Patent classifications
G01F7/005
USE OF MULTIPLE FLOW METERING DEVICES IN PARALLEL TO MONITOR AND CONTROL FLUIDS THROUGH A PIPE
A fluid metering system includes a first and a second fluidic pipe section disposed in parallel between a fluidic pipe inlet and outlet. The first fluidic pipe section includes a first flow control device and a first flow metering device each connected in fluidic series. The second fluidic pipe section includes a second flow metering device connected in fluidic series. The fluidic pipe inlet and the fluidic pipe outlet have the same cross-sectional area and/or flow rate capacity. The first fluidic pipe section has an equal or smaller cross-sectional area and/or flow rate capacity in comparison to the fluidic pipe inlet and outlet. The second fluidic pipe section has a smaller cross-sectional area and/or flow rate capacity in comparison to the cross-sectional area and/or flow rate capacity of the first fluidic pipe section. Alternatively, the second fluidic pipe section may include a second flow control device connected in fluidic series.
FLOW RATE MEASUREMENT DEVICE AND FLOW RATE MEASUREMENT METHOD
Provided are a flow rate measurement device and a flow rate measurement method capable of accurately measuring flow rates not only in a turbulent flow region but also in a laminar flow region and a transition region. A processor includes: a parameter generator that obtains a reference differential pressure in a flow rate calculation formula of expression 1 as follows, based on already-known flow rates and measured differential pressures corresponding thereto, and generates two parameter sets each including coefficients c1 to c3 of the flow rate calculation formula, with the reference differential pressure being a boundary; a differential pressure determination unit that selects one of the two parameter sets by comparing a measured differential pressure of a fluid as a measurement target with the reference differential pressure; and a flow rate calculator that calculates a flow rate of the fluid from the parameter set and the measured differential pressure.
P=c1Q+c2Q.sup.2+c3(expression 1)
(Q: flow rate, P: differential pressure, coefficient of kinematic viscosity, : density, c1 to c3: coefficients)
GELATION CHARACTERIZATION IN SLIM TUBES
A polymer is flowed through a slim tube including porous media until steady state is achieved. A temperature of the porous media with the polymer is adjusted to emulate a reservoir temperature. A slug of a gel solution is flowed through the porous media in the slim tube. The gel solution includes the polymer and a crosslinker. The gel solution is configured to at least partially solidify at the temperature. Multiple pressure drops across the porous media in the slim tube are measured at corresponding locations along a length of the slim tube while the slug flows through the porous media in the slim tube. The slug at least partially solidifies within the slim tube, causing an increase in pressure. A location of gelation of the slug of gel solution within the slim tube is determined based on the increase in pressure.
METHOD OF INSPECTING AND INSPECTION APPARATUS
The method for inspecting the flow rate controller for controlling a flow rate of a fluid includes creating and recording a three-dimensional database in which a first pressure, a set flow rate or a second pressure, and a control value of a piezoelectric element are associated with each other, based on reference data, measuring, as target data, control values of the piezoelectric element corresponding to the first pressure detected by a first pressure detector and the set flow rate specified in a recipe of a substrate processing process or the second pressure detected by a second pressure detector, at the time of the execution of the substrate processing process, and determining whether or not there is a problem in a diaphragm valve, by comparing the target data with the reference data included in the three-dimensional database.
METHOD OF INSPECTING AND FLOW RATE CONTROLLER
The method of inspecting a flow rate controller for controlling a flow rate of a fluid, the flow rate controller including a first pressure detector for detecting a first pressure that is a pressure of the fluid, and a diaphragm valve provided downstream of the first pressure detector and having a diaphragm and a piezoelectric element for driving the diaphragm, the method including: acquiring reference data including the first pressure and a control value of the piezoelectric element with respect to a set flow rate of the fluid; measuring target data including the first pressure and the control value of the piezoelectric element with respect to the set flow rate of the fluid after execution of the acquiring; and determining whether or not there is a problem in the diaphragm valve, by comparing the reference data with the target data.
FLOW RATE MEASUREMENT DEVICE AND FLOW RATE MEASUREMENT METHOD
The present invention accurately measures flow rates that have a high peak flow rate caused by pulsation, and is provided with a first flow rate converter having a first measurement range and a first response speed, a second flow rate converter having a second measurement range that is narrower on a low flow rate side than the first measurement range and has a second response speed that is slower than the first response speed, and a flow rate calculation unit that, when a flow rate contained in the second measurement range is measured, calculates the flow rate by correcting outputs from the first flow rate converter using outputs from the second flow rate converter.
Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
In one embodiment, a semiconductor manufacturing apparatus includes first and second tanks configured to store a gas fed from a gas feeder. The apparatus further includes a chamber configured to process a wafer by using the gas fed from the gas feeder, the first tank or the second tank. The apparatus further includes a controller configured to control feeding of the gas to the first tank, the second tank and the chamber.
Chemical injection system for a resource extraction system
A chemical injection system for a resource extraction system includes a controller having a memory and a processor. The memory stores instructions that cause the processor to receive a first pressure from a first pressure sensor of the resource extraction system, receive a second pressure from a second pressure sensor of the resource extraction system, determine a flowrate of a produced fluid of the resource extraction system based on the first pressure and the second pressure, determine an ion concentration of the produced fluid, and adjust an injection rate of a chemical into the resource extraction system based on the flowrate of the produced fluid, the ion concentration of the produced fluid, or both.
Method and apparatus for measuring gas flow
A gas flow measuring method is provided. A first pressure of a gas in a first and a second flow path is measured. A gas is supplied to the first and the second flow paths by repeating gas supply and stop of the gas supply, and a gas supply time is measured. A second pressure and a temperature of the gas in the first and the second flow path is measured, a third pressure of the gas in the second flow path is measured after the gas is exhausted from the second flow path, and a fourth pressure of the gas in the first and the second flow path is measured. The gas flow supplied to the first and the second flow path is calculated based on the first to fourth pressures and the temperature, and corrected based on a theoretical gas supply time and a calculated average time.
Flow rate measurement system
A flow rate measurement system measures, by using a flow rate measurement device, a flow rate of cleaning gas in a container storage facility including: a storage rack including supporting portions; a transport device that transports a container to the supporting portions; and a gas supply device that supplies the cleaning gas to the container supported by the supporting portions. The transport device and the flow rate measurement device are connected via a power line communicatively by wire or wireless. The flow rate measurement device measures the flow rate of the cleaning gas in a state in which the transport device has transported the flow rate measurement device and the flow rate measurement device is placed on a target supporting portion.