The invention relates to a measuring device for a scanning probe microscope including a measuring probe a first probe holding device on which the measuring probe is arranged, a detection device including a measurement light source which is adapted to provide light beams directed toward the measuring probe, a sensor device which is adapted, during the operation to receive measurement light beams reflected from the measuring probe. A first measuring arrangement in which the first probe holding device with the measuring probe is arranged in a first position spaced from the detection device, and a second measuring arrangement is formed in which a lengthening device is changeably arranged between the detection device and the measuring probe which lengthens the respective optical beam path for the light beams and the measurement light beams in such a manner that the first probe holding device or a second probe holding device which is different from the first probe holding device is arranged with the measuring probe at a second position spacing from the detection device which is greater than the first position spacing.

A method of providing a MEMS device, such as an AFM probe, having a three-sided pyramidal protrusion is made using a multitude of MEMS method steps. To allow the reliable and speedy manufacture of such a MEMS device having a three-sided protrusion on a massive scale, wherein the protrusion has a relatively small half-cone angle and a single apex, a mold is used. The mold includes a sacrificial layer on top of a base substrate. The method of providing the MEMS device includes: providing an area at the first side of the mold which area comprises a pit with a layer of protrusion material, patterning the layer of protrusion material to the desired shape, and isotropically etching the sacrificial layer of the mold with an isotropic etchant capable of etching the sacrificial layer so as to separate the MEMS device from at least the base substrate of the mold.

A method of providing a MEMS device, such as an AFM probe, having a three-sided pyramidal protrusion is made using a multitude of MEMS method steps. To allow the reliable and speedy manufacture of such a MEMS device having a three-sided protrusion on a massive scale, wherein the protrusion has a relatively small half-cone angle and a single apex, a mold is used. The mold includes a sacrificial layer on top of a base substrate. The method of providing the MEMS device includes: providing an area at the first side of the mold which area comprises a pit with a layer of protrusion material, patterning the layer of protrusion material to the desired shape, and isotropically etching the sacrificial layer of the mold with an isotropic etchant capable of etching the sacrificial layer so as to separate the MEMS device from at least the base substrate of the mold.

The invention relates to a method for processing a measuring probe which is intended for detecting surface properties or for modifying surface structures in the sub-micrometer range. The method comprises at least the following steps. First, providing a precursor containing molecules polymerizable by light or electron beams and a measuring probe comprising at least one carrier with a tip having an upper end opposite the carrier and a light or electron source for emitting light or electron beams with a wavelength and intensity, which fulfil an energy input at least required for polymerization of the precursor and means for variable positioning of the light or electron source and a control file and an electronic data processing system, wherein the control file describes at least a part of the surface of the measuring probe and serves to control a change in position of the light or electron source. In the following step, the measuring probe is covered with the precursor and the measuring probe is arranged in the beam path of the light or electron beams, whereupon the precursor is exposed to the light or electron beam at several positions that touch each other and are specified in the control file, leaving out the tip of the measuring probe. The unexposed areas of the precursor are then removed by means of a water or solvent bath or controlled air or gas flow and, if necessary, the areas polymerized by exposure are finally developed. The invention also includes measuring probes which are manufactured using the inventive method.

The invention relates to a method for processing a measuring probe which is intended for detecting surface properties or for modifying surface structures in the sub-micrometer range. The method comprises at least the following steps. First, providing a precursor containing molecules polymerizable by light or electron beams and a measuring probe comprising at least one carrier with a tip having an upper end opposite the carrier and a light or electron source for emitting light or electron beams with a wavelength and intensity, which fulfil an energy input at least required for polymerization of the precursor and means for variable positioning of the light or electron source and a control file and an electronic data processing system, wherein the control file describes at least a part of the surface of the measuring probe and serves to control a change in position of the light or electron source. In the following step, the measuring probe is covered with the precursor and the measuring probe is arranged in the beam path of the light or electron beams, whereupon the precursor is exposed to the light or electron beam at several positions that touch each other and are specified in the control file, leaving out the tip of the measuring probe. The unexposed areas of the precursor are then removed by means of a water or solvent bath or controlled air or gas flow and, if necessary, the areas polymerized by exposure are finally developed. The invention also includes measuring probes which are manufactured using the inventive method.

A probe assembly is provided, which is applied to an electrical testing device. The probe assembly includes a probe body, which includes a testing end configured to contact with a to-be-tested device and a connection end opposite to the testing end; an elastic connection structure configured to be deformed when the probe body is subjected to a pressure; and a fixing base. The connection end is fixedly connected to the fixing base via the elastic connection structure. A testing device is further provided.

A probe assembly is provided, which is applied to an electrical testing device. The probe assembly includes a probe body, which includes a testing end configured to contact with a to-be-tested device and a connection end opposite to the testing end; an elastic connection structure configured to be deformed when the probe body is subjected to a pressure; and a fixing base. The connection end is fixedly connected to the fixing base via the elastic connection structure. A testing device is further provided.

Disclosed is a method for manufacturing a microcantilever having a predetermined thickness that includes forming a liquid synthetic resin for cantilevers to a thickness corresponding to the thickness of the microcantilever on an upper surface of a base block having an adhesive base and a non-adhesive base, and curing the liquid synthetic resin for cantilevers via a boundary between the adhesive base and the non-adhesive base, wherein the adhesive base has stronger adhesivity to the cured synthetic resin for cantilevers than the non-adhesive base.

Disclosed is a method for manufacturing a microcantilever having a predetermined thickness that includes forming a liquid synthetic resin for cantilevers to a thickness corresponding to the thickness of the microcantilever on an upper surface of a base block having an adhesive base and a non-adhesive base, and curing the liquid synthetic resin for cantilevers via a boundary between the adhesive base and the non-adhesive base, wherein the adhesive base has stronger adhesivity to the cured synthetic resin for cantilevers than the non-adhesive base.

A cantilever used in a scanning probe microscope includes a supporting section, a lever section, and a protrusion section, which is a probe. A crystalline carbon composite layer including a crystalline carbon nanomaterial and a metal material, a melting point of which is 420 C. or lower, is deposited on a distal end portion of the protrusion section.