A metasurface optical device includes a substrate and a nano-structure layer disposed on the substrate. The nano-structure layer includes a plurality of nano-structure units. The plurality of nano-structure units extend in a direction away from the substrate, and central axes of the plurality of nano-structure units form corresponding angles with respect to a normal direction of the substrate, such that the plurality of nano-structure units are arranged obliquely relative to the substrate.

A waveguide illuminator includes an input waveguide, a waveguide splitter coupled to the input waveguide, and a waveguide array coupled to the waveguide splitter. The waveguide array includes an array of out-couplers out-coupling portions of the split light beam to form an array of out-coupled beam portions for illuminating a display panel. To reduce optical interference, the waveguide illuminator may have two interlaced waveguide arrays energized by two different light sources. Output polarizations of neighboring light pixels of a display illuminated with such waveguide illuminator may be orthogonal to each other. The frames to be displayed may be broken down into sequentially displayed sub-frames with interleaved pixels.

A waveguide illuminator includes an input waveguide, a waveguide splitter coupled to the input waveguide, and a waveguide array coupled to the waveguide splitter. The waveguide array includes an array of out-couplers out-coupling portions of the split light beam to form an array of out-coupled beam portions for illuminating a display panel. To reduce optical interference, the waveguide illuminator may have two interlaced waveguide arrays energized by two different light sources. Output polarizations of neighboring light pixels of a display illuminated with such waveguide illuminator may be orthogonal to each other. The frames to be displayed may be broken down into sequentially displayed sub-frames with interleaved pixels.

Provided is an imaging device (100) including: a line sensor or an area sensor (50) having an aspect ratio different from that of a scene; and an optical element (10) having a predetermined pattern and superimposed on the line sensor or the area sensor, wherein in the optical element, an autocorrelation function of the predetermined pattern including a plurality of basic patterns repeated while being periodically positionally displaced has a peak and side lobes, and the side lobes are constant or substantially constant.

A light sensor includes a semiconductor substrate supporting a number of pixels. Each pixel includes a photoconversion zone extending in the substrate between a front face and a back face of the substrate. An optical diffraction grating is arranged over the back face of the substrate at a position facing the photoconversion zone of the pixel. For at least two different pixels of the light sensor, the optical diffraction gratings have different pitches. Additionally, the optical grating of each pixel is surrounded by an opaque wall configured to absorb at operating wavelengths of the sensor.

Provided an imaging apparatus including a first optical device, a second optical device disposed such that light transmitted through the first optical device is incident on the second optical device, and a third optical device disposed such that light transmitted through the second optical device is incident on the third optical device, wherein at least one of the first optical device, the second optical device, and the third optical device includes a plurality of nanostructures, and heights of at least two nanostructures of the plurality of nanostructures are different from each other.

Diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The diffraction gratings and waveguides may include a transmissive layer and a metal layer. The diffraction grating may comprises a blazed grating.

A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.

Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from “low-contrast” materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.

Provided are a curable resin composition including a near-ultraviolet light-absorbing organic compound, indium tin oxide particles, and a polymer having a constitutional unit represented by General Formula (P) and having an acidic group at one terminal, in which the near-ultraviolet light-absorbing organic compound is a compound that has a maximal value at 300 to 400 nm in an absorption spectrum in a wavelength region of 300 to 800 nm and does not substantially absorb light at a wavelength of 410 to 800 nm; a cured product formed of the curable resin composition; a diffractive optical element; and a multilayer diffractive optical element.

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Ar.sup.P represents an aryl group and L.sup.P and R.sup.P1 represent a specific group.