A liquid supply device that reduces particle generation includes a pump configured to supply a liquid to a nozzle within a wafer processing chamber, a controller configured to control the pump, and a main power source configured to supply electrical power to the pump. The pump includes a stator, a coil surrounding the stator, a case having an internal space, and an impeller within the case internal space. The impeller is rotated by a magnetic force generated by the stator and the coil. When the electrical power is shut off from the main power source to the coil, the controller is configured to reduce a rotational speed of the impeller and stop the pump.

A magnetic levitation centrifugal pump, including a volute, stator magnetic ring and a rotor; the volute has a levitation cavity, a medium inlet and a medium outlet, the rotor is located inside the levitation cavity, the stator magnetic ring are fixed to the volute, and the rotor includes a rotor body and dynamic magnetic ring located on the rotor body; the dynamic magnetic ring and the stator magnetic ring are coaxial with each other and are nested, to limit the radial positions of the rotor body and the volute; magnet steel assemblies are further fixed at the rotor body, each magnet steel assembly includes N first magnet steels arranged along the circumferential direction, and magnetic poles of all the first magnet steels are arranged in a staggered manner; two ends of the volute are also encapsulated with driving coil assemblies.