G01J2005/0074

METHODS AND SYSTEMS FOR TEMPERATURE MEASUREMENT WITH MACHINE LEARNING ALGORITHM
20190226913 · 2019-07-25 ·

A method includes capturing an image, and performing region detection on the captured image. The region detection includes identifying an object represented in the captured image. The method further includes detecting emissivity of the identified object and determining the temperature of the object based on the detected emissivity of the object.

CAVITY BLACKBODY RADIATION SOURCE AND METHOD OF MAKING THE SAME
20190212202 · 2019-07-11 ·

A cavity blackbody radiation source is provide. A cavity blackbody radiation source comprises a blackbody radiation cavity and a carbon nanotube layer. The blackbody radiation cavity comprises an inner surface. The carbon nanotube layer is located on the inner surface. The carbon nanotube carbon nanotube layer comprises a plurality of carbon nanotubes and a plurality of microporous. A method of making the cavity blackbody radiation source is also provide.

CAVITY BLACKBODY RADIATION SOURCE AND METHOD OF MAKING THE SAME
20190212203 · 2019-07-11 ·

A cavity black body radiation source is provided. The cavity black body radiation source comprises a blackbody radiation cavity, a black lacquer, and a carbon nanotube layer. The blackbody radiation cavity comprises an inner surface. The black lacquer is located on the inner surface. The carbon nanotube layer is located on a surface of the black lacquer away from the blackbody radiation cavity. The carbon nanotube layer comprises a plurality of carbon nanotubes and a plurality of microporous. A method of making the cavity blackbody radiation source is also provided.

DEVICE AND METHOD FOR MONITORING AN EMISSION TEMPERATURE OF A RADIATION EMITTING ELEMENT
20240192059 · 2024-06-13 ·

The present invention refers to a device (112) for monitoring an emission temperature of at least one radiation emitting element (114), a heating system (110) for heating at the least one radiation emitting element (114) to emit thermal radiation at an emission temperature, a method for monitoring an emission temperature of at least one radiation emitting element (114) and method for heating the at least one radiation emitting element (114) to emit thermal radiation at an emission temperature. Herein, the device (112) for monitoring an emission temperature of at least one radiation emitting element (114) comprisesat least one light source (125), wherein the light source is configured to emit optical radiation at least partially towards the at least one radiation emitting element (114); at least one radiation sensitive element (126), wherein the at least one radiation sensitive element (126) has at least one sensor region (128), wherein the at least one sensor region (128) comprises at least one photosensitive material selected from at least one photoconductive material, wherein the at least one sensor region (128) is designated for generating at least one sensor signal depending on an intensity of the thermal radiation emitted by the at least one radiation emitting element (114) and received by the sensor region (128) within at least one wavelength range, wherein the sensor region (128) is further designated for generating at least one further sensor signal depending on an intensity of the optical radiation emitted by the at least one light source (125) and received by the sensor region (128) within at least one further wavelength range, wherein the at least one radiation sensitive element (126) is arranged in a manner that the thermal radiation travels through at least one transition material (116) prior to being received by the at least one radiation sensitive element (126), wherein at least one of the at least one light source (125) and the at least one radiation sensitive element (126) is arranged in a manner that the optical radiation travels through the at least one transition material (116) and impinges the at least one radiation emitting element (114) prior to being received by the at least one radiation sensitive element (126); andat least one evaluation unit (138), wherein the at least one evaluation unit (138) is configured to determine the emission temperature of the at least one radiation emitting element (114) by using values for

MULTISPECTRAL PLASMONIC THERMAL IMAGING DEVICE

A computer-eimplemented method and thermal imaging device includes a layer of plasmonic material and a processor. The layer of plasmonic material receive electromagnetic radiation from an object and generates radiance measurements of the electromagnetic radiation at a plurality of wavelengths. The processor determines an emissivity and temperature of the object from the radiance measurements and forms a thermal-based electronic image of the object from the determined emissivity and temperature.

INFRARED IMAGING DEVICE AND FIXED PATTERN NOISE DATA GENERATION METHOD
20240244348 · 2024-07-18 · ·

Provided here are: an infrared imaging element that receives infrared light to capture a thermal image; an element temperature sensor that detects a temperature of the infrared imaging element; an FPN memory that stores therein FPN data at each of the temperatures; a frame memory that saves a plurality of pieces of frame data composed of thermal images captured by the infrared imaging element in a fixed period of time; and an FPN data generation unit that, when an imaging target is determined not to have changed on the basis of the frame data, acquires from the FPN memory, the FPN data corresponding to the temperature of the infrared imaging element at which said frame data were obtained; and performs averaging processing between average values AF of the plurality of pieces of frame data and the thus-acquired FPN data, to thereby regenerate the FPN data in an updated manner.

Spectral emissivity and temperature measurements of metal powders during continuous processing in powder bed fusion additive manufacturing

A method of measuring spectral emissivity of materials is provided. The method comprises placing material in a controlled chamber and exposing the material to an energy source to heat the material. At least one multi-wavelength pyrometer measures the spectral emissivity of the material produced by heating by the energy source, wherein the multi-wavelength pyrometer is positioned at a distal end of a tube extending from the chamber, wherein the tube provides a sacrificial surface for vapor condensation to prevent the vapor condensation from obscuring a view port used by the pyrometer.

Infrared Contrasting Color Emissivity Measurement System
20190003897 · 2019-01-03 ·

Devices and corresponding methods can be provided to measure temperature and/or emissivity of a target. Emissivity of the target need not be known or assumed, and any temperature difference between a sensor and the target need not be zeroed or minimized. No particular bandpass filter is required. Devices can include one or two sensors viewing the same target as the target views different respective viewed temperatures. The respective viewed temperatures can be sensor temperatures, and a single sensor can be set to each of the respective viewed temperatures at different times. An analyzer can determine the temperature and/or emissivity of the target based on the respective viewed temperatures and on plural net heat fluxes detected by the sensors and corresponding to the respective viewed temperatures.

APPARATUS AND METHOD TO MEASURE TEMPERATURE OF 3D SEMICONDUCTOR STRUCTURES VIA LASER DIFFRACTION

Embodiments of the present invention generally relate to apparatus for and methods of measuring and monitoring the temperature of a substrate having a 3D feature thereon. The apparatus include a light source for irradiating a substrate having a 3D feature thereon, a focus lens for gathering and focusing reflected light, and an emissometer for detecting the emissivity of the focused reflected light. The apparatus may also include a beam splitter and an imaging device. The imaging device provides a magnified image of the diffraction pattern of the reflected light. The method includes irradiating a substrate having a 3D feature thereon with light, and focusing reflected light with a focusing lens. The focused light is then directed to a sensor and the emissivity of the substrate is measured. The reflected light may also impinge upon an imaging device to generate a magnified image of the diffraction pattern of the reflected light.

Work measurement system, education system, and quality control system

A burner work measurement system configured to measure work using a burner is provided. The burner work measurement system includes one or more cameras configured to capture the work and a control unit configured to perform computing processing on images captured by the cameras, the control unit is configured to create work data obtained by calculating, based on the images captured by the cameras, at least one of a positional relation between a work object and the burner or flame, a positional relation between the work object and a brazing filler metal, and a positional relation between the burner or the flame and the brazing filler metal.