A detection device to be inserted in a holder of a scanning probe microscope is provided. The detection device comprises a probe comprising a support, a lever extending from the support, a tip positioned at one end of the lever, opposite from said support. The probe has dimensions that are small in comparison with the holder and the detection device comprises an adapter secured to the probe so as to adapt said probe to fit the holder. The adapter is secured to the probe by bonding comprising at least one adhesive or by assembly comprising a filler material used to secure said adapter to said probe during a brazing operation.

A detection device to be inserted in a holder of a scanning probe microscope is provided. The detection device comprises a probe comprising a support, a lever extending from the support, a tip positioned at one end of the lever, opposite from said support. The probe has dimensions that are small in comparison with the holder and the detection device comprises an adapter secured to the probe so as to adapt said probe to fit the holder. The adapter is secured to the probe by bonding comprising at least one adhesive or by assembly comprising a filler material used to secure said adapter to said probe during a brazing operation.

A SPM head incorporates a probe and a cantilever on which the probe is mounted. The cantilever has a planar reflecting surface proximate a free end of the cantilever. The cantilever extends from a mechanical mount and a single-mode optical fiber is supported by the mechanical mount to provide a beam. A micromirror is mounted to reflect the beam substantially 90° to the planar reflecting surface.

A nanotip apparatus which includes nanotips arranged in a pattern on a semiconductor base. Each of the nanotips have a pointed tip portion and a base portion in contact with the semiconductor base. Further, each of the nanotips include a gradient of silicon germanium (SiGe) with the highest concentration of germanium being at the pointed tip portion and the lowest concentration of germanium being at the base in contact with the semiconductor base. Also disclosed is a method in which the nanotips may be formed.

Methods are described for the economical manufacture of Scanning Probe and Electron Microscope (SPEM) probe tips. In this method, multiple wires are mounted on a stage and ion milled simultaneously while the stage and mounted probes are tilted at a selected angle relative to the ion source and rotated. The resulting probes are also described. The method provides sets of highly uniform probe tips having controllable properties for stable and accurate scanning probe and electron microscope (EM) measurements.

Methods are described for the economical manufacture of Scanning Probe and Electron Microscope (SPEM) probe tips. In this method, multiple wires are mounted on a stage and ion milled simultaneously while the stage and mounted probes are tilted at a selected angle relative to the ion source and rotated. The resulting probes are also described. The method provides sets of highly uniform probe tips having controllable properties for stable and accurate scanning probe and electron microscope (EM) measurements.

A mechanical method of removing nanoscale debris from a sample surface using an atomic force microscope (AFM) probe. The probe is shaped to include an edge that provides shovel-type action on the debris as the probe is moved laterally to the sample surface. Advantageously, the probe is able to lift the debris without damaging the debris for more efficient cleaning of the surface. The edge is preferably made by focused ion beam (FIB) milling the diamond apex of the tip.

A method of providing a MEMS device, such as an AFM probe, having a three-sided pyramidal protrusion is made using a multitude of MEMS method steps. To allow the reliable and speedy manufacture of such a MEMS device having a three-sided protrusion on a massive scale, wherein the protrusion has a relatively small half-cone angle and a single apex, a mold is used. The mold includes a sacrificial layer on top of a base substrate. The method of providing the MEMS device includes: providing an area at the first side of the mold which area comprises a pit with a layer of protrusion material, patterning the layer of protrusion material to the desired shape, and isotropically etching the sacrificial layer of the mold with an isotropic etchant capable of etching the sacrificial layer so as to separate the MEMS device from at least the base substrate of the mold.

A method of providing a MEMS device, such as an AFM probe, having a three-sided pyramidal protrusion is made using a multitude of MEMS method steps. To allow the reliable and speedy manufacture of such a MEMS device having a three-sided protrusion on a massive scale, wherein the protrusion has a relatively small half-cone angle and a single apex, a mold is used. The mold includes a sacrificial layer on top of a base substrate. The method of providing the MEMS device includes: providing an area at the first side of the mold which area comprises a pit with a layer of protrusion material, patterning the layer of protrusion material to the desired shape, and isotropically etching the sacrificial layer of the mold with an isotropic etchant capable of etching the sacrificial layer so as to separate the MEMS device from at least the base substrate of the mold.

The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.