Patent classifications
G01B15/04
Methods And Systems For Tomographic Microscopy Imaging
The present invention relates to a method for acquiring tomographic images of a sample in a microscopy system, wherein the sample comprises a defined region, and wherein the method comprises determining a location in three-dimensional space of the defined region, wherein the method further comprises capturing an image of at least a part of the sample, and wherein the determination of the location in three-dimensional space of the defined region is based, at least in part, on the image of the part of the sample. The present invention also relates to a corresponding microscopy system and a computer program product to perform the method according to the present invention.
Methods And Systems For Tomographic Microscopy Imaging
The present invention relates to a method for acquiring tomographic images of a sample in a microscopy system, wherein the sample comprises a defined region, and wherein the method comprises determining a location in three-dimensional space of the defined region, wherein the method further comprises capturing an image of at least a part of the sample, and wherein the determination of the location in three-dimensional space of the defined region is based, at least in part, on the image of the part of the sample. The present invention also relates to a corresponding microscopy system and a computer program product to perform the method according to the present invention.
Multi-energy x-ray system and method for golf ball inspection
Systems and methods for measuring the concentricity of golf balls using varying energy levels to gather and analyze data on concentricity.
Dimension measuring device, dimension measuring method, and semiconductor manufacturing system
The present disclosure relates to a dimension measuring device that shortens a time required for dimension measurement and eliminates errors caused by an operator. A dimension measuring device that measures a dimension of a measurement target using an input image is provided, in which a first image in which each region of the input image is labeled by region is generated by machine learning, an intermediate image including a marker indicating each region of the first image is generated based on the generated first image, a second image in which each region of the input image is labeled by region is generated based on the input image and the generated intermediate image, coordinates of a boundary line between adjacent regions are obtained by using the generated second image, coordinates of a feature point that defines a dimension condition of the measurement target are obtained by using the obtained coordinates of the boundary line, and the dimension of the measurement target is measured by using the obtained coordinates of the feature point.
Dimension measuring device, dimension measuring method, and semiconductor manufacturing system
The present disclosure relates to a dimension measuring device that shortens a time required for dimension measurement and eliminates errors caused by an operator. A dimension measuring device that measures a dimension of a measurement target using an input image is provided, in which a first image in which each region of the input image is labeled by region is generated by machine learning, an intermediate image including a marker indicating each region of the first image is generated based on the generated first image, a second image in which each region of the input image is labeled by region is generated based on the input image and the generated intermediate image, coordinates of a boundary line between adjacent regions are obtained by using the generated second image, coordinates of a feature point that defines a dimension condition of the measurement target are obtained by using the obtained coordinates of the boundary line, and the dimension of the measurement target is measured by using the obtained coordinates of the feature point.
METHOD OF ENHANCING CONTRAST WHILE IMAGING HIGH ASPECT RATIO STRUCTURES IN ELECTRON MICROSCOPY
The enclosed disclosure relates to a method and apparatus for depositing functionalized nanoparticles within a semiconductor structure in order to create a nano-layer capable of enhancing imaging and contrast, The semiconductor structure can include any type of VNAND structure or 3D structure, The nanoparticles are formed in high-aspect ratio trenches of the structure and form a nano-layer. The functionalized nanoparticles comprise synthesized nanoparticles as well as organic molecules. The organic molecules are chosen to selectively bind to certain nanoparticles and surface materials.
METHOD OF ENHANCING CONTRAST WHILE IMAGING HIGH ASPECT RATIO STRUCTURES IN ELECTRON MICROSCOPY
The enclosed disclosure relates to a method and apparatus for depositing functionalized nanoparticles within a semiconductor structure in order to create a nano-layer capable of enhancing imaging and contrast, The semiconductor structure can include any type of VNAND structure or 3D structure, The nanoparticles are formed in high-aspect ratio trenches of the structure and form a nano-layer. The functionalized nanoparticles comprise synthesized nanoparticles as well as organic molecules. The organic molecules are chosen to selectively bind to certain nanoparticles and surface materials.
COMPONENT IMAGING SYSTEMS, APPARATUS, AND METHODS
A system for imaging a component defining a negative space is provided comprising a component imaging assembly, a bolus insert, and an imaging device. The bolus insert is positionable in the component's negative space when the component is positioned within an imaging device imaging field to produce a component image. A method is provided comprising positioning a bolus insert within a component's negative space and scanning the component having the bolus insert to create an image of the component. A component imaging assembly is provided comprising a component including a first portion having a first thickness that is greater than a second thickness of a second portion; and a bolus insert positioned adjacent the second portion that has a bolus thickness substantially similar to a difference between the first and second thicknesses. The bolus insert has a bolus material density within fifteen percent (15%) of a component material density.
COMPONENT IMAGING SYSTEMS, APPARATUS, AND METHODS
A system for imaging a component defining a negative space is provided comprising a component imaging assembly, a bolus insert, and an imaging device. The bolus insert is positionable in the component's negative space when the component is positioned within an imaging device imaging field to produce a component image. A method is provided comprising positioning a bolus insert within a component's negative space and scanning the component having the bolus insert to create an image of the component. A component imaging assembly is provided comprising a component including a first portion having a first thickness that is greater than a second thickness of a second portion; and a bolus insert positioned adjacent the second portion that has a bolus thickness substantially similar to a difference between the first and second thicknesses. The bolus insert has a bolus material density within fifteen percent (15%) of a component material density.
MATERIAL ANALYSIS METHOD
A material analysis method is provided. A plurality of wafers processed from a plurality of ingots are measured by a measuring instrument to obtain an average of a bow of each of the wafers processed from the ingots and a plurality of full widths at half maximum (FWHM) of each of the wafers. Key factors respectively corresponding to the ingots are calculated according to the FWHM of the wafers. A regression equation is obtained according to the key factors and the average of the bows.