Patent classifications
F04B37/08
Vibrationally isolated cryogenic shield for local high-quality vacuum
Aspects of a vibrationally isolated cryogenic shield for local high-quality vacuum are described. More specifically, a cryogenic vacuum system is described that is replicated in a small volume in a mostly room temperature ultra-high vacuum (UHV) system by capping the volume with a suspended cryogenic cold finger coated with a high surface area sorption material to produce a localized extreme high vacuum (XHV) or near-XHV region. The system ensures that paths from outgassing materials to the control volume, including bounce paths off other warm surfaces, require at least one bounce off of the high surface area sorption material on the cold finger. The outgassing materials can be pumped before reaching the control volume. To minimize vibrations, the cold finger is only loosely, mechanically connected to the rest of the chamber, and isolated along with the cryogenic system via soft vacuum bellows.
Systems and methods for improved sustainment of a high performance FRC plasma at elevated energies utilizing neutral beam injectors with tunable beam energies
Systems and methods are provided that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injectors with tunable beam energy capabilities.
Systems and methods for improved sustainment of a high performance FRC plasma at elevated energies utilizing neutral beam injectors with tunable beam energies
Systems and methods are provided that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injectors with tunable beam energy capabilities.
SYSTEMS AND METHODS FOR IMPROVED SUSTAINMENT OF A HIGH PERFORMANCE FRC WITH MULTI-SCALED CAPTURE TYPE VACUUM PUMPING
Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing multi-scaled capture type vacuum pumping.
SYSTEMS AND METHODS FOR IMPROVED SUSTAINMENT OF A HIGH PERFORMANCE FRC WITH MULTI-SCALED CAPTURE TYPE VACUUM PUMPING
Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing multi-scaled capture type vacuum pumping.
CRYOPUMP SYSTEM AND MONITORING METHOD THEREOF
A cryopump system mounted on a vacuum process device, the cryopump system including at least one cryopump, a cryopump controller that controls the cryopump, a network that connects the cryopump to the cryopump controller and transmits information related to the cryopump between the cryopump and the cryopump controller, and a cryopump monitor that is connected to the network and displays the information related to the cryopump, which is transmitted via the network, in which the cryopump controller is disposed in a casing of the vacuum process device, and the cryopump monitor is disposed outside the casing of the vacuum process device.
CRYOPUMP AND BAFFLE PLATE FOR CRYOPUMP
A cryopump includes a cryopanel, a main body, and a baffle plate. The cryopanel is connected to a refrigerator. The main body accommodates the cryopanel. The baffle plate is located in a gas inlet of the main body. The baffle plate includes a first portion and a second portion. The first portion includes a center of the baffle plate and a first hole extending through the baffle plate. The second portion includes an edge of the baffle plate and a second hole extending through the baffle plate. The second portion has a greater conductance than the first portion.
CRYOPUMP AND BAFFLE PLATE FOR CRYOPUMP
A cryopump includes a cryopanel, a main body, and a baffle plate. The cryopanel is connected to a refrigerator. The main body accommodates the cryopanel. The baffle plate is located in a gas inlet of the main body. The baffle plate includes a first portion and a second portion. The first portion includes a center of the baffle plate and a first hole extending through the baffle plate. The second portion includes an edge of the baffle plate and a second hole extending through the baffle plate. The second portion has a greater conductance than the first portion.
Cryopump
The embodiments of the present disclosure relates a cryopump including a pump housing including a suction port, a cold head located within the pump housing, a shielding element located within the pump housing and covering the cold head, a baffle at the suction port, the baffle including a gas passage with an inlet and an outlet, an orthographic projection of the baffle to the cross section of the pump housing completely covers an orthographic projection of the suction port thereto, the gas passage includes a first portion and a second portion intersecting with each other, the inlet is defined by one end of the first portion, the outlet is defined by one end of the second portion.
Cryopump
The embodiments of the present disclosure relates a cryopump including a pump housing including a suction port, a cold head located within the pump housing, a shielding element located within the pump housing and covering the cold head, a baffle at the suction port, the baffle including a gas passage with an inlet and an outlet, an orthographic projection of the baffle to the cross section of the pump housing completely covers an orthographic projection of the suction port thereto, the gas passage includes a first portion and a second portion intersecting with each other, the inlet is defined by one end of the first portion, the outlet is defined by one end of the second portion.