Heat exchange structure. A hydrophilic, thermally conductive porous medium includes nanostructures formed substantially uniformly throughout the porous medium providing a balance of capillary and viscous forces to self-regulate a liquid-vapor contact line. A suitable porous medium is copper. A method for making the structure is also disclosed.

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

A production plant for producing nitric acid at reduced power, the system being derived from a state-of-the art dual pressure nitric acid plant wherein the system further includes a first feature for splitting a tail gas stream into a first tail gas stream in fluid communication with compressed air and with an oxygen-rich gas and a second tail gas stream, and/or a feature for splitting a tail gas stream into a third tail gas stream in fluid communication with compressed air and with an oxygen-rich gas and a fourth tail gas stream. The production plant allows for reduction of power by the air compressor. A method for operating the system, the use of the system for performing the method, and a method for revamping a state-of-the-art dual pressure nitric acid plant into the system.

A production plant for producing nitric acid at reduced power, the system being derived from a state-of-the art dual pressure nitric acid plant wherein the system further includes a first feature for splitting a tail gas stream into a first tail gas stream in fluid communication with compressed air and with an oxygen-rich gas and a second tail gas stream, and/or a feature for splitting a tail gas stream into a third tail gas stream in fluid communication with compressed air and with an oxygen-rich gas and a fourth tail gas stream. The production plant allows for reduction of power by the air compressor. A method for operating the system, the use of the system for performing the method, and a method for revamping a state-of-the-art dual pressure nitric acid plant into the system.

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

A facility for treating gas includes a flow channel providing a passage through which a waste gas flows; a thermal decomposition unit for thermally decomposing the waste gas flowing through the flow channel; a quencher for cooling the waste gas passed through the thermal decomposition unit to a predetermined temperature; and a cooling chamber in communication with the flow channel such that the waste gas passed through the quencher is introduced into the cooling chamber, the cooling chamber accommodating a solid material for cooling therewithin.

A facility for treating gas includes a flow channel providing a passage through which a waste gas flows; a thermal decomposition unit for thermally decomposing the waste gas flowing through the flow channel; a quencher for cooling the waste gas passed through the thermal decomposition unit to a predetermined temperature; and a cooling chamber in communication with the flow channel such that the waste gas passed through the quencher is introduced into the cooling chamber, the cooling chamber accommodating a solid material for cooling therewithin.

This discloses apparatuses for industrial or commercial cooling (or any other cooling) using staged cooling towers to evaporatively reach temperatures below the wet bulb temperature of the ambient air. Methods for using such apparatuses are disclosed as well.