOR INCORPORATING STRETCHABLE CONDUCTIVE TEXTILE TRACES AND TEXTILE-BASED SENSORS INTO KNIT STRUCTURES
An example wearable device that includes a conductive deformable fabric is described herein. The conductive deformable fabric has a conductive trace that has a non-extendable fixed length along a first axis, and the conductive trace is sewn into a fabric structure to produce a conductive deformable material. The fabric structure includes a stitch pattern that facilitates the conductive trace to unfold and fold in an oscillating fashion to allow the conductive trace to expand and contract, respectively, along the first axis without exceeding the fixed length of the conductive trace. The conductive deformable material is positioned within the wearable device such that when the wearable device is worn, the stitch pattern is over a joint of the user to allow the stitch pattern to expand or contract along with the movement of the joint.
THIN HIGH CUT SEAMLESS GLOVE
A thin coated supported glove and method of making the glove includes a thin knitted liner, including a plurality of finger components, a thumb component, a backhand component, and a palm component, wherein the thin knitted liner comprises a covered yarn including a tungsten core having a diameter of about 25-35 micrometers, a polyamide wrapping yarn disposed upon the tungsten core, and a high performance polyethylene wrapping yarn disposed upon the polyamide wrapping yarn, wherein the covered yarn is (350) denier or less; a second yarn, wherein the second yarn is an intermingled yarn of (115) denier or less; and a thin polymeric coating adhered to the thin knitted liner.
THIN HIGH CUT SEAMLESS GLOVE
A thin coated supported glove and method of making the glove includes a thin knitted liner, including a plurality of finger components, a thumb component, a backhand component, and a palm component, wherein the thin knitted liner comprises a covered yarn including a tungsten core having a diameter of about 25-35 micrometers, a polyamide wrapping yarn disposed upon the tungsten core, and a high performance polyethylene wrapping yarn disposed upon the polyamide wrapping yarn, wherein the covered yarn is (350) denier or less; a second yarn, wherein the second yarn is an intermingled yarn of (115) denier or less; and a thin polymeric coating adhered to the thin knitted liner.