A feature value such as a grayscale value is extracted from a design pattern on which a moiré image is based. Then, an aperture/non-aperture ratio of a moiré pattern is set according to the feature value, taking into account the specification of layers desired for a moiré image, setting of a basic pattern, and information regarding a moiré display. In addition to the aperture/non-aperture ratio, a phase shift amount and a pitch ratio can be further added to efficiently produce a moiré image having a beautiful appearance and excellent design. Moreover, such a method for generating a moiré pattern can be incorporated in a system to further improve production efficiency.

An optical path control member according to an embodiment comprises: a base substrate; a resin layer which is disposed on the base substrate and includes multiple intaglio parts spaced apart from each other; and multiple pattern portions arranged inside the multiple intaglio parts and spaced apart from each other, wherein the pitch between the multiple pattern portions is shorter than or equal to 30 μm.

An optical path control member according to an embodiment comprises: a base substrate; a resin layer disposed on the base substrate and including a plurality of engraved parts spaced from each other; and a plurality of pattern parts disposed inside the plurality of engraved parts and spaced from each other, wherein each of the pattern parts comprises a first light shielding layer and a second light shielding layer disposed on the first light shielding layer, the height of the first light shielding layer is higher than the height of the second light shielding layer, and the overall height of each of the pattern parts is less than or equal to the overall height of the engraved parts and greater than or equal to 93% of the height of the engraved parts.

A grating for use in metrology including a periodic structure including a plurality of units having a pitch P, at least one unit of the plurality of units including at least a first periodic sub-structure having a first sub-pitch P1 smaller than the pitch P, and at least a second periodic sub-structure arranged along-side and separated from the first periodic sub-structure within the at least one unit and having a second sub-pitch P2 smaller than the pitch P and different from the first sub-pitch P1, P1 and P2 being selected to yield at least one Moir pitch P.sub.m=P1.Math.P2/(P2−P1), the pitch P being an integer multiple of the first sub-pitch P and of the second sub-pitch P2.

A grating for use in metrology including a periodic structure including a plurality of units having a pitch P, at least one unit of the plurality of units including at least a first periodic sub-structure having a first sub-pitch P1 smaller than the pitch P, and at least a second periodic sub-structure arranged along-side and separated from the first periodic sub-structure within the at least one unit and having a second sub-pitch P2 smaller than the pitch P and different from the first sub-pitch P1, P1 and P2 being selected to yield at least one Moir pitch P.sub.m=P1.Math.P2/(P2−P1), the pitch P being an integer multiple of the first sub-pitch P and of the second sub-pitch P2.

A moiré image processing device is provided, including a light-transmitting film, a light sensor, and an image processor. The light-transmitting film includes a plurality of microlenses, and a light-incident surface and a light-exit surface, where the microlenses are disposed on the light-incident surface, the light-exit surface, or a combination thereof according to a distribution pattern. The light sensor includes a photosensitive surface, where the photosensitive surface faces the light-exit surface, there are a plurality of pixels on the photosensitive surface, and the pixels sense the microlenses to obtain a photosensitive image corresponding to the distribution pattern. The image processor is coupled to the light sensor, where the image processor performs, according to a virtual image and the photosensitive image, image processing of simulating a moiré effect to generate a moiré image, where the virtual image corresponds to the distribution pattern and is similar to the photosensitive image.

The present inventions is related to the optical lenses that use subwavelength structures to perform an optical function, the applications of such lenses, and the methods of making the same. Particularly, the present invention provide an optical lens(es), termed “subwavelength Moiré index lens” or “SMIL” for manipulating light. The SMIL comprises a thin material layer having an effective optical index that has a Moiré pattern of two or more periodic structures. The SMIL allows a lens to be ultrathin, flat, numerical aperture nearly one, scalable to large area, and manufacturable at low cost. The present invention also provides the systems based on SMIL, such lens systems, LEDs and photodetectors, and the fabrication methods of the SMIL.

The present inventions is related to the optical lenses that use subwavelength structures to perform an optical function, the applications of such lenses, and the methods of making the same. Particularly, the present invention provide an optical lens(es), termed “subwavelength Moiré index lens” or “SMIL” for manipulating light. The SMIL comprises a thin material layer having an effective optical index that has a Moiré pattern of two or more periodic structures. The SMIL allows a lens to be ultrathin, flat, numerical aperture nearly one, scalable to large area, and manufacturable at low cost. The present invention also provides the systems based on SMIL, such lens systems, LEDs and photodetectors, and the fabrication methods of the SMIL.

A method of manufacturing an image element array for a security device is disclosed. The method comprises: (a) providing a metallised substrate web comprising a substrate having a first metal layer thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask, by conveying the substrate web along a transport path and, during the exposure, moving the patterned mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web, wherein the patterned mask comprises first pattern elements in which the mask is substantially opaque to the radiation and second pattern elements in which the mask is substantially transparent to the radiation, whereupon the exposed second pattern elements of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array.

A method of manufacturing an image element array for a security device is disclosed. The method comprises: (a) providing a metallised substrate web comprising a substrate having a first metal layer thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask, by conveying the substrate web along a transport path and, during the exposure, moving the patterned mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web, wherein the patterned mask comprises first pattern elements in which the mask is substantially opaque to the radiation and second pattern elements in which the mask is substantially transparent to the radiation, whereupon the exposed second pattern elements of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array.