The invention concerns a device (1) for the chromatic confocal measurement of a local height and/or orientation of a surface (S) of a sample comprising—a light source (2) configured to generate a polychromatic light beam (9)—a projection lens (4) comprising a lens (4) with axial chromatism configured to apply the light beam (9) to the surface (S) of the sample, —an optical sensor, configured to receive a light beam (9) reflected by the surface (S) of the sample and measure a total energy of the reflected light beam (9) received during an integration interval, —a scanning system (10), coupled to the projection lens (4) and configured to move the propagation axis of the light beam (9) relative to the projection lens (4), such that the total energy measured by the optical sensor corresponds to a dynamic spatial average of the total energy of the light beam (9) reflected by the surface (S) of the sample.

An optical measurement device includes: a light source, which emits light; a light reception portion, which detects a light reception amount of reflected light reflected on a target; a measurement portion, which measures a distance from the optical measurement device to the target based on the light reception amount of the reflected light; and a detection portion, which detects a portion of the target in which a light reception amount per unit time of the reflected light is smaller than a threshold value.

The present invention relates to a wafer carrier thickness measuring device capable of accurately measuring an inner/outer circumferential thickness of a wafer carrier in a non-contact manner. The present invention provides a wafer carrier thickness measuring device including: a first table installed to be capable of rotating and moving vertically and capable of supporting a central portion of a wafer carrier; a second table disposed outside the first table and rotatably installed, and capable of supporting an outer circumferential portion of the wafer carrier; upper and lower sensors for calculating a thickness of the wafer carrier by measuring a distance to upper and lower surfaces of the wafer carrier supported by one of the first and second tables in a non-contact manner; and a sensor driving unit located at one side of the second table and moving the upper and lower sensors to an upper side or a lower side of the wafer carrier supported by one of the first and second tables.

An apparatus comprising: a double path interferometer comprising a sample path for an object and a reference path; a source of linearly polarized light for the double path interferometer, a phase plate positioned in the sample path; means for superposing the sample path and reference path to create a beam of light for detection; means for spatially modulating the beam of light to produce a modulated beam of light; means for dispersing the modulated beam of light to produce a spatially modulated and dispersed beam of light; a first detector, a second detector, and means for splitting the spatially modulated and dispersed beam of light, wherein light of a first linear polarization is directed to the first detector and light of a second linear polarization, orthogonal to the first linear polarization, is directed to the second detector.

Disclosed herein is a contactless sensing unit for a measuring apparatus or machine tool 1, notably for a coordinate measuring machine (CMM). The contactless sensing unit comprises an optical probe device, a coupling element for mechanical connection to a complementary coupling element on the measuring apparatus or machine tool and a housing for housing the optical probe device. The housing is mechanically connected to the coupling element. The optical probe device comprises an optical objective at a distal end of a lower portion of the probe device for sensing a surface of a workpiece. The contactless sensing unit further comprises a collar for adjusting a relative axial, radial and/or angular position of the optical probe device with respect to a fastening portion of the housing. The collar circumferentially clamps the optical probe device essentially around an upper portion of the optical probe device.

A chromatic range sensor (CRS) system is provided that determines a workpiece thickness and includes an optical pen, an illumination source, a wavelength detector and a processing portion. The optical pen includes an optics portion providing axial chromatic dispersion, the illumination source is configured to generate multi-wavelength light and the wavelength detector includes a plurality of pixels distributed along a measurement axis. In operation, the optical pen inputs a spectral profile from the illumination source and outputs corresponding radiation to first and second workpiece surfaces of a workpiece (e.g., which may be transparent) and outputs reflected radiation to the wavelength detector which provides output spectral profile data. The processing portion processes the output spectral profile data to determine a thickness of the workpiece. In various implementations, the processing to determine the thickness may not rely on determining a distance to the workpiece and/or may utilize transform processing, etc.

A sensor head is provided and achieves improved measurement accuracy while reducing measurement time. The sensor head includes: a case including a first case section having a lens therein, a second case section having an objective lens therein, and a third case section providing connection between the first case section and the second case section. Inside the third case section, a mirror member for folding light incident thereon from the lens toward the objective lens is disposed, and a hollow tube providing communication between through holes respectively formed in the mirror member and the objective lens is provided.

A white light confocal optical measurement device capable of detecting abnormalities in a received light waveform; the optical measurement device includes: a light source; an optical system; a light receiving unit; and a processor configured to compute the distance from the optical system to the measurement object on the basis of a received light intensity of the wavelength components received in the light receiving unit. The processor compares a received light intensity of a wavelength component to a reference value for the wavelength component for a plurality of wavelength components in a waveform representing the light received, and detects an abnormality in the received light waveform when the amount of change in the received light intensity compared to the reference value therefor is greater than or equal to a predetermined threshold for any wavelength component in the plurality of wavelength components.

A calibration configuration for a chromatic range sensor (CRS) optical probe of a coordinate measurement machine (CMM) includes a cylindrical calibration object and a spherical calibration object. The cylindrical calibration object includes at least a first nominally cylindrical calibration surface having a central axis that extends along a Z direction that is intended to be aligned approximately parallel to a rotation axis of the CRS optical probe. The spherical calibration object includes a nominally spherical calibration surface having a first plurality of surface portions. The CMM is operated to obtain radial distance measurements and determine cylindrical calibration data using radial distance measurements of the cylindrical calibration object and to determine spherical calibration data using radial distance measurements of the spherical calibration object.

According to an exemplary embodiment of the present invention, a system for measuring a distance is disclosed. The system includes: an LED light source configured to apply light to a target of which a distance is desired to be measured; a first splitter configured to partially reflect light applied from the LED light source; optical fiber configured to apply light passing through the first splitter to the target; and a second splitter configured to reflect light reflected from the target, and the system may further include: a first sensor configured to sense light reflected from the first splitter; and a second sensor configured to sense light reflected from the second splitter.