G02B5/008

SPOOF SURFACE PLASMON POLARITON TRANSMISSION LINE STRUCTURE, CIRCUIT BOARD, AND ELECTRONIC DEVICE
20230221472 · 2023-07-13 ·

This application provides a spoof surface plasmon polariton transmission line structure, a circuit board, and an electronic device, to reduce a size of the SSPP transmission line structure. The SSPP transmission line structure includes a first dielectric substrate, a first metal strip, and a second metal strip. The first metal strip and the second metal strip are respectively disposed on two opposite surfaces of the first dielectric substrate, the first metal strip and the second metal strip separately extend in a first direction, and a length of the first metal strip in the first direction is less than a length of the second metal strip in the first direction. In the first direction, a cross-sectional area of the first metal strip gradually decreases, and at least one side of the second metal strip has a plurality of protrusion parts spaced apart.

SURFACE-ENHANCED RAMAN SCATTERING SUBSTRATE BASED ON SURFACE PLASMON RESONANCE AND METHOD OF FABRICATING THE SAME
20230213451 · 2023-07-06 · ·

The present invention relates to a surface-enhanced Raman scattering substrate and a method of fabricating the same. More particularly, the surface-enhanced Raman scattering substrate according to an embodiment includes a substrate; a lower plasmonic layer formed on the substrate and based on a first metal nanostructure; an oxide layer formed on the lower plasmonic layer; and an upper plasmonic layer formed on the oxide layer and based on a second metal nanostructure.

Phase shift device including metal-dielectric composite structure

A phase shifting device may include a plurality of metal layers and a plurality of first dielectric layers, a metal layer of the plurality of metal layers and a first dielectric layer of the plurality of first dielectric layers being alternately stacked in a first direction, and a second dielectric layer disposed on a side surface of the stacked structure in a second direction, wherein the first dielectric layer includes a first material having a first dielectric constant and the second dielectric layer includes a second material having a second dielectric constant, and wherein the second dielectric constant is greater than the first dielectric constant.

White balance compensation using a spectral sensor system

A system for imaging a scene, includes a plurality of optical sensors arranged on an integrated circuit and a plurality of sets of interference filters, where each set of interference filters of the plurality of sets of interference filters includes a plurality of interference filters that are arranged in a pattern and each interference filter of the plurality of filters is configured to pass light in a different wavelength range, where each set of interference filters of the plurality of interference filters is associated with a spatial area of the scene. The system includes a plurality of rejection filters arranged in a pattern under each set of interference filters, where each rejection filter of the plurality of rejection filters is configured to substantially reject light of predetermined wavelengths. The system further includes one or more processors adapted to provide a spectral response for a spatial area of the scene associated with the set of interference filters.

NORMAL-TO-PLANE SURFACE PLASMON MODE FOR ANGLE-AND-POLARIZATION INDEPENDENT OPTOMECHANICAL SENSING
20230003920 · 2023-01-05 ·

The present example embodiment relates generally to creating a specific nanostructure on a substrate to improve the angle independence of a surface plasmon resonance mode. It may comprise a metamaterial structure comprising nanostructures located in a pattern on or within a substrate. The nanostructures may be paraboloid shaped and periodic.

ENCAPSULATION STRUCTURE, ENCAPSULATION METHOD, ELECTROLUMINESCENT DEVICE, AND DISPLAY DEVICE
20220407035 · 2022-12-22 ·

An encapsulation structure, an encapsulation method, an electroluminescent device, and display equipment, which relate to the technical field of displays. The encapsulation structure comprises: a first inorganic dielectric layer (1), wherein the first inorganic dielectric layer (1) has a surface attached to a surface of a cathode layer (4) of an electroluminescent device; a chromatic dispersion relationship between the first inorganic dielectric layer (1), the cathode layer (4) and an electron injection layer (5) of the electroluminescent device meets a preset condition; the preset condition is used for defining an optical parameter of a first interface, the optical parameter is related to chromatic dispersion, and the optical parameter is used for coupling surface plasmon polaritons on interfaces on both sides of the cathode layer (4); and the first interface is an interface between the first inorganic dielectric layer (1) and the cathode layer (4).

Thermal undercut structure for metasurface tuning

An active metasurface includes a number of periodically-repeated unit cells arranged on a substrate, each of the unit cells including a high-index dielectric block; a heat source positioned to selectively modulate heat applied to the high-index dielectric block; and an insulating undercut region at an interface between the high-index dielectric block and the substrate.

Method of manufacture of a metasurface

The present invention relates to a new method for making metasurfaces comprising liquid gating.

Nanostructured plasmonic materials and methods of making and use thereof

Disclosed herein are nanostructured plasmonic materials. The nanostructured plasmonic materials can include a first nanostructured layer comprising: a first layer of a first plasmonic material permeated by a first plurality of spaced-apart holes, wherein the first plurality of spaced apart holes comprise a first array; and a second nanostructured layer comprising a second layer of a second plasmonic material permeated by a second plurality of spaced-apart holes, wherein the second plurality of spaced apart holes comprise a second array; wherein the second nanostructured layer is located proximate the first nanostructured layer; and wherein the first principle axis of the first array is rotated at a rotation angle compared to the first principle axis of the second array.

Nanoassembly methods for producing quasi-three-dimensional nanoarrays

Nanoassembly methods for producing quasi-3D plasmonic films with periodic nanoarrays of nano-sized surface features. A sacrificial layer is deposited on a surface of a donor substrate having periodic nanoarrays of nanopattern features formed thereon. A plasmon film is deposited onto the sacrificial layer and a dielectric spacer is deposited on the plasmon film. The donor substrate having the sacrificial layer, plasmon film, and dielectric spacer thereon is immersed in a bath of etchant to selectively remove the sacrificial layer such that the plasmon film and the dielectric spacer thereon adhere to the surface of the donor substrate. The dielectric spacer and the plasmon film are mechanically separated from the donor substrate to define a quasi-three dimensional (3D) plasmonic film having periodic nanoarrays of nano-sized surface features defined by the nanopattern features of the donor substrate surface. The quasi-3D plasmonic film is then applied to a receiver substrate.