A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. The wavelength controller may control the first solid-state laser unit to vary the first wavelength on a condition that an absolute value of a difference between a value of a target wavelength and a value of the third wavelength detected by the wavelength detector is equal to or less than a predetermined value, and control the second solid-state laser unit to vary the second wavelength on a condition that the absolute value exceeds the predetermined value.

Multilevel optical intensity modulation high in accuracy is performed using electro-absorption optical modulators. There is provided a plurality of EA modulators connected in series in a path of an optical signal from a light source, and a multilevel-coded modulated optical signal is generated by modulating an intensity of an input optical signal from the light source based on a modulation signal using the EA modulators. Each of the EA modulators is switched between an ON state and an OFF state of optical absorption in accordance with the modulation signal. Regarding an extinction ratio of the ON state to the OFF state in each of the EA modulators, the EA modulators have respective values difference from each other, and are arranged in ascending order of the extinction ratio from the light source side.

An optical isolator for suppressing back reflections from a downstream optical system is described. The optical isolator includes a plurality of optical paths between a splitter and a combiner. One or more of the optical paths include two phase modulators that are driven by oscillating signals having predefined phase relationships. At least one bypass optical path does not include two phase modulators driven by oscillating signals. Amplitude and phase of an optical signal traversing the bypass optical path may be tuned to further suppress residual reflections from a downstream optical system.

Method for determining the characteristics of a system for generating at least one pattern of light, the method comprising: a) providing a desired pattern of light, b) expressing the amplitude and the phase of the output pulse of the system as a function of the input laser pulse and in function of the characteristics of the system to obtain a calculated output pulse, the input laser pulse having a duration below or equal to 1 nanosecond, c) determining at least one characteristic of the system by minimizing a distance between the calculated output pulse and the desired output laser pulse.

A speckle reduction system is provided and includes a speckle reduction component and a control module. The speckle reduction component includes electrode layers and a liquid crystal layer. The liquid crystal layer is disposed between the electrode layers and configured to receive light from a coherent light source. The control module is configured to (i) supply a first voltage signal having a first voltage to the electrode layers to provide a first speckle pattern output, and (ii) supply a second voltage signal having a second voltage to the electrode layers to provide a second speckle pattern output, wherein the first voltage and the second voltage are greater than zero. The control module is configured to transition between providing the first voltage signal and the second voltage signal in less than at least one of half an integration time of a human eye or 8 milliseconds.

An optical amplifier arrangement has optical parametric amplifiers and white light generations and harmonic generation, in particular frequency doubling, for generating a wide visible to infrared, in any case near-infrared, spectrum of coherent ultra-short light pulses, in particular with a pump laser, and also to a . A method During operation the fundamental is in a wavelength range above 950 nm, and the second signal light and the second idler light of the second optical parametric amplifier together cover a tunability range of wavelengths between 500 nm and 5 μm, in particular between 550 nm and 3 μm, wherein between wavelengths in the tunability range throughout continuous tuning can be carried out, namely through the degeneration range of the second optical parametric amplifier (OPA2) at the fundamental of the pump laser.

Embodiments of the present application provide an array substrate and manufacturing method thereof, and a display panel, display device, display kit. The array substrate includes: a base substrate, and a reflective layer on a side of the base substrate; the reflective layer includes: a plurality of micro-capsules; each of the micro-capsules includes: a plurality of absorbing particles and a plurality of reflecting particles; the absorbing particles are magnetic particles absorbing light; the reflecting particles are non-magnetic particles reflecting light.

A method of generating THz radiation includes the steps of generating optical input radiation with an input radiation source device (10), irradiating a first conversion crystal device (30) with the optical input radiation, wherein the first conversion crystal device (30) is arranged in a single pass configuration, and generating the THz radiation having a THz frequency in the first conversion crystal device (30) in response to the optical input radiation by an optical-to-THz-conversion process, wherein a multi-line frequency spectrum is provided by the optical input radiation in the first conversion crystal device (30), and the optical-to-THz-conversion process includes cascaded difference frequency generation using the multi-line frequency spectrum. Furthermore, a THz source apparatus being configured for generating THz radiation and applications thereof are described.

An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.

According to one embodiment, a display device includes a transparent substrate having a first main surface and a second main surface, a display element configured to emit display light toward the transparent substrate, an optical path adjustment element provided on the second main surface, a first optical element which overlaps the optical path adjustment element and diffracts display light which passed through the transparent substrate and the optical path adjustment element, and a second optical element which is provided on the second main surface and diffracts display light which propagated inside the transparent substrate. The optical path adjustment element is configured to adjust an optical path of display light to change an emission position of display light.