Provided is a biological tissue observation apparatus including an optical fiber probe that receives fluorescence via an input end disposed at one end thereof and that optically guides the fluorescence toward the base end in the longitudinal direction, a photodetector that is disposed facing an output end disposed at the base end of the optical fiber probe and that detects the fluorescence output from the output end, and a scatter suppressing unit provided near the input end of the optical fiber probe.

Provided is a biological tissue observation apparatus including an optical fiber probe that receives fluorescence via an input end disposed at one end thereof and that optically guides the fluorescence toward the base end in the longitudinal direction, a photodetector that is disposed facing an output end disposed at the base end of the optical fiber probe and that detects the fluorescence output from the output end, and a scatter suppressing unit provided near the input end of the optical fiber probe.

Under one aspect, a device is provided for use in luminescent imaging. The device can include a photonic superlattice including a first material, the first material having a first refractive index. The first material can include first and second major surfaces and first and second pluralities of features defined though at least one of the first and second major surfaces, the features of the first plurality differing in at least one characteristic from the features of the second plurality. The photonic superlattice can support propagation of a first wavelength and a second wavelength approximately at a first angle out of the photonic superlattice, the first and second wavelengths being separated from one another by a first non-propagating wavelength that does not selectively propagate at the first angle out of the photonic superlattice. The device further can include a second material having a second refractive index that is different than the first refractive index. The second material can be disposed within, between, or over the first and second pluralities of features and can include first and second luminophores. The device further can include a first optical component disposed over one of the first and second major surfaces of the first material. The first optical component can receive luminescence emitted by the first luminophore at the first wavelength approximately at the first angle, and can receive luminescence emitted by the second luminophore at the second wavelength approximately at the first angle.

Under one aspect, a device is provided for use in luminescent imaging. The device can include a photonic superlattice including a first material, the first material having a first refractive index. The first material can include first and second major surfaces and first and second pluralities of features defined though at least one of the first and second major surfaces, the features of the first plurality differing in at least one characteristic from the features of the second plurality. The photonic superlattice can support propagation of a first wavelength and a second wavelength approximately at a first angle out of the photonic superlattice, the first and second wavelengths being separated from one another by a first non-propagating wavelength that does not selectively propagate at the first angle out of the photonic superlattice. The device further can include a second material having a second refractive index that is different than the first refractive index. The second material can be disposed within, between, or over the first and second pluralities of features and can include first and second luminophores. The device further can include a first optical component disposed over one of the first and second major surfaces of the first material. The first optical component can receive luminescence emitted by the first luminophore at the first wavelength approximately at the first angle, and can receive luminescence emitted by the second luminophore at the second wavelength approximately at the first angle.

A microscopy system that includes a first laser emitting a first laser pulse along a first beam line, the first laser pulse being converted into an annular Bessel pump beam; and a second laser emitting a second laser pulse along a second beam line, the second laser pulse being a probe beam, the annular Bessel pump beam and the probe beam being delivered to a sample at right angles to each other allowing the annular Bessel pump beam to shrink a focal axial diameter of the second beam line thereby enabling dipole-like backscatter stimulated emission along the second beam line.

A microscopy system that includes a first laser emitting a first laser pulse along a first beam line, the first laser pulse being converted into an annular Bessel pump beam; and a second laser emitting a second laser pulse along a second beam line, the second laser pulse being a probe beam, the annular Bessel pump beam and the probe beam being delivered to a sample at right angles to each other allowing the annular Bessel pump beam to shrink a focal axial diameter of the second beam line thereby enabling dipole-like backscatter stimulated emission along the second beam line.

One aspect of the invention provides a method for drift correction to correct a 3D point collection dataset to compensate for drift over time. The method includes: (a) separating the 3D dataset into n segments, wherein n>1; (b) for each of the n segments, reconstructing a volume image as a 3D histogram in which a count for each voxel in the histogram equals a number of localization estimates falling within the voxel; (c) performing 3D cross-correlation between pairs of the n segments; (d) identifying a correlation peak in a result of the 3D cross-correlation to determine a shift distance between pairs of the n segments; (e) solving an overdetermined system of shift distances to determine independent shifts; and (f) offsetting positions from a plurality of segments in the 3D point collection dataset with the independent shifts calculated in step (e) to correct for drift.

An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers formed on a wafer is proposed. The device includes a light source, a first beam splitter configured to split a beam emitted from the light source into two beams, a first color filter configured to adjust a center wavelength and a band width of one of the beams split by the first beam splitter so that the center wavelength and the band width of one of the beams become suitable for acquiring an image of the first overlay mark.

An optical arrangement for imaging a sample is disclosed. The optical arrangement comprises at least one first objective lens and at least one second objective lens, at least one illumination source for producing an illumination beam, detector for imaging radiation from the sample, and at least one mirror for reflecting the radiation from one of the first objective lens or the second objective lens into the detector. The at least one mirror is double-sided and dependent on the illumination beam at the other one of the first objective lens and the second objective lens.

An optical arrangement for imaging a sample is disclosed. The optical arrangement comprises at least one first objective lens and at least one second objective lens, at least one illumination source for producing an illumination beam, detector for imaging radiation from the sample, and at least one mirror for reflecting the radiation from one of the first objective lens or the second objective lens into the detector. The at least one mirror is double-sided and dependent on the illumination beam at the other one of the first objective lens and the second objective lens.