Certain example embodiments relate to systems and/or methods for preferentially and selectively heat treating conductive coatings such as ITO using specifically tuned near infrared-short wave infrared (NIR-SWIR) radiation. In certain example embodiments, the coating is preferentially heated, thereby improving its properties while at the underlying substrate is kept at low temperatures. Such techniques are advantageous for applications on glass and/or other substrates, e.g., where elevated substrate temperatures can lead to stress changes that adversely effect downstream processing (such as, for example, cutting, grinding, etc.) and may sometimes even result in substrate breakage or deformation. Selective heating of the coating may in certain example embodiments be obtained by using IR emitters with peak outputs over spectral wavelengths where the conductive coating (or the conductive layer(s) in the conductive coating) is significantly absorbing but where the substrate has reduced or minimal absorption.

Certain example embodiments relate to systems and/or methods for preferentially and selectively heat treating conductive coatings such as ITO using specifically tuned near infrared-short wave infrared (NIR-SWIR) radiation. In certain example embodiments, the coating is preferentially heated, thereby improving its properties while at the underlying substrate is kept at low temperatures. Such techniques are advantageous for applications on glass and/or other substrates, e.g., where elevated substrate temperatures can lead to stress changes that adversely effect downstream processing (such as, for example, cutting, grinding, etc.) and may sometimes even result in substrate breakage or deformation. Selective heating of the coating may in certain example embodiments be obtained by using IR emitters with peak outputs over spectral wavelengths where the conductive coating (or the conductive layer(s) in the conductive coating) is significantly absorbing but where the substrate has reduced or minimal absorption.

There is provided a temperature control mechanism comprising: a plurality of combinations of a heater and a thyristor, wherein at least one combination of the heater and the thyristor is provided on a zone-by-zone basis, and wherein an area of an electrostatic chuck for mounting a substrate is divided into a plurality of zones; a power supply configured to supply current to heaters of the plurality of combinations respectively through the thyristors of the plurality of combinations; a pair of filters disposed at a power supply line for supplying electric power from the power supply to the heaters and configured to eliminate high frequency power applied to the power supply.

There is provided a temperature control mechanism comprising: a plurality of combinations of a heater and a thyristor, wherein at least one combination of the heater and the thyristor is provided on a zone-by-zone basis, and wherein an area of an electrostatic chuck for mounting a substrate is divided into a plurality of zones; a power supply configured to supply current to heaters of the plurality of combinations respectively through the thyristors of the plurality of combinations; a pair of filters disposed at a power supply line for supplying electric power from the power supply to the heaters and configured to eliminate high frequency power applied to the power supply.

An optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.

An optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.

A temperature-control device for receiving a reaction vessel having a heat-insulated interior space and which is covered by a lid. The reaction vessel has a hollow body and a cap, this hollow body being closed on one side by a base. The base contacts a heatable heating block in order to heat a sample located in the reaction vessel. The hollow body is surrounded by a heatable heating body which communicates with the lid via a heat-conducting contact region so that the heating body heats the hollow body directly and heats the cap indirectly via the lid.

A temperature-control device for receiving a reaction vessel having a heat-insulated interior space and which is covered by a lid. The reaction vessel has a hollow body and a cap, this hollow body being closed on one side by a base. The base contacts a heatable heating block in order to heat a sample located in the reaction vessel. The hollow body is surrounded by a heatable heating body which communicates with the lid via a heat-conducting contact region so that the heating body heats the hollow body directly and heats the cap indirectly via the lid.

The invention relates to a firing furnace or press furnace for dental restoration parts, having a control device for the control of the furnace on the basis of at least one firing/press program; a display device, at least for displaying operating instructions based on symbolic representations; an input device, at least for selecting a firing/press program; wherein the control device is configured to be able to switch the furnace after selection of a control program to a security mode in which it displays one or several operating instructions and in which the input of firing or press parameters of the control program and/or the selection of a firing or press program is disabled.

A furnace system includes a heating chamber, a retort assembly, and a waveguide. The heating chamber includes a shell encompassing an insulation layer and a working volume, where the working volume is configured to receive at least one part for heat treatment. The retort assembly is supported within the insulation layer and includes an inner retort surface facing the working volume. The inner retort surface is formed of at least one carbon compound reflective of microwave radiation, and the retort assembly defines a retort aperture. The waveguide is configured to direct microwave radiation from a microwave source to the retort aperture.