According to one embodiment, there is provided a measurement method. The method includes measuring an amount of overlay shift between a first layer and a second layer using a first overlay mark and a second overlay mark. The first layer is provided as a layer including the first overlay mark above a first substrate. The second layer is provided as a layer including the second overlay mark above the first overlay mark. The method includes acquiring a parameter related to asymmetry of a shape of the second overlay mark. The method includes obtaining an amount of correction with respect to a measured value of the amount of overlay shift based on the acquired parameter and the measured amount of overlay shift.

A method and system for performing subsurface atomic force microscopy measurements, the system comprising: a signal source for generating an drive signal; a transducer configured to receive the drive signal for converting the drive signal into vibrational waves and coupling said vibrational waves into a stack comprising a sample for interaction with subsurface features within said sample; cantilever tip for contacting the sample for measuring surface displacement resulting from the vibrational waves to determine subsurface features; wherein the system includes a measurement device for measuring a measurement signal returning from the transducer during and/or in between the subsurface atomic force microscopy measurements.

A method and system for performing subsurface atomic force microscopy measurements, the system comprising: a signal source for generating an drive signal; a transducer configured to receive the drive signal for converting the drive signal into vibrational waves and coupling said vibrational waves into a stack comprising a sample for interaction with subsurface features within said sample; cantilever tip for contacting the sample for measuring surface displacement resulting from the vibrational waves to determine subsurface features; wherein the system includes a measurement device for measuring a measurement signal returning from the transducer during and/or in between the subsurface atomic force microscopy measurements.

An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

A system for simultaneously and microscopically measuring vapor cell coating film energy transfer and relaxation characteristics at nanometer scales includes a space relaxation characteristic detection unit which includes a laser, an optical isolator, a spatial light filter, a reflector, a Glan-Taylor polarizer, a first quarter-wave plate, a spatial light modulator, a focusing lens, a second quarter-wave plate, a polarizing film, a PD detection unit, an I/V amplification unit, a data acquisition unit, a spectroscope and an optical chopper, an atomic force microscope detection unit for energy transfer micro-areas, a shielding cylinder, a coated alkali metal atomic vapor cell, a data processing unit and a magnetic field controlled coil. The energy transfer micro-area detection unit includes coated samples, a probe, an oscillator, a laser, a four-quadrant photoelectric detection unit, a band-pass filter unit, an automatic gain controller, an adder, a piezoelectric scanning cylinder, a sample table and a PI controller.

A method is disclosed. The method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information, determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, and analyzing the feature edge positions to detect the presence or absence of defects in the pattern structure.

A method is disclosed. The method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information, determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, and analyzing the feature edge positions to detect the presence or absence of defects in the pattern structure.

The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.

The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.