Patent classifications
F27B5/14
Process and apparatus for vacuum distillation of high-purity magnesium
A process for producing high-purity magnesium by means of distillation at reduced pressure, characterized in that, the high-purity magnesium condenses in the liquid state, whereby the starting material in the form of a magnesium-containing melt is present together with the upper region of a condensation vessel in the upper region of a retort, whereby the retort consist of a material that releases no volatile impurities into the magnesium steam, whereby the upper region of the retort is brought to a temperature above the boiling point of magnesium, within the limits of two level lines, and is then held constant, such that steam rises from the boiling magnesium-containing metal melt and fills the interior of the upper region of the retort, whereby the steam infiltrating the upper region of the condensation vessel condenses below the lower level line and collects as high-purity melt in the lower region of the condensation vessel, and whereby in order to prevent contaminated melt that drops from the region above the upper level line from reaching the opening of the condensation vessel, this is protected by a cover, which conveys the impure magnesium back again into the melt.
Process and apparatus for vacuum distillation of high-purity magnesium
A process for producing high-purity magnesium by means of distillation at reduced pressure, characterized in that, the high-purity magnesium condenses in the liquid state, whereby the starting material in the form of a magnesium-containing melt is present together with the upper region of a condensation vessel in the upper region of a retort, whereby the retort consist of a material that releases no volatile impurities into the magnesium steam, whereby the upper region of the retort is brought to a temperature above the boiling point of magnesium, within the limits of two level lines, and is then held constant, such that steam rises from the boiling magnesium-containing metal melt and fills the interior of the upper region of the retort, whereby the steam infiltrating the upper region of the condensation vessel condenses below the lower level line and collects as high-purity melt in the lower region of the condensation vessel, and whereby in order to prevent contaminated melt that drops from the region above the upper level line from reaching the opening of the condensation vessel, this is protected by a cover, which conveys the impure magnesium back again into the melt.
COOKING APPLIANCE
A cooking appliance apparatus includes at least one fan unit having at least one fan wheel which is mounted for rotation about a rotation axis. A heating element is provided to heat the fan wheel in at least one operating state, with the heating element being configured as an induction heating element.
COOKING APPLIANCE
A cooking appliance apparatus includes at least one fan unit having at least one fan wheel which is mounted for rotation about a rotation axis. A heating element is provided to heat the fan wheel in at least one operating state, with the heating element being configured as an induction heating element.
Heat treatment apparatus emitting flash of light
Flash lamps connected to short-pulse circuits and flash lamps connected to long-pulse circuits are alternately arranged in a line. The duration of light emission from the flash lamps connected to the long-pulse circuits is longer than the duration of light emission from the flash lamps connected to the short-pulse circuits. A superimposing of a flash of light with a high peak intensity from the flash lamps that emit light for a short time and a flash of light with a gentle peak from the flash lamps that emit light for a long time can increase the temperature of even a deep portion of a substrate to an activation temperature or more without heating a shallow portion near the substrate surface more than necessary. This achieves the activation of deep junctions without causing substrate warpage or cracking.
AN ELECTRICALLY HEATED APPARATUS
The present invention provides an electrically heated apparatus (1) at least comprising: an electrically heated furnace (2) having walls (2A, 2B) defining a space (3); a first row (4) of tubes (10) running through the space (3), wherein the tubes (10) have an inlet (11) and outlet (12) outside of the space (3); a second row (14) of tubes (10) running through the space (3), wherein the tubes (10) have an inlet (11) and outlet (12) outside of the space (3); a first set (5) of electrical radiative heating elements (20) located in the space (3), wherein the first set (5) comprises electrical radiative heating elements (20) located between the first (4) and second rows (14) of tubes (10).
Organic film forming apparatus
According to one embodiment, an organic film forming apparatus includes a chamber configured to maintain an atmosphere more reduced than an atmospheric pressure, at least one processing room provided inside the chamber and being surrounded by a cover, and an exhaust part configured to exhaust the inside the chamber. The processing room includes an upper heating part including first heaters, a lower heating part including second heaters, and facing the upper heating part, an upper heat equalizing plate provided on the lower heating part side of the upper heating part, a lower heat equalizing plate provided on the upper heating part side of the lower heating part, and workpiece supporters configured to support a workpiece through a gap between the upper and lower heat equalizing plates.
Organic film forming apparatus
According to one embodiment, an organic film forming apparatus includes a chamber configured to maintain an atmosphere more reduced than an atmospheric pressure, at least one processing room provided inside the chamber and being surrounded by a cover, and an exhaust part configured to exhaust the inside the chamber. The processing room includes an upper heating part including first heaters, a lower heating part including second heaters, and facing the upper heating part, an upper heat equalizing plate provided on the lower heating part side of the upper heating part, a lower heat equalizing plate provided on the upper heating part side of the lower heating part, and workpiece supporters configured to support a workpiece through a gap between the upper and lower heat equalizing plates.
Heating furnace and continuous heating furnace
A heating furnace includes a target space (212a) in which a burning target is disposed, and a furnace main body (212) that surrounds the target space. The heating furnace includes one or more closed gas heaters having an introduction hole configured to introduce a fuel gas into the main body, a combustion chamber in which the introduced fuel gas is combusted, a discharge section to which an exhaust gas generated by combustion is guided, a radiation surface heated by the exhaust gas flowing through the discharge section or combustion in the combustion chamber and configured to transfer radiant heat to the burning target, and an exhaust hole configured to exhaust the exhaust gas that heats the radiation surface to the outside of the main body, and disposed in the furnace main body, and an exhaust heat transfer section (an insulated pipe (222a)) in communication with the exhaust hole of the closed gas heater and to which the exhaust gas is guided. In addition, the exhaust heat transfer section is installed at any portion in the furnace main body except for a radiation space (212b) formed between the closed gas heater and the burning target disposed in the target space and configured to transfer the radiant heat to the burning target.
Heating furnace and continuous heating furnace
A heating furnace includes a target space (212a) in which a burning target is disposed, and a furnace main body (212) that surrounds the target space. The heating furnace includes one or more closed gas heaters having an introduction hole configured to introduce a fuel gas into the main body, a combustion chamber in which the introduced fuel gas is combusted, a discharge section to which an exhaust gas generated by combustion is guided, a radiation surface heated by the exhaust gas flowing through the discharge section or combustion in the combustion chamber and configured to transfer radiant heat to the burning target, and an exhaust hole configured to exhaust the exhaust gas that heats the radiation surface to the outside of the main body, and disposed in the furnace main body, and an exhaust heat transfer section (an insulated pipe (222a)) in communication with the exhaust hole of the closed gas heater and to which the exhaust gas is guided. In addition, the exhaust heat transfer section is installed at any portion in the furnace main body except for a radiation space (212b) formed between the closed gas heater and the burning target disposed in the target space and configured to transfer the radiant heat to the burning target.