G02B21/33

FLUID IMMERSION CONTROL FOR INVERTED MICROSCOPY

A fluid immersion control system may use a common electrode along with a plurality of sensor electrodes at a distal portion of an immersion microscope objective to monitor electrical resistance of a fluid as an indication of presence of a fluid layer used for immersion microscopy. The fluid immersion control system may activate replenishment of the fluid when the resistance indicates that a diameter of the microscope objective is not immersed in the fluid.

Immersion microscopy

A microscope objective for imaging a specimen using a microscope, the microscope objective having a front lens enclosed by a surround and being designed for microscopy with an immersion liquid. In the microscope objective, the front lens and/or the surround thereof is provided with a coating which can be switched between a state which repels the immersion liquid and a state which does not repel the immersion liquid.

Immersion microscopy

A microscope objective for imaging a specimen using a microscope, the microscope objective having a front lens enclosed by a surround and being designed for microscopy with an immersion liquid. In the microscope objective, the front lens and/or the surround thereof is provided with a coating which can be switched between a state which repels the immersion liquid and a state which does not repel the immersion liquid.

Systems and methods of high-resolution review for semiconductor inspection in backend and wafer level packaging
11544838 · 2023-01-03 · ·

A review system and operation method directs a beam of light toward a sample on a stage. The sample is a wafer level packaging wafer or a backend wafer. Defect review is performed based on the light reflected from the sample. The review system can use one or more of: a fluid supplied by an immersion subsystem that includes a fluid supply unit and a fluid removal unit; an illumination pattern for differential phase contrast; or ultraviolet or deep ultraviolet wavelengths.

Systems and methods of high-resolution review for semiconductor inspection in backend and wafer level packaging
11544838 · 2023-01-03 · ·

A review system and operation method directs a beam of light toward a sample on a stage. The sample is a wafer level packaging wafer or a backend wafer. Defect review is performed based on the light reflected from the sample. The review system can use one or more of: a fluid supplied by an immersion subsystem that includes a fluid supply unit and a fluid removal unit; an illumination pattern for differential phase contrast; or ultraviolet or deep ultraviolet wavelengths.

SYSTEMS, METHODS, AND APPARATUSES FOR IMMERSION MEDIA APPLICATION AND LENS CLEANING

An imaging system configured for automatic application and/or removal of immersion media can include (i) a sample stage, (ii) an imaging assembly disposed on a first side of the sample stage and having an immersion objective configured to selectively align with an optical axis of the imaging system, and (iii) an applicator positioned to selectively interact with a lens surface of the immersion objective to deposit or remove immersion media.

SYSTEMS, METHODS, AND APPARATUSES FOR IMMERSION MEDIA APPLICATION AND LENS CLEANING

An imaging system configured for automatic application and/or removal of immersion media can include (i) a sample stage, (ii) an imaging assembly disposed on a first side of the sample stage and having an immersion objective configured to selectively align with an optical axis of the imaging system, and (iii) an applicator positioned to selectively interact with a lens surface of the immersion objective to deposit or remove immersion media.

DETECTION OPTICAL SYSTEM, DETECTION DEVICE, FLOW CYTOMETER, AND IMAGING CYTOMETER
20220404263 · 2022-12-22 ·

A detection optical system includes an objective lens, a first relay lens, a second relay lens, and an imaging lens, which are arranged in order from a side of a specimen along an optical path of light from the specimen illuminated by a light source. A primary imaging plane is provided on the optical path between the first relay lens and the second relay lens. An aspherical correction plate that corrects spherical aberration is arranged at a position located between the second relay lens and the imaging lens and substantially conjugate with a pupil position of the objective lens.

Method of concentrating particles in a liquid droplet using an EWOD device with sensing apparatus

A microfluidic system and related methods of operating an electrowetting on dielectric (EWOD) device operate to concentrate particles within a liquid droplet dispensed onto an element array of the EWOD device. The method includes the steps of providing a non-polar liquid onto the element array of the EWOD device; providing a polar liquid droplet onto the element array of the EWOD device within the non-polar liquid, wherein the polar liquid droplet includes particles; and applying an actuation cycle comprising a plurality of actuation patterns, wherein at least one of the actuation patterns includes actuating one or more array element electrodes within a perimeter of the polar liquid droplet, and the particles migrate within the polar liquid droplet to become concentrated within a portion of the liquid droplet at one or more array element electrodes corresponding to one of the plurality of actuation patterns.

Method of concentrating particles in a liquid droplet using an EWOD device with sensing apparatus

A microfluidic system and related methods of operating an electrowetting on dielectric (EWOD) device operate to concentrate particles within a liquid droplet dispensed onto an element array of the EWOD device. The method includes the steps of providing a non-polar liquid onto the element array of the EWOD device; providing a polar liquid droplet onto the element array of the EWOD device within the non-polar liquid, wherein the polar liquid droplet includes particles; and applying an actuation cycle comprising a plurality of actuation patterns, wherein at least one of the actuation patterns includes actuating one or more array element electrodes within a perimeter of the polar liquid droplet, and the particles migrate within the polar liquid droplet to become concentrated within a portion of the liquid droplet at one or more array element electrodes corresponding to one of the plurality of actuation patterns.