Patent classifications
G01Q20/02
ARRAY ATOMIC FORCE MICROSCOPY FOR ENABLING SIMULTANEOUS MULTI-POINT AND MULTI-MODAL NANOSCALE ANALYSES AND STIMULATIONS
Disclosed is an atomic force microscopy system includes a laser source configured to generate an optical probe beam containing light of different spectral light components at different optical wavelengths, a dispersive optical device positioned to receive the optical probe beam and configured to disperse the optical probe beam into different dispersed light beams that are at different optical wavelengths and are spatially separated from one another, a cantilever array including a plurality of cantilevers structured to detect a sample and configured to deflect the different dispersed light beams by moving in position based on an interaction with the sample to produce multiple deflected output beams at different output optical wavelengths from the cantilevers, and a plurality of photodetectors to receive the multiple deflected output beams of different wavelengths from the cantilevers, respectively.
ARRAY ATOMIC FORCE MICROSCOPY FOR ENABLING SIMULTANEOUS MULTI-POINT AND MULTI-MODAL NANOSCALE ANALYSES AND STIMULATIONS
Disclosed is an atomic force microscopy system includes a laser source configured to generate an optical probe beam containing light of different spectral light components at different optical wavelengths, a dispersive optical device positioned to receive the optical probe beam and configured to disperse the optical probe beam into different dispersed light beams that are at different optical wavelengths and are spatially separated from one another, a cantilever array including a plurality of cantilevers structured to detect a sample and configured to deflect the different dispersed light beams by moving in position based on an interaction with the sample to produce multiple deflected output beams at different output optical wavelengths from the cantilevers, and a plurality of photodetectors to receive the multiple deflected output beams of different wavelengths from the cantilevers, respectively.
APPARATUS AND METHOD FOR EXAMINING AND/OR PROCESSING A SAMPLE
The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.
APPARATUS AND METHOD FOR EXAMINING AND/OR PROCESSING A SAMPLE
The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.
Scanning probe microscope and optical axis adjustment method in scanning probe microscope
It is intended to save time for adjusting a position of a detection unit. In a position adjustment process of a detector, a control device moves the detector obliquely with respect to a boundary line partitioning photodiodes on a plane on which the detector moves and moves the detector so that the position of the center of gravity of a spot of a laser beam and the center of a light-receiving surface coincide in response to the incident of at least a part of the laser beam on the light-receiving surface.
Scanning probe microscope and optical axis adjustment method in scanning probe microscope
It is intended to save time for adjusting a position of a detection unit. In a position adjustment process of a detector, a control device moves the detector obliquely with respect to a boundary line partitioning photodiodes on a plane on which the detector moves and moves the detector so that the position of the center of gravity of a spot of a laser beam and the center of a light-receiving surface coincide in response to the incident of at least a part of the laser beam on the light-receiving surface.
PROBE FOR DETECTING NEAR FIELD AND NEAR-FIELD DETECTING SYSTEM INCLUDING THE SAME
Provided is a probe configured to detect a near field, the probe including a probe substrate having a tip region at an end portion of the probe substrate, a width of the tip region being less than a width of a remaining region of the probe substrate, a first electrode and a second electrode disposed on a surface of the probe substrate, the first electrode and the second electrode being spaced apart from each other and extending from the tip region along the probe substrate, an emitter and a detector disposed between the first electrode and the second electrode, the emitter and the detector being spaced apart from each other in a direction in which the probe substrate extends, and being configured to be photo switched, and a reflector disposed above the emitter and the detector in the direction in which the probe substrate extends opposite to the tip region, and configured to reflect an electromagnetic wave emitted from the emitter.
PROBE FOR DETECTING NEAR FIELD AND NEAR-FIELD DETECTING SYSTEM INCLUDING THE SAME
Provided is a probe configured to detect a near field, the probe including a probe substrate having a tip region at an end portion of the probe substrate, a width of the tip region being less than a width of a remaining region of the probe substrate, a first electrode and a second electrode disposed on a surface of the probe substrate, the first electrode and the second electrode being spaced apart from each other and extending from the tip region along the probe substrate, an emitter and a detector disposed between the first electrode and the second electrode, the emitter and the detector being spaced apart from each other in a direction in which the probe substrate extends, and being configured to be photo switched, and a reflector disposed above the emitter and the detector in the direction in which the probe substrate extends opposite to the tip region, and configured to reflect an electromagnetic wave emitted from the emitter.
Method of imaging a surface using a scanning probe microscope
A method includes scanning a probe laterally across a surface so that the probe follows a scanning motion across the surface and steering a detection beam onto the probe via a steering mirror, the detection beam reflecting from the probe in the form of a return beam. The method also includes moving the steering mirror so that the detection beam follows a tracking motion which is synchronous with the scanning motion and the detection beam remains steered onto the probe by the steering mirror and using the return beam to obtain image measurements, each indicative of a measured height of a respective point on the surface. An associated height error measurement is obtained for each point on the surface, each measurement being indicative of a respective error in the measured height. The height error measurements are used to correct the image measurements so as to generate corrected image measurements.
Method of imaging a surface using a scanning probe microscope
A method includes scanning a probe laterally across a surface so that the probe follows a scanning motion across the surface and steering a detection beam onto the probe via a steering mirror, the detection beam reflecting from the probe in the form of a return beam. The method also includes moving the steering mirror so that the detection beam follows a tracking motion which is synchronous with the scanning motion and the detection beam remains steered onto the probe by the steering mirror and using the return beam to obtain image measurements, each indicative of a measured height of a respective point on the surface. An associated height error measurement is obtained for each point on the surface, each measurement being indicative of a respective error in the measured height. The height error measurements are used to correct the image measurements so as to generate corrected image measurements.