An apparatus for measuring a magnetic field strength is provided. The apparatus includes a stage on which a sample to be measured is placed, a cantilever having a tip, an optical system having a light source and a light receiver, and a microwave power source. The tip is a diamond tip having a nitrogen vacancy defect. The optical system is configured such that excitation light from the light source is focused at the diamond tip. The cantilever is configured as a coaxial microwave antenna through which microwaves from the microwave power source are supplied to the diamond tip.

An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

The present invention pertains to a surface analysis device (1) and provides a technology that can increase accuracy and quality of measurement and analysis even when a local deviation is generated in height information of a measurement result of a scanning probe microscope (SPM) (2), due to an atmospheric pressure change with respect to an airtight tank (10). The surface analysis device (1) is provided with: an airtight tank (10); a stage (6) that holds a sample (5) in the airtight tank (10); the SPM (2) that is fixed to a structure configuring the airtight tank (1) and that measures the surface of the sample (5); a sensor (4) that is disposed outside of the airtight tank (10) and that measures atmospheric pressure; and a computer system that analyzes the surface of the sample by using a first signal obtained through measurement by the SPM (2) and a second signal obtained through measurement by the sensor (4).

System and Methods may be provided for performing chemical spectroscopy on samples from the scale of nanometers with surface sensitivity even on very thick sample. In the method, a signal indicative of infrared absorption of the surface layer is constructed by illuminating the surface layer with a beam of infrared radiation and measuring a probe response comprising at least one of a resonance frequency shift and a phase shift of a resonance of a probe in response to infrared radiation absorbed by the surface layer.

System and Methods may be provided for performing chemical spectroscopy on samples from the scale of nanometers with surface sensitivity even on very thick sample. In the method, a signal indicative of infrared absorption of the surface layer is constructed by illuminating the surface layer with a beam of infrared radiation and measuring a probe response comprising at least one of a resonance frequency shift and a phase shift of a resonance of a probe in response to infrared radiation absorbed by the surface layer.

A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

A method for obtaining optical spectroscopic information about a sub-micron region of a sample with quantitatively controlled depth/volume of the sample subsurface using a scanning probe microscope. With controlled probing depth/volume, the method can separate top surface data from subsurface optical/chemical information. The method can also be applied in liquid suitable for studying biological and chemical samples in their native aqueous environments, as opposed to air. In the method, a depth-controlled spectrum of the surface layer is constructed by illuminating the sample with a beam of infrared radiation and measuring a probe response using at least one of the resonant frequencies of the probe. The surface sensitivity is obtained by limiting the heat diffusion effect of the subsurface so as to confine the signal. The signal confinement is achieved through non-linearity of the acoustic wave with probe, as well as benefits gained by a high modulation frequency of the infrared radiation source at >1 MHz.

In one embodiment, a method for detecting edge positions in a pattern structure is disclosed. The method includes detecting the edge positions of features within the pattern structure of an image without filtering the image, wherein the detecting is performed by: applying a model to a single linescan, adjusting, based on the single linescan, one or more parameters of the model, obtaining, using the one or more adjusted parameters, a best fit of the model to the single linescan.