Housing for a vacuum pump, in particular a NEG or IGP-NEG combination, comprising a body defining an interior space to accommodate the vacuum pump, wherein a first flange is connected to the housing comprising an opening to connect the vacuum pump to a vessel and a second flange connected to the housing to connect the housing to an additional vacuum pump at least during regeneration. Further, a movable shield element is used movable from a first position to a second position, wherein in the first position the opening of the first flange is unobstructed and in the second position the opening is blocked.

Housing for a vacuum pump, in particular a NEG or IGP-NEG combination, comprising a body defining an interior space to accommodate the vacuum pump, wherein a first flange is connected to the housing comprising an opening to connect the vacuum pump to a vessel and a second flange connected to the housing to connect the housing to an additional vacuum pump at least during regeneration. Further, a movable shield element is used movable from a first position to a second position, wherein in the first position the opening of the first flange is unobstructed and in the second position the opening is blocked.

A vacuum pumping system comprising: a high pressure getter pump configured to operate from an initial pressure of between 10 and 10.sup.−2 mbar to a second pressure between 10.sup.−3 mbar and 10.sup.−6 mbar and at least one high vacuum pump configured to operate at higher vacuums than the high pressure getter pump, the two pumps being mounted on a same flange, the flange being configured to mount the vacuum pumping system to a vacuum chamber.

A vacuum pumping system comprising: a high pressure getter pump configured to operate from an initial pressure of between 10 and 10.sup.−2 mbar to a second pressure between 10.sup.−3 mbar and 10.sup.−6 mbar and at least one high vacuum pump configured to operate at higher vacuums than the high pressure getter pump, the two pumps being mounted on a same flange, the flange being configured to mount the vacuum pumping system to a vacuum chamber.

A cryopump includes a cryocooler which includes a high-temperature cooling stage and a low-temperature cooling stage, a radiation shield which is thermally coupled to the high-temperature cooling stage and axially extends in a tubular shape from a cryopump intake port, and a low-temperature cryopanel section which is thermally coupled to the low-temperature cooling stage, is surrounded by the radiation shield, and includes a plurality of cryopanels and a plurality of heat transfer bodies axially arranged in columnar shape, and in which the plurality of cryopanels and the plurality of heat transfer bodies are axially stacked.

A cryopump includes a cryocooler which includes a high-temperature cooling stage and a low-temperature cooling stage, a radiation shield which is thermally coupled to the high-temperature cooling stage and axially extends in a tubular shape from a cryopump intake port, and a low-temperature cryopanel section which is thermally coupled to the low-temperature cooling stage, is surrounded by the radiation shield, and includes a plurality of cryopanels and a plurality of heat transfer bodies axially arranged in columnar shape, and in which the plurality of cryopanels and the plurality of heat transfer bodies are axially stacked.

A system for ion pumping including an anode, a cathode, and a magnet. The magnet comprises a Halbach magnet array.

Provided is a vacuum component capable of evacuation by a getting effect, which has a large maximum number of captured molecules and a long working life. It is provided, in an area around its central axis, with a hollow cylindrical electrode 20 having an electrode surface 20A that is sufficiently smaller than an inner surface 10A of the vacuum container 10, along the central axis. In the vacuum container 10, it is possible to realize any one of states among a first state of generating DC discharge by introducing Ar into the inside and setting the electrode surface 20A at a positive potential, a second state of setting the electrode surface 20A at a ground potential without introducing Ar, and a third state of generating DC discharge by introducing Ar into the inside and setting the electrode surface 20A at a negative potential. Evacuation by the vacuum component 1 is performed in the second state. Further, evacuation by the vacuum component 1 is performed also by realizing a state of performing a heating process at 400° C. or below without using the electrode.

Provided is a vacuum component capable of evacuation by a getting effect, which has a large maximum number of captured molecules and a long working life. It is provided, in an area around its central axis, with a hollow cylindrical electrode 20 having an electrode surface 20A that is sufficiently smaller than an inner surface 10A of the vacuum container 10, along the central axis. In the vacuum container 10, it is possible to realize any one of states among a first state of generating DC discharge by introducing Ar into the inside and setting the electrode surface 20A at a positive potential, a second state of setting the electrode surface 20A at a ground potential without introducing Ar, and a third state of generating DC discharge by introducing Ar into the inside and setting the electrode surface 20A at a negative potential. Evacuation by the vacuum component 1 is performed in the second state. Further, evacuation by the vacuum component 1 is performed also by realizing a state of performing a heating process at 400° C. or below without using the electrode.

Provided is a vacuum component capable of evacuation by a getting effect, which has a large maximum number of captured molecules and a long working life. It is provided, in an area around its central axis, with a hollow cylindrical electrode 20 having an electrode surface 20A that is sufficiently smaller than an inner surface 10A of the vacuum container 10, along the central axis. In the vacuum container 10, it is possible to realize any one of states among a first state of generating DC discharge by introducing Ar into the inside and setting the electrode surface 20A at a positive potential, a second state of setting the electrode surface 20A at a ground potential without introducing Ar, and a third state of generating DC discharge by introducing Ar into the inside and setting the electrode surface 20A at a negative potential. Evacuation by the vacuum component 1 is performed in the second state. Further, evacuation by the vacuum component 1 is performed also by realizing a state of performing a heating process at 400° C. or below without using the electrode.