Measurement method for interferometrically determining a shape of a test object (14) surface (12) includes arranging a first diffractive optical element (30, 130, 230) in an input wave (18) beam path, to generate a first test wave (34) with a wavefront that is adapted to a desired shape of the optical surface, detecting a first interferogram generated by the first test wave after interaction with the test object surface, arranging a different diffractive optical element (32, 232) in the input wave beam path for generating a further test wave with a wavefront which is adapted to the desired shape of the optical surface, the first and the further diffractive optical elements differing in their respective diffraction structure configurations, capturing a further interferogram generated by the further test wave after interaction with the test object surface, and determining the surface shape of the test object by calculating the two interferograms.

An arrangement monitors an optical element. The arrangement includes: a light source configured to emit radiation onto a surface of the optical element; a detector configured to detect the radiation that has been at least partially reflected at the surface of the optical element; and a holder for the optical element, in which the light source and the detector are integrated. The holder has a cooling region through which a cooling liquid is configured to flow, the cooling region being in contact with the optical element. The holder has a reservoir, through which a beam path between the light source and the detector extends. The reservoir is configured to receive the cooling liquid leaking out at the optical element in case of a leakage.

Single-shot, adaptive metrology of rotationally variant optical surfaces, such as toroids, off-axis conies and freeform surfaces. An adaptive interferometric null test uses a high definition liquid crystal phase-only spatial light modulator (SLM) as the reconfigurable null element, on which a simulated nulling phase function is encoded, based on the specifications of the surface under test to generate a null interferogram. The power component of the surface sag is nulled by system design, not the SLM, enabling the SLM to fully compensate the residual departure without the need to tilt the optic or use a custom Offner-null. By wrapping the phase function at multiples of 2*pi radian, the upper limit in sag of the optic under test is theoretically removed.

The present invention relates to a device for measuring an optical element comprising: a. a light source, b. a measurement structure which illuminated by the light of the light source and has areas of different transmissivity, c. an optical imaging system for converting light transmitted by the measurement structure into a collimated measuring beam which is directed onto the optical element, and d. a sensor for detecting a reflection of the measuring beam generated on the optical element for detecting a transmission of the measuring beam passing through the optical element. According to the invention the light source has a plurality of light segments, wherein the device further comprises a control unit which is designed for independently controlling the plurality of light segments. The invention further relates to a corresponding method for measuring an optical element. The device according to the invention and the method according to the invention can be used particularly flexibly due to the segmented light source.

A method for calibrating a measuring device (10) for interferometrically determining a shape of an optical surface (12) of an object under test (14). The measuring device includes a module plane (32) for arranging a diffractive optical test module (30) which is configured to generate a test wave (34) that is directed at the optical surface and that has a wavefront at least approximately adapted to a target shape (60) of the optical surface. The method includes: arranging a diffractive optical calibration module (44) in the module plane for generating a calibration wave (80), acquiring a calibration interferogram (88) generated using the calibration wave in a detector plane (43) of the measuring device, and determining a position assignment distribution (46) of points (52) in the module plane to corresponding points (54) in the detector plane from the acquired calibration interferogram.

A method for recognizing misalignments and/or contaminations of optical systems in smart glasses, including at least one laser projector, which is provided for the purpose of outputting at least one light signal forming at least partially an image display of the smart glasses. It is provided that in at least one monitoring step, an at least partial back-reflection of the light signal generated by components of the optical system is detected and examined for deviations from a reference state.

A reflection rate detection device and reflection rate detection method for a liquid crystal panel are provided by embodiments of the present application. A sphere of the liquid crystal panel is a hollow sphere, and an inner wall of the sphere is uniformly sprayed with diffuse reflection materials. The sphere is provided with a window hole, and the window hole corresponds to the liquid crystal panel. The emitting light source is disposed on the sphere, the emitting light source is configured to emit light, and emitted light enters the liquid crystal panel. The receiver is configured to receive reflection energy of the liquid crystal panel. A reflection rate of a large-area liquid crystal panel can be detected by the present application.

An apparatus and a method measure a reflectivity and/or transmittivity of an optical surface. The apparatus includes a pulsed coherent white light source for generating pulsed coherent white light, wherein the apparatus is adapted to irradiate the optical surface with at least a part of the generated pulsed coherent white light.

A measurement apparatus (10) for measuring a wavefront aberration of an imaging optical system (12) includes (i) a measurement wave generating module (24) which generates a measurement wave (26) radiated onto the optical system and which includes an illumination system (30) illuminating a mask plane (14) with an illumination radiation (32), as well as coherence structures (36) arranged in the mask plane, and (ii) a wavefront measurement module (28) which measures the measurement wave after passing through the optical system and determines from the measurement result, with an evaluation device (46), a deviation of the wavefront of the measurement wave from a desired wavefront. The evaluation device (46) determines an influence of an intensity distribution (70) of the illumination radiation in the region of the mask plane on the measurement result and, when determining the deviation of the wavefront, utilizes the influence of the intensity distribution.

The present invention relates to a method, and a corresponding device, for testing a radius of curvature and/or for detecting inhomogeneities of a curved X-ray grating for a grating-based X-ray imaging device. The method comprises generating a beam of light diverging from a source point, propagating along a main optical axis and having a line-shaped beam profile. The method comprises reflecting the beam off a concave reflective surface of the grating. A principal axis of the concave reflective surface coincides with the main optical axis and the source point is at a predetermined distance from a point where the main optical axis intersects the concave reflective surface. The method comprises determining whether a projection of the reflected beam in a plane at or near the source point is present outside a central region around the source point, in which an absence of this projection outside the central region indicates that a radius of curvature of the concave reflective surface corresponds to the predetermined distance and/or that the reflective surface is substantially homogeneously curved along a curve formed by the beam impinging on the concave reflective surface.