F27B5/14

Dental furnace

A dental furnace for firing dental-ceramic compounds comprises a firing chamber for receiving ceramic elements to be fired. Further, a heating device for heating and firing the ceramic element is provided. The heating device comprises at least one heating element for producing IR radiation in the range of 0.8-5 μm.

HEATING FURNACE

A heating furnace includes: a heating furnace main body that includes an accommodation chamber capable of accommodating a heating target object; a heat source capable of heating an inside of the accommodation chamber to an annealing point; a gas supply source that is arranged outside the heating furnace main body; and a pipeline that includes a pipeline main body that is arranged inside the accommodation chamber, and that is heated by the heat source, the pipeline main body being configured to retain a gas supplied from the gas supply source and heat the gas to the annealing point, and a discharge outlet that is formed on an end portion of the pipeline main body, and that is opened inside the accommodation chamber, the discharge outlet being configured to discharge the gas that is heated to the annealing point, to the inside of the accommodation chamber.

HEATING FURNACE

A heating furnace includes: a heating furnace main body that includes an accommodation chamber capable of accommodating a heating target object; a heat source capable of heating an inside of the accommodation chamber to an annealing point; a gas supply source that is arranged outside the heating furnace main body; and a pipeline that includes a pipeline main body that is arranged inside the accommodation chamber, and that is heated by the heat source, the pipeline main body being configured to retain a gas supplied from the gas supply source and heat the gas to the annealing point, and a discharge outlet that is formed on an end portion of the pipeline main body, and that is opened inside the accommodation chamber, the discharge outlet being configured to discharge the gas that is heated to the annealing point, to the inside of the accommodation chamber.

Waterless Portable Precision Heating Device
20210318065 · 2021-10-14 · ·

A waterless portable precision heating device includes an ingredient container to contain a food-related, a health-related, or a crafting-related ingredient; a thin heating element configured to surround and contact the ingredient container; an insulation layer configured to surround and contact the heating element; an outer shell surrounding the insulation layer; a lid that encloses the product container and fluidly seals it from the environment; at least one sensor configured to detect the temperature of the device; and a circuit board with a controller that controls the heating of the heating in response to signals received from the at least one sensor indicating whether the product container has reached a threshold temperature.

Waterless Portable Precision Heating Device
20210318065 · 2021-10-14 · ·

A waterless portable precision heating device includes an ingredient container to contain a food-related, a health-related, or a crafting-related ingredient; a thin heating element configured to surround and contact the ingredient container; an insulation layer configured to surround and contact the heating element; an outer shell surrounding the insulation layer; a lid that encloses the product container and fluidly seals it from the environment; at least one sensor configured to detect the temperature of the device; and a circuit board with a controller that controls the heating of the heating in response to signals received from the at least one sensor indicating whether the product container has reached a threshold temperature.

PULSE TRAIN ANNEALING METHOD AND APPARATUS
20210220949 · 2021-07-22 ·

The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

Systems and methods for controlling residence time in heating systems
11102856 · 2021-08-24 · ·

A process for heating articles includes sequentially passing loaded carriers in a continuous manner through a first processing section and sequentially passing said plurality of loaded carriers in an incremental manner through a second processing section using an incremental convey segment. The incremental convey segment includes sequential carrier-receiving slots, each carrier-receiving slot configured to receive one of the loaded carriers. The incremental convey segment is further configured to be move incrementally at multiples of discrete intervals corresponding to the carrier-receiving slots. The process further includes sequentially passing the loaded carriers in a continuous manner through a third processing section and heating articles supported by the carriers with microwave energy in at least one of the processing sections, the heating of the articles occurring while the articles are at least partially submerged in a liquid bath and at an pressure greater than atmospheric pressure.

HEAT TREATMENT APPARATUS

A heat treatment apparatus includes: a treatment chamber unit that is, inside a furnace shell, detachably fixed to the furnace shell; and a power supply portion, in which the treatment chamber unit includes: a treatment container in which a heat treatment is performed on a workpiece; a heat insulating material provided inside the treatment container; a heater that has a heating element located inside the treatment container and has a terminal located outside the treatment container; and a busbar that is provided on the outside of the treatment container and is electrically connected to the terminal of the heater, the power supply portion is provided outside the treatment container, and the busbar and the power supply portion are detachably connected to each other.

Heating system with enhanced temperature control
11083053 · 2021-08-03 · ·

A process for heating articles in a heating system includes passing an article in a carrier through a heating chamber that is at least partially filled with a liquid medium to form a liquid bath. The process further includes heating the article in the carrier by at least partially submerging the article into the liquid bath during heating, the heating being performed, at least in part, using microwave energy. The process further includes one or more of adding fluid into and removing fluid from at least one location in the heating chamber to maintain a temperature profile across the heating chamber. In one implementation, the temperature of the liquid bath at an inlet area of the heating chamber is at least 10° C. cooler than a temperature of the liquid bath at an outlet area of the heating chamber.

Pulse train annealing method and apparatus

The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.