An uncooled infrared polarization detection pixel structure, a chip, and a detector. By setting a light-passing region of a grating layer to a regular polygon corresponding to a polarization direction, it can be ensured that gratings (111) in the light-passing region that correspond to different polarization directions have the same shape except for the different polarization directions, thereby ensuring that the grating layer has the same transmission efficiency for incident light of multiple preset polarization directions. By setting a pixel layer to a regular polygon corresponding to a light-transmissive region, and providing absorption units (8) on the surface of the pixel unit, the influence of a polarization-selective absorption characteristic caused by an electrode (71) in the pixel layer can be eliminated, so that the light absorption of infrared detection pixels is insensitive to polarization, thereby ensuring that the response of the pixel layer to light in different polarization directions is consistent, and avoiding the problem of response non-uniformity.

An uncooled infrared polarization detection pixel structure, a chip, and a detector. By setting a light-passing region of a grating layer to a regular polygon corresponding to a polarization direction, it can be ensured that gratings (111) in the light-passing region that correspond to different polarization directions have the same shape except for the different polarization directions, thereby ensuring that the grating layer has the same transmission efficiency for incident light of multiple preset polarization directions. By setting a pixel layer to a regular polygon corresponding to a light-transmissive region, and providing absorption units (8) on the surface of the pixel unit, the influence of a polarization-selective absorption characteristic caused by an electrode (71) in the pixel layer can be eliminated, so that the light absorption of infrared detection pixels is insensitive to polarization, thereby ensuring that the response of the pixel layer to light in different polarization directions is consistent, and avoiding the problem of response non-uniformity.

A projection exposure apparatus for semiconductor lithography comprises an optical element and a temperature recording device for detecting a temperature on a surface of the optical element via electromagnetic radiation emanating from the surface of the optical element. The temperature recording device can comprise a filter for filtering the electromagnetic radiation.

A projection exposure apparatus for semiconductor lithography comprises an optical element and a temperature recording device for detecting a temperature on a surface of the optical element via electromagnetic radiation emanating from the surface of the optical element. The temperature recording device can comprise a filter for filtering the electromagnetic radiation.

Systems and methods for object and material recognition are provided and include a hyperspectral infrared camera that captures a three-dimensional image of an object and black-body emissions data indicating a polarization of black-body radiation emitted from the object. An image processing device accesses a database of expected polarization signatures of black-body emissions from materials at different temperatures and determines a material of the object based on (i) the black-body emissions data indicating the polarization of the black-body radiation emitted from the object, (ii) an ambient temperature of the environment of the system, and (iii) the database of expected polarization signatures of black-body emissions from a plurality of materials for different temperatures.

Systems and methods for object and material recognition are provided and include a hyperspectral infrared camera that captures a three-dimensional image of an object and black-body emissions data indicating a polarization of black-body radiation emitted from the object. An image processing device accesses a database of expected polarization signatures of black-body emissions from materials at different temperatures and determines a material of the object based on (i) the black-body emissions data indicating the polarization of the black-body radiation emitted from the object, (ii) an ambient temperature of the environment of the system, and (iii) the database of expected polarization signatures of black-body emissions from a plurality of materials for different temperatures.