The present invention provides a conveyor belt tracking system for a dryer having a web of a mesh material having a protrusion extending along the length proximal one lateral edge and above a flat surface and a first generally cylindrical roller having a three-tiered slot for receiving the protrusion and two flanking shallow tracks for receiving base flanges.

The present invention provides a conveyor belt tracking system for a dryer having a web of a mesh material having a protrusion extending along the length proximal one lateral edge and above a flat surface and a first generally cylindrical roller having a three-tiered slot for receiving the protrusion and two flanking shallow tracks for receiving base flanges.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

An infrared heating device that appropriately sets positions of infrared lamps and a radiation thermometer relative to an object to be heated and is easily positioned includes: an infrared irradiator that irradiates infrared rays to an object to be heated to heat the object to be heated; a holding member that holds the infrared irradiator; a radiation thermometer that measures a temperature of a surface of the object; and a pair of laser pointers that irradiate laser beams to the surface of the object from different positions. The pair of laser pointers are disposed to cause the respective laser beams to be coincident in position with each other at one point on the surface of the object when a distance between the surface of the object and the infrared irradiator is a predetermined distance.

Disclosed is a printing apparatus in which web paper is transported to a printing face contact roller in a swirling form while a direction thereof is turned by first to fourth turning rollers. Heating units are arranged so as to face a printing face of the web paper between the two first and second turning rollers, between the two third and fourth turning rollers, and between the fourth turning roller and the printing face contact roller individually. Such arrangement can achieve a compact drying mechanism. The heating units each directly heat inks on the printing face, and thus do not overheat the web paper. Moreover, the heating units are not directed upward. This avoids contact of the web paper to a front side face of each of the heating units when the web paper slackens.

The electrode drying device includes a transfer unit that transfers an electrode sheet having an electrode slurry coated onto the current collector, and a drying chamber including an inflow port where the electrode sheet transferred by the transfer unit enters, wherein an interrupting member for adjusting the flow amount or flow velocity of outside air flowing in a drying chamber is formed at the inflow port, and a height of a central part of the interrupting member is different from a height of a peripheral part of the interrupting member.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

A discrete zone energy transmission system is provided. The system includes an object treatment area, an array of energy transmission elements configured to direct energy toward predetermined zones in the treatment area, a sensor configured to detect a presence and a location of an object in the treatment area, and a controller in communication with the array of energy transmission elements and the sensor. The controller is configured to receive presence and location data from the sensor, assign the data to the predetermined zones, and control an operation of the array of energy transmission elements to selectively radiate energy from the array of energy transmission elements only toward a select number of zones in the object treatment area based on the presence and location data, thereby selectively radiating the energy from the array of energy transmission elements only toward the object in the treatment area.