A measurement apparatus and a measurement method capable of speedily and accurately measuring an edge shape are provided. A measurement apparatus according to an aspect of the present disclosure includes an objective lens positioned so that its focal plane cuts across an edge part of a substrate, a detector including a plurality of pixels and configured to detect a reflected light from the edge part of the substrate through a confocal optical system, an optical head in which the objective lens and the detector are disposed, a moving mechanism configured to change a relative position of the optical head with respect to the substrate so that an inclination of the focal plane with respect to the substrate is changed, and a processing unit configured to measure a shape of the edge part.

A measurement apparatus and a measurement method capable of speedily and accurately measuring an edge shape are provided. A measurement apparatus according to an aspect of the present disclosure includes an objective lens positioned so that its focal plane cuts across an edge part of a substrate, a detector including a plurality of pixels and configured to detect a reflected light from the edge part of the substrate through a confocal optical system, an optical head in which the objective lens and the detector are disposed, a moving mechanism configured to change a relative position of the optical head with respect to the substrate so that an inclination of the focal plane with respect to the substrate is changed, and a processing unit configured to measure a shape of the edge part.

The present disclosure is related to a system and a method for 3D shape measurement of a freeform surface based on high-speed deflectometry using composite patterns. More particularly, a system for profile measurement based on high-speed deflectometry using composite patterns includes: a composite pattern generation part to project a composite pattern generated by synthesizing patterns having different frequencies to a measurement object; a detector to acquire images of a deformed composite pattern reflected from the measurement object; and a phase acquisition part to acquire wrapped phases by each frequency from the composite pattern and unwrapped phases from the respective wrapped phases.

A method and system for assessing the quality of at least one component of optical material which has at least one first center axis includes directing at least one light beam towards at least one detector device such that while changing the position and/or orientation of the component relative to the light beam, the light beam crosses at least from time to time the component and determining, with at least one determination device, at least one characterizing value of at least one figure of merit of the component based on analyzing, with at least one analyzing device, the dependency of a parameter of the light beam detected by the detector device on the position and/or orientation of the component.

A method and system for assessing the quality of at least one component of optical material which has at least one first center axis includes directing at least one light beam towards at least one detector device such that while changing the position and/or orientation of the component relative to the light beam, the light beam crosses at least from time to time the component and determining, with at least one determination device, at least one characterizing value of at least one figure of merit of the component based on analyzing, with at least one analyzing device, the dependency of a parameter of the light beam detected by the detector device on the position and/or orientation of the component.

A defect inspection apparatus (100) is configured to approximate a difference value or an absolute value (Ia) of the difference value between a pixel value in at least three captured images (A) captured by an imager in at least three different phases of an elastic wave and a pixel value in a reference image (A.sub.ave) separate from the captured images (A) so as to acquire an approximate value for defect inspection corresponding to an amount of change in the pixel value in the captured images (A).

Disclosed is a photomask comprising: a transparent substrate; and a multi-layer light shielding pattern film disposed on the transparent substrate, wherein the multi-layer light shielding pattern film comprises: a first light shielding film; and a second light shielding film disposed on the first light shielding film and comprising a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface roughness Wr of the measuring zone satisfies Equation 1 below:

0 nm<Wr−Wo≤3 nm  [Equation 1] where, in the Equation 1 above, Wo is a surface roughness of the measuring zone before soaking and washing processes, Wr is a surface roughness of the measuring zone after soaking in SC-1 (standard clean-1) solution and washing with ozone water, and the SC-1 solution comprises NH.sub.4OH, H.sub.2O.sub.2, and H.sub.2O.

Disclosed is a photomask comprising: a transparent substrate; and a multi-layer light shielding pattern film disposed on the transparent substrate, wherein the multi-layer light shielding pattern film comprises: a first light shielding film; and a second light shielding film disposed on the first light shielding film and comprising a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface roughness Wr of the measuring zone satisfies Equation 1 below:

0 nm<Wr−Wo≤3 nm  [Equation 1] where, in the Equation 1 above, Wo is a surface roughness of the measuring zone before soaking and washing processes, Wr is a surface roughness of the measuring zone after soaking in SC-1 (standard clean-1) solution and washing with ozone water, and the SC-1 solution comprises NH.sub.4OH, H.sub.2O.sub.2, and H.sub.2O.

A deflectometry device comprising a kinematic spot part holder, a display, an imaging optic, a stop, and a camera imaging assembly including a camera lens and a camera having a detector. Additionally is described, a deflectometry device that is part of a deterministic finishing machine comprising a display, an imaging optic, a stop, and a camera imaging assembly including a camera lens and a camera. Additionally, a method for characterizing material removal created by a deterministic finishing machine is provided.

A deflectometry device comprising a kinematic spot part holder, a display, an imaging optic, a stop, and a camera imaging assembly including a camera lens and a camera having a detector. Additionally is described, a deflectometry device that is part of a deterministic finishing machine comprising a display, an imaging optic, a stop, and a camera imaging assembly including a camera lens and a camera. Additionally, a method for characterizing material removal created by a deterministic finishing machine is provided.