An insert for a waterless portable heating device can include multiple containers or shelves arranged in layers for insertion into the device. For example, the insert can have multiple compartments to heat multiple separate ingredients at the same time, e.g., without the ingredients touching each other.

A compound sintering furnace with managed contamination for debinding and sintering parts. An inner insulation layer is disposed within an outer insulation layer and has an internal hot face surrounding a work zone. A sealed housing surrounds the inner insulation layer and is composed of a refractory material capable of withstanding a service temperature greater than a debinding temperature and less than a sintering temperature. An outer heater system is configured to heat at least a portion of the sealed housing and externally heat the inner insulation layer to, in conjunction with an inner heater system, heat the work zone to the debinding temperature, and inhibit condensation of a binder within and upon the inner insulation layer during a debinding process. The inner heater system is configured to internally heat the inner insulation and heat the work zone to the sintering temperature.

A compound sintering furnace with managed contamination for debinding and sintering parts. An inner insulation layer is disposed within an outer insulation layer and has an internal hot face surrounding a work zone. A sealed housing surrounds the inner insulation layer and is composed of a refractory material capable of withstanding a service temperature greater than a debinding temperature and less than a sintering temperature. An outer heater system is configured to heat at least a portion of the sealed housing and externally heat the inner insulation layer to, in conjunction with an inner heater system, heat the work zone to the debinding temperature, and inhibit condensation of a binder within and upon the inner insulation layer during a debinding process. The inner heater system is configured to internally heat the inner insulation and heat the work zone to the sintering temperature.

A device for producing purified, especially high-purity, magnesium includes a reactor for vacuum distillation that is extended along a longitudinal axis (L). The reactor defines a reactor inner chamber having a heating region for heating magnesium. A crucible forms a crucible inner chamber for receiving purified magnesium vaporized and condensed by the device. A radial projection in the heating region defines a contact surface that extends essentially transverse to the longitudinal axis (L) and forms an essentially sealed connection with an edge of the crucible adjacent to the crucible inner chamber.

A device for producing purified, especially high-purity, magnesium includes a reactor for vacuum distillation that is extended along a longitudinal axis (L). The reactor defines a reactor inner chamber having a heating region for heating magnesium. A crucible forms a crucible inner chamber for receiving purified magnesium vaporized and condensed by the device. A radial projection in the heating region defines a contact surface that extends essentially transverse to the longitudinal axis (L) and forms an essentially sealed connection with an edge of the crucible adjacent to the crucible inner chamber.

A dual-purpose sintering furnace including a furnace body having a furnace chamber, a first furnace mouth and a second furnace mouth which are communicated with the furnace chamber, a furnace door hinged to the furnace body and configured for closing the first furnace mouth, a blocking member lap-jointed inside the furnace chamber and configured for blocking the second furnace mouth, a sample stage, an ejection rod fixedly arranged on a sample placement face of the sample stage, a lifting device configured for driving the sample stage to raise or lower, so that the ejection rod pushes the blocking member until the second furnace mouth is opened, and so that the sample stage enters the furnace chamber through the second furnace mouth. The dual-purpose sintering furnace can complete a large amount of sintering as conventional sintering and also implement rapid sintering.

A furnace for removing a molybdenum-alloy refractory metal core through sublimation comprising a retort furnace having an interior; a sublimation fixture insertable within the interior of the retort furnace, the sublimation fixture configured to receive at least one turbine blade having the molybdenum-alloy refractory metal core; a flow passage thermally coupled to the retort furnace configured to heat a fluid flowing through the flow passage and deliver the fluid to the molybdenum-alloy refractory metal core causing sublimation of the molybdenum-alloy refractory metal core.

A furnace for removing a molybdenum-alloy refractory metal core through sublimation comprising a retort furnace having an interior; a sublimation fixture insertable within the interior of the retort furnace, the sublimation fixture configured to receive at least one turbine blade having the molybdenum-alloy refractory metal core; a flow passage thermally coupled to the retort furnace configured to heat a fluid flowing through the flow passage and deliver the fluid to the molybdenum-alloy refractory metal core causing sublimation of the molybdenum-alloy refractory metal core.

An apparatus for treating a substrate are provided. The apparatus includes a chamber having a treatment space therein, a substrate support unit to support the substrate in the treatment space, and a heater unit to heat the substrate supported by the substrate support unit. The substrate support unit includes a support plate having a seating surface, a support protrusion provided to protrude from the seating plate and to directly support the substrate, and a sensor provided to the support protrusion to measure a temperature of the substrate.

An apparatus for treating a substrate are provided. The apparatus includes a chamber having a treatment space therein, a substrate support unit to support the substrate in the treatment space, and a heater unit to heat the substrate supported by the substrate support unit. The substrate support unit includes a support plate having a seating surface, a support protrusion provided to protrude from the seating plate and to directly support the substrate, and a sensor provided to the support protrusion to measure a temperature of the substrate.