The present invention discloses a non-contact flow control system having a totally sealed cavity, comprising a housing, a flow control unit and an operation unit. The housing is provided with a fluid inlet, a fluid outlet, and a fluid channel extending between the fluid inlet and the fluid outlet; the flow control unit is arranged in the fluid channel and the operation unit is arranged on an outer side of the housing, wherein the operation unit comprises an operation element and an outer magnet fixed on the operation element; the flow control unit comprises a flow control element and an inner magnet fixed on the flow control element; when the operation element moves relative to the housing, the flow control element can move under the action of a magnetic force between the outer magnet and the inner magnet, thereby changing the flow of the system.

The present invention discloses a non-contact flow control system having a totally sealed cavity, comprising a housing, a flow control unit and an operation unit. The housing is provided with a fluid inlet, a fluid outlet, and a fluid channel extending between the fluid inlet and the fluid outlet; the flow control unit is arranged in the fluid channel and the operation unit is arranged on an outer side of the housing, wherein the operation unit comprises an operation element and an outer magnet fixed on the operation element; the flow control unit comprises a flow control element and an inner magnet fixed on the flow control element; when the operation element moves relative to the housing, the flow control element can move under the action of a magnetic force between the outer magnet and the inner magnet, thereby changing the flow of the system.

A fluid circulation circuit includes a flow passage switching valve. The flow passage switching valve includes a body and a switcher. The body includes a first inlet, a second inlet, and outlets including a first outlet. The switcher is capable of switching a passage configuration to a state in which a fluid that has flowed in from the first inlet flows out of either one of the outlets and a state in which the fluid that has flowed in from the second inlet flows out of either one of the outlets.

The present invention relates generally to a pendulum valve that is installed in a connection pipe connecting a vacuum pump between the chamber of a dry etching apparatus and the vacuum pump in the etching line of a semiconductor manufacturing process and adjusts the amount of gas, and more particularly to a pendulum valve that includes a fixed housing configured such that a shaft coupled to a valve gate for adjusting the amount of gas is closely fixed to a valve housing through an O-ring and a rotation shaft (an internal shaft) coupled to the inside of the fixed housing, so that only the rotation shaft separate from the value housing is rotated by using a lip seal as a rotation axis, thereby suppressing the discharge of unnecessary particles and hardened substances while maintaining the sealing characteristics of the pendulum valve.

The present invention relates generally to a pendulum valve that is installed in a connection pipe connecting a vacuum pump between the chamber of a dry etching apparatus and the vacuum pump in the etching line of a semiconductor manufacturing process and adjusts the amount of gas, and more particularly to a pendulum valve that includes a fixed housing configured such that a shaft coupled to a valve gate for adjusting the amount of gas is closely fixed to a valve housing through an O-ring and a rotation shaft (an internal shaft) coupled to the inside of the fixed housing, so that only the rotation shaft separate from the value housing is rotated by using a lip seal as a rotation axis, thereby suppressing the discharge of unnecessary particles and hardened substances while maintaining the sealing characteristics of the pendulum valve.

A valve device includes a housing integrally or separately having a flow path formation part where at least one flow path hole through which a fluid passes is formed. The valve device includes: a drive part that outputs a rotational force; and a rotation part that rotates about a predetermined axis by the rotational force output from the drive part. The rotation part includes a shaft and a rotor increasing or decreasing an opening degree of the flow path hole with rotation of the shaft. The rotor has a sliding surface that slides while facing an opening surface of the flow path formation part where the flow path hole is opened. At least a part of the rotation part is rotatably held by the housing.

A valve device includes a flow path formation member provided with at least one flow path hole through which a fluid passes, and a drive part that outputs a rotational force. The valve device includes a shaft, and a rotor having a sliding surface that slides while facing an opening surface of the flow path formation member where the flow path hole is opened, and the rotor is configured to increase or decrease an opening degree of the flow path hole with rotation of the shaft. The valve device includes an energization member that energizes the rotor toward the flow path formation member. The valve device includes a coupling structure configured to tiltably couple the shaft to the rotor such that a contact state between the sliding surface and the opening surface is held regardless of a posture or a position of the shaft.

A valve device includes a flow path formation member provided with at least one flow path hole through which a fluid passes, and a drive part that outputs a rotational force. The valve device includes a shaft, and a rotor having a sliding surface that slides while facing an opening surface of the flow path formation member where the flow path hole is opened, and the rotor is configured to increase or decrease an opening degree of the flow path hole with rotation of the shaft. The valve device includes an energization member that energizes the rotor toward the flow path formation member. The valve device includes a coupling structure configured to tiltably couple the shaft to the rotor such that a contact state between the sliding surface and the opening surface is held regardless of a posture or a position of the shaft.

The present application discloses a vacuum pumping valve for semiconductor equipment and a vacuum control system, wherein the vacuum pumping valve includes a driving device, a base, a rotary disk, and a set of blades, wherein the blades are mounted between the base and the rotary disk, the rotary disk driven by the driving device drives the blades to move synchronously on the base, the moving blades together form a pumping orifice, the shape of the pumping orifice is a regular polygon coaxial with the rotary disk, and the opening of the pumping orifice is adjustable by means of synchronous movement of the blades. In the present application, the effective passage area of the gas flow and vacuum pressure of the reaction chamber can be controlled, and the problem of an asymmetric gas plasma distribution can be effectively resolved.

An assembly, including a first chamber (1) and at least one second chamber (2) and at least one pivoting drive (3) for pivoting a pivoting object (4) of the assembly, wherein the pivoting object (4) is arranged in the first chamber (1) and at least one intermediate wall (5) is arranged between the first chamber (1) and the second chamber (2). A transmission body (6), which is annular at least in some sections, can be rotated about an axis of rotation (7) by the pivoting drive (3) and is fed through at least one feed-through opening (8), preferably two feed-through openings (8), in the intermediate wall (5).