Patent classifications
F27B5/14
Insert for Waterless Portable Precision Heating Device
An insert for a waterless portable heating device can include multiple containers or shelves arranged in layers for insertion into the device. For example, the insert can have multiple compartments to heat multiple separate ingredients at the same time, e.g., without the ingredients touching each other.
Insert for Waterless Portable Precision Heating Device
An insert for a waterless portable heating device can include multiple containers or shelves arranged in layers for insertion into the device. For example, the insert can have multiple compartments to heat multiple separate ingredients at the same time, e.g., without the ingredients touching each other.
High definition heater and method of operation
A heater system is provided that includes a base functional layer having at least one functional zone. A substrate is secured to the functional member, and a tuning layer is secured to the substrate opposite the base functional layer. The tuning layer includes a plurality of zones that is greater in number than the zones of the base functional layer, and the tuning layer provides lower power than the base functional layer. A component is secured to the tuning layer opposite the substrate, and the substrate defines a thermal conductivity to absorb and dissipate a requisite amount of power from the base functional layer. A control system is also provided that has a plurality of addressable control elements in electrical communication with power lines and with the tuning layer, the control elements providing selective control of the tuning layer zones.
Waterless Portable Precision Heating Device
A waterless portable precision heating device includes an ingredient container to contain a food-related, a health-related, or a crafting-related ingredient; a thin heating element configured to surround and contact the ingredient container; an insulation layer configured to surround and contact the heating element; an outer shell surrounding the insulation layer; a lid that encloses the product container and fluidly seals it from the environment; at least one sensor configured to detect the temperature of the device; and a circuit board with a controller that controls the heating of the heating in response to signals received from the at least one sensor indicating whether the product container has reached a threshold temperature.
Waterless Portable Precision Heating Device
A waterless portable precision heating device includes an ingredient container to contain a food-related, a health-related, or a crafting-related ingredient; a thin heating element configured to surround and contact the ingredient container; an insulation layer configured to surround and contact the heating element; an outer shell surrounding the insulation layer; a lid that encloses the product container and fluidly seals it from the environment; at least one sensor configured to detect the temperature of the device; and a circuit board with a controller that controls the heating of the heating in response to signals received from the at least one sensor indicating whether the product container has reached a threshold temperature.
Thin film encapsulation mask preheat and substrate buffer chamber
Embodiments described herein relate to a thermal chamber utilized in the processing of display substrates. The thermal chamber may be part of a larger processing system configured to manufacture OLED devices. The thermal chamber may be configured to heat and cool masks and/or substrates utilized in deposition processes in the processing system. The thermal chamber may include a chamber body defining a volume sized to receive one or more cassettes containing a plurality of masks and/or substrates. Heaters coupled to the chamber body within the volume may be configured to controllably heat masks and/or substrates prior to deposition processes and cool the masks and/or substrates after deposition processes.
Thin film encapsulation mask preheat and substrate buffer chamber
Embodiments described herein relate to a thermal chamber utilized in the processing of display substrates. The thermal chamber may be part of a larger processing system configured to manufacture OLED devices. The thermal chamber may be configured to heat and cool masks and/or substrates utilized in deposition processes in the processing system. The thermal chamber may include a chamber body defining a volume sized to receive one or more cassettes containing a plurality of masks and/or substrates. Heaters coupled to the chamber body within the volume may be configured to controllably heat masks and/or substrates prior to deposition processes and cool the masks and/or substrates after deposition processes.
Microwave furnace for thermal processing
A furnace system includes a heating chamber, a retort assembly, and a waveguide. The heating chamber includes a shell encompassing an insulation layer and a working volume, where the working volume is configured to receive at least one part for heat treatment. The retort assembly is supported within the insulation layer and includes an inner retort surface facing the working volume. The inner retort surface is formed of at least one carbon compound reflective of microwave radiation, and the retort assembly defines a retort aperture. The waveguide is configured to direct microwave radiation from a microwave source to the retort aperture.
Microwave furnace for thermal processing
A furnace system includes a heating chamber, a retort assembly, and a waveguide. The heating chamber includes a shell encompassing an insulation layer and a working volume, where the working volume is configured to receive at least one part for heat treatment. The retort assembly is supported within the insulation layer and includes an inner retort surface facing the working volume. The inner retort surface is formed of at least one carbon compound reflective of microwave radiation, and the retort assembly defines a retort aperture. The waveguide is configured to direct microwave radiation from a microwave source to the retort aperture.
Air fry cooking method and apparatus
A method is disclosed for cooking food in an oven cavity, where airis the cooking medium. Using a predetermined cooking algorithm, a temperature of the oven cavity is adjusted in a plurality of temperature and/or time regulated cooking stages. An initial pre-heat stage targets a first target temperature including a user-selected oven cavity temperature plus a first offset. A subsequent post-heat stage targets a second target temperature including the user-selected temperature plus a second offset different from the first offset. Two or more heating elements and a fan are operated during the post-heat stage according to a duty cycle controlled via a hysteresis temperature control algorithm or a PID temperature control algorithm.