A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature compensated polarization-modulating optical element includes a first polarization-modulating optical element of optically active material, the first polarization-modulating optical element having a first specific rotation with a sign. The temperature compensated polarization-modulating optical element includes also includes a second polarization-modulating optical element of optically active material, the second polarization-modulating optical element having a second specific rotation with a sign opposite to the sign of the first specific rotation.

A pulse signal is detected from an encoder signal of a rotary encoder. The detected pulse signal is used as a signal for controlling a light exposure timing of a line type light exposure head and is used for detecting a transport speed of an instant film. The light exposure head sequentially performs light exposure for a line image on the transported instant film in synchronization with each pulse signal detected from the encoder signal, and a density correction unit corrects an amount of light emission of the light exposure head depending on the transport speed of the instant film.

A pulse signal is detected from an encoder signal of a rotary encoder. The detected pulse signal is used as a signal for controlling a light exposure timing of a line type light exposure head and is used for detecting a transport speed of an instant film. The light exposure head sequentially performs light exposure for a line image on the transported instant film in synchronization with each pulse signal detected from the encoder signal, and a density correction unit corrects an amount of light emission of the light exposure head depending on the transport speed of the instant film.

A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

In a case that accommodates an instant film, an exposure opening portion, a discharge port, and a claw opening portion are provided. The exposure opening portion is light-shielded by a film cover that is disposed to overlap the instant film. The film cover includes a notched portion connected to the claw opening portion. In a case where the film cover is not removed in use, a claw inserted through the claw opening portion is moved within a range of the notched portion. In a case where the film cover is removed in use, the claw is moved within a range that exceeds the range of the notched portion.

In a case that accommodates an instant film, an exposure opening portion, a discharge port, and a claw opening portion are provided. The exposure opening portion is light-shielded by a film cover that is disposed to overlap the instant film. The film cover includes a notched portion connected to the claw opening portion. In a case where the film cover is not removed in use, a claw inserted through the claw opening portion is moved within a range of the notched portion. In a case where the film cover is removed in use, the claw is moved within a range that exceeds the range of the notched portion.

The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.

An X-ray imaging apparatus comprises a first operation unit 31 and a second operation unit 41 that execute an input operation relative to an X-ray image displayed on a display element. The first operation unit comprises a touch panel and the second operation unit comprises a lever. A mounted first operation unit can change an angle relative to a rail installed relative to a table. The second operation unit is attachable to both the rail and the table, and first operation unit is and detachable therefrom for convenience.

An illumination optical assembly for a projection exposure apparatus includes a first facet element having a multiplicity of first facets, which are formed in each case by a multiplicity of displaceable individual mirrors, and a second facet element having a multiplicity of second facets. The displacement positions of the individual mirrors of the first facets are chosen in each case in so that, in the case of a predefined intensity distribution of an illumination radiation in an intermediate focus, the illumination radiation in the region of the facets of the second facet element has an intensity distribution with a maximum which is at most equal to a predefined maximum intensity or which is greater than a mean value of the intensity distribution by at most a predefined factor or absolute value.