The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

An edge detection system is disclosed. The edge detection system includes an imaging device configured for imaging a pattern structure to form a first image, wherein the pattern structure includes a predetermined feature, and the imaging device images the pattern structure to generate measured linescan information that includes image noise. The edge detection system includes a processor, coupled to the imaging device, configured to receive the measured linescan information including image noise from the imaging device, wherein the processor is configured to: apply the measured linescan information to an inverse linescan model that relates the measured linescan information to feature geometry information, determine, from the inverse linescan model, feature geometry information that describes feature edge positions of the predetermined feature corresponding to the measured linescan information, determine from the feature geometry information at least one metric that describes a property of the edge detection system.

An edge detection system is disclosed. The edge detection system includes an imaging device configured for imaging a pattern structure to form a first image, wherein the pattern structure includes a predetermined feature, and the imaging device images the pattern structure to generate measured linescan information that includes image noise. The edge detection system includes a processor, coupled to the imaging device, configured to receive the measured linescan information including image noise from the imaging device, wherein the processor is configured to: apply the measured linescan information to an inverse linescan model that relates the measured linescan information to feature geometry information, determine, from the inverse linescan model, feature geometry information that describes feature edge positions of the predetermined feature corresponding to the measured linescan information, determine from the feature geometry information at least one metric that describes a property of the edge detection system.

The present invention relates to a method for measuring the dielectric properties of a sample with a scanning probe microscope. In particular, the invention relates to highly-localized optical imaging and spectroscopy on a sample surface using an atomic force microscope (AFM) probe mechanically driven at two oscillation frequencies, referred to herein as “active bimodal operation”, and a modulated source of electromagnetic radiation.

The present invention relates to a method for measuring the dielectric properties of a sample with a scanning probe microscope. In particular, the invention relates to highly-localized optical imaging and spectroscopy on a sample surface using an atomic force microscope (AFM) probe mechanically driven at two oscillation frequencies, referred to herein as “active bimodal operation”, and a modulated source of electromagnetic radiation.

A multi-functional scanning probe microscopy nanoprobe may include a cantilever, a tapered structure formed on a surface of the cantilever from a first material, and a nanopillar formed on an apex of the tapered structure from a second material. One of the first and second materials may exhibit ferromagnetism and the other may have greater electrical conductivity. A method of simultaneous multi-mode operation during scanning probe microscopy may include scanning a sample with the nanoprobe in contact with the sample to produce a current measurement indicative of an electric current flowing through the sample and a height measurement indicative of a topography of the sample and, thereafter, scanning the sample with the nanoprobe oscillating about a lift height derived from the height measurement to produce a deflection measurement (e.g. phase shift) indicative of a magnetic force between the sample and the nanoprobe.

A multi-functional scanning probe microscopy nanoprobe may include a cantilever, a tapered structure formed on a surface of the cantilever from a first material, and a nanopillar formed on an apex of the tapered structure from a second material. One of the first and second materials may exhibit ferromagnetism and the other may have greater electrical conductivity. A method of simultaneous multi-mode operation during scanning probe microscopy may include scanning a sample with the nanoprobe in contact with the sample to produce a current measurement indicative of an electric current flowing through the sample and a height measurement indicative of a topography of the sample and, thereafter, scanning the sample with the nanoprobe oscillating about a lift height derived from the height measurement to produce a deflection measurement (e.g. phase shift) indicative of a magnetic force between the sample and the nanoprobe.

In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

A nanoprober system can land a probe onto a device under test (DUT) by positioning a conductive probe above the DUT by a motion control device; applying electrical signals between the conductive probe and the DUT; measuring electrical responses from the applied electrical signal; calculating impedance magnitude values and / or phase angle values based on the measured electrical response values; causing the conductive probe to move towards the DUT while continuing to calculate impedance magnitude values and / or phase angle values from measured electrical response; determining that the conductive probe has contacted the DUT based on a change in the calculated impedance magnitude values and / or phase angle values; and signaling to the motion control device to stop moving the probe towards the DUT based on the change in the calculated impedance magnitude values and / or phase angle values.

An atomic force microscope is provided having a controller configured to store one or more positional parameters output by a sensor assembly when a light spot is located at a first preset position on the surface of the cantilever. The controller is further configured to operate an actuator assembly so as to induce movement of the spot away from the first preset position, to detect said movement of the first spot based on a change in the one or more positional parameters output by the sensor assembly, and to operate an optical assembly in response to the detected movement of the first spot to return the first spot to the first preset position.